Otsubo; Toru
Patent Applications and Registrations
Patent applications and USPTO patent grants for Otsubo; Toru.The latest application filed is for "plasma processing apparatus and plasma processing method".
- Otsubo; Toru - Fujisawa-shi JP
- Otsubo; Toru - Fujisawa JP
| Patent | Date |
|---|---|
| Plasma processing apparatus and plasma processing method App 20060144518 - Kaji; Tetsunori ; et al. | 2006-07-06 |
| Plasma processing apparatus and plasma processing method Grant 6,902,683 - Kaji , et al. June 7, 2 | 2005-06-07 |
| Plasma processing apparatus App 20050082006 - Kaji, Tetsunori ; et al. | 2005-04-21 |
| Processing apparatus with measuring unit and method Grant 6,797,529 - Otsubo , et al. September 28, 2 | 2004-09-28 |
| Plasma processing apparatus App 20040178180 - Kaji, Tetsunori ; et al. | 2004-09-16 |
| Apparatus for monitoring thickness of deposited layer in reactor and dry processing method Grant 6,750,977 - Otsubo , et al. June 15, 2 | 2004-06-15 |
| Plasma processing apparatus and processing method App 20040037971 - Otsubo, Toru | 2004-02-26 |
| Measuring apparatus and film formation method App 20030176000 - Otsubo, Toru ; et al. | 2003-09-18 |
| Measuring apparatus and film formation method Grant 6,537,832 - Otsubo , et al. March 25, 2 | 2003-03-25 |
| Plasma processing apparatus and plasma processing method App 20030010453 - Tanaka, Jyunichi ; et al. | 2003-01-16 |
| Measuring apparatus and film formation method App 20020164829 - Otsubo, Toru ; et al. | 2002-11-07 |
| Plasma processing apparatus and plasma processing method App 20020069971 - Kaji, Tetsunori ; et al. | 2002-06-13 |
| Apparatus for monitoring thickness of deposited layer in reactor and dry processing method App 20010043984 - Otsubo, Toru ; et al. | 2001-11-22 |
| Plasma processing apparatus and processing method App 20010037770 - Otsubo, Toru | 2001-11-08 |
| Plasma processing system and plasma processing method Grant 6,245,190 - Masuda , et al. June 12, 2 | 2001-06-12 |
| Plasma processing apparatus and plasma processing method Grant 6,197,151 - Kaji , et al. March 6, 2 | 2001-03-06 |
| Plasma processing method and apparatus Grant 6,158,383 - Watanabe , et al. December 12, 2 | 2000-12-12 |
| Plasma processing apparatus and plasma processing method Grant 6,129,806 - Kaji , et al. October 10, 2 | 2000-10-10 |
| Plasma processing method and apparatus using plasma produced by microwaves Grant 5,762,814 - Ohara , et al. June 9, 1 | 1998-06-09 |
| Plasma processing apparatus and processing method Grant 5,759,424 - Imatake , et al. June 2, 1 | 1998-06-02 |
| Method of and apparatus for removing foreign particles Grant 5,531,862 - Otsubo , et al. July 2, 1 | 1996-07-02 |
| Plasma processing apparatus using plasma produced by microwaves Grant 5,304,277 - Ohara , et al. April 19, 1 | 1994-04-19 |
| Insulating film forming method for semiconductor device interconnection Grant 5,275,977 - Otsubo , et al. January 4, 1 | 1994-01-04 |
| Processing apparatus and method for plasma processing Grant 5,134,965 - Tokuda , et al. August 4, 1 | 1992-08-04 |
| Apparatus for plasma processing Grant 4,985,109 - Otsubo , et al. January 15, 1 | 1991-01-15 |
| Apparatus and method for measuring the depth of fine engraved patterns Grant RE33,424 - Noguchi , et al. November 6, 1 | 1990-11-06 |
| Measuring apparatus for etching pits Grant 4,840,487 - Noguchi , et al. June 20, 1 | 1989-06-20 |
| Plasma processing method and apparatus for carrying out the same Grant 4,808,258 - Otsubo , et al. February 28, 1 | 1989-02-28 |
| Plasma processing apparatus Grant 4,776,918 - Otsubo , et al. October 11, 1 | 1988-10-11 |
| Apparatus for measuring difference in shallow level Grant 4,744,660 - Noguchi , et al. May 17, 1 | 1988-05-17 |
| Method of controlling dry etching by applying an AC voltage to the workpiece Grant 4,622,094 - Otsubo November 11, 1 | 1986-11-11 |
| Apparatus for measuring the depth of fine engraved patterns Grant 4,615,620 - Noguchi , et al. October 7, 1 | 1986-10-07 |
| Dry-etching apparatus Grant 4,487,678 - Noguchi , et al. December 11, 1 | 1984-12-11 |
| Etching method and apparatus Grant 4,479,848 - Otsubo , et al. October 30, 1 | 1984-10-30 |
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