Ota; Toshiyuki
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ota; Toshiyuki.The latest application filed is for "damper operation control device and damper operation control method for working vehicle".
- Ota; Toshiyuki - Komatsu N/A JP
- Ota; Toshiyuki - Komatsu-shi JP
- Ota; Toshiyuki - Tokyo JP
- Ota; Toshiyuki - Tsukuba JP
- Ota; Toshiyuki - Seoul KR
- Ota; Toshiyuki - Yokkaichi JP
- Ota; Toshiyuki - Kodaira JP
| Patent | Date |
|---|---|
| Damper operation control device and damper operation control method for working vehicle Grant 9,644,339 - Wada , et al. May 9, 2 | 2017-05-09 |
| Wheel loader Grant 9,037,358 - Ota , et al. May 19, 2 | 2015-05-19 |
| Travel damper control device for wheel loader Grant 8,538,640 - Ota September 17, 2 | 2013-09-17 |
| Damper Operation Control Device And Damper Operation Control Method For Working Vehicle App 20130073151 - Wada; Minoru ; et al. | 2013-03-21 |
| Travel Damper Control Device For Wheel Loader App 20120330517 - Ota; Toshiyuki | 2012-12-27 |
| Wheel Loader App 20120296533 - Ota; Toshiyuki ; et al. | 2012-11-22 |
| Rubber Composition And Pneumatic Tire Using The Same App 20100036006 - Ota; Toshiyuki | 2010-02-11 |
| Rubber Composition And Pneumatic Tire Using The Same App 20090308513 - Ota; Toshiyuki | 2009-12-17 |
| Rubber Composition And Pneumatic Tire Using The Same App 20090306269 - Ota; Toshiyuki | 2009-12-10 |
| Sputtering Apparatus App 20090166195 - Kobayashi; Yukihiro ; et al. | 2009-07-02 |
| Radiation-sensitive resin composition Grant 6,727,032 - Suwa , et al. April 27, 2 | 2004-04-27 |
| Radiation-sensitive resin composition Grant 6,692,887 - Suwa , et al. February 17, 2 | 2004-02-17 |
| Radiation sensitive resin composition Grant RE37,179 - Yamachika , et al. May 15, 2 | 2001-05-15 |
| Chemically amplified resist composition Grant 6,114,086 - Kobayashi , et al. September 5, 2 | 2000-09-05 |
| Radiation sensitive resin composition Grant 6,048,666 - Niwa , et al. April 11, 2 | 2000-04-11 |
| Pneumatic tire including fluorine based oligomer Grant 6,035,911 - Matsumoto , et al. March 14, 2 | 2000-03-14 |
| Radiation sensitive resin composition and material for forming bumps containing the same Grant 5,965,328 - Sano , et al. October 12, 1 | 1999-10-12 |
| Positive photoresist composition Grant 5,942,369 - Ota , et al. August 24, 1 | 1999-08-24 |
| Chemically amplified resist composition Grant 5,916,729 - Kobayashi , et al. June 29, 1 | 1999-06-29 |
| Radiation sensitive resin composition Grant 5,679,495 - Yamachika , et al. October 21, 1 | 1997-10-21 |
| Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups Grant 5,672,459 - Inomata , et al. September 30, 1 | 1997-09-30 |
| Chemically amplified resist composition Grant 5,629,135 - Kobayashi , et al. May 13, 1 | 1997-05-13 |
| Chemically amplified resist Grant 5,580,695 - Murata , et al. December 3, 1 | 1996-12-03 |
| Radiation sensitive resin composition Grant 5,494,777 - Shiraki , et al. February 27, 1 | 1996-02-27 |
| Negative type radiation-sensitive resin composition Grant 5,376,498 - Kajita , et al. December 27, 1 | 1994-12-27 |
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