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Patent applications and USPTO patent grants for Ostermayer, Jr.; Frederick W..The latest application filed is for "grating fabrication using electron beam lithography".
Patent | Date |
---|---|
Grating fabrication using electron beam lithography Grant 5,413,884 - Koch , et al. May 9, 1 | 1995-05-09 |
Process of producing devices with photoelectrochemically produced gratings Grant 4,622,114 - Glass , et al. November 11, 1 | 1986-11-11 |
Photoelectrochemical etching of n-type gallium arsenide Grant 4,482,442 - Kohl , et al. November 13, 1 | 1984-11-13 |
Etching of optical surfaces Grant 4,415,414 - Burton , et al. November 15, 1 | 1983-11-15 |
Photoelectrochemical processing of III-V semiconductors Grant 4,404,072 - Kohl , et al. September 13, 1 | 1983-09-13 |
Photoelectrochemical gold plating process Grant 4,399,004 - Buckley , et al. August 16, 1 | 1983-08-16 |
Mask structures for photoetching procedures Grant 4,391,683 - Buckley , et al. July 5, 1 | 1983-07-05 |
Photoelectrochemical etching of semiconductors Grant 4,369,099 - Kohl , et al. January 18, 1 | 1983-01-18 |
Optical inspection of gold surfaces Grant 4,278,353 - Ostermayer, Jr. July 14, 1 | 1981-07-14 |
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