loadpatents
name:-0.0070321559906006
name:-0.005511999130249
name:-0.0013282299041748
Otake; Nobuyuki Patent Filings

Otake; Nobuyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Otake; Nobuyuki.The latest application filed is for "layered substrate with a miscut angle comprising a silicon single crystal substrate and a group-iii nitride single crystal layer".

Company Profile
0.5.5
  • Otake; Nobuyuki - Nukata-gun JP
  • Otake; Nobuyuki - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Layered substrate with a miscut angle comprising a silicon single crystal substrate and a group-III nitride single crystal layer
Grant 9,728,609 - Narita , et al. August 8, 2
2017-08-08
Layered Substrate With A Miscut Angle Comprising A Silicon Single Crystal Substrate And A Group-iii Nitride Single Crystal Layer
App 20150053996 - Narita; Tetsuo ;   et al.
2015-02-26
Laser equipment
Grant 7,843,987 - Otake , et al. November 30, 2
2010-11-30
Laser equipment
App 20090238221 - Otake; Nobuyuki ;   et al.
2009-09-24
Laser equipment
Grant 7,564,890 - Otake , et al. July 21, 2
2009-07-21
Laser apparatus
App 20080212630 - Otake; Nobuyuki ;   et al.
2008-09-04
Laser equipment
App 20070217473 - Abe; Katsunori ;   et al.
2007-09-20
Laser equipment
App 20070217474 - Otake; Nobuyuki ;   et al.
2007-09-20
Pen points for writing instruments
Grant RE30,659 - Otake , et al. June 30, 1
1981-06-30
Pen points for writing instruments
Grant 4,076,428 - Otake , et al. February 28, 1
1978-02-28

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