Otsuka; Noboru
Patent Applications and Registrations
Patent applications and USPTO patent grants for Otsuka; Noboru.The latest application filed is for "radiation-sensitive resin composition".
- Otsuka; Noboru - Tokyo JP
| Patent | Date |
|---|---|
| Radiation-sensitive resin composition Grant 8,916,333 - Tomioka , et al. December 23, 2 | 2014-12-23 |
| Radiation-sensitive resin composition Grant 8,802,348 - Otsuka , et al. August 12, 2 | 2014-08-12 |
| Radiation-sensitive resin composition, polymer, and compound Grant 8,507,575 - Matsumura , et al. August 13, 2 | 2013-08-13 |
| Radiation-sensitive Resin Composition App 20130022926 - Tomioka; Hiroshi ; et al. | 2013-01-24 |
| Radiation-sensitive Resin Composition, Polymer, And Compound App 20120065291 - Matsumura; Nobuji ; et al. | 2012-03-15 |
| Radiation-sensitive resin composition Grant 8,084,188 - Otsuka , et al. December 27, 2 | 2011-12-27 |
| Radiation-sensitive Resin Composition App 20110143279 - SHIMOKAWA; Tsutomu ; et al. | 2011-06-16 |
| Radiation-sensitive Resin Composition App 20100203447 - Otsuka; Noboru ; et al. | 2010-08-12 |
| Radiation-sensitive Resin Composition App 20100068647 - Otsuka; Noboru ; et al. | 2010-03-18 |
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