OSHIKIRI; Tomoya

Patent Applications and Registrations

Patent applications and USPTO patent grants for OSHIKIRI; Tomoya.The latest application filed is for "light absorbing device, manufacturing method thereof, and photoelectrode".

Company Profile

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OSHIKIRI; Tomoya - Sapporo-shi Hokkaido
Oshikiri; Tomoya - Yokohama JP
Oshikiri; Tomoya - Yokohama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Light Absorbing Device, Manufacturing Method Thereof, And Photoelectrode App 20210294009 - MISAWA; Hiroaki ; et al.	2021-09-23
Polymer and method for producing same Grant 9,840,568 - Oshikiri , et al. December 12, 2	2017-12-12
Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions Grant 9,733,564 - Yasuda , et al. August 15, 2	2017-08-15
Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate Grant 9,527,938 - Yasuda , et al. December 27, 2	2016-12-27
Polymer for lithography Grant 9,296,842 - Yasuda , et al. March 29, 2	2016-03-29
Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate Grant 9,109,060 - Yasuda , et al. August 18, 2	2015-08-18
Copolymer For Lithography And Method Of Manufacturing The Same, Resist Composition, And Method Of Manufacturing Substrate App 20150099230 - Yasuda; Atsushi ; et al.	2015-04-09
Polymer And Method For Producing Same App 20140114034 - Oshikiri; Tomoya ; et al.	2014-04-24
Polymer For Lithography App 20130331533 - YASUDA; Atsushi ; et al.	2013-12-12
Copolymers For Lithography And Method For Producing Same, Resist Composition, Method For Producing Substrate With Pattern Formed Thereupon, Method For Evaluating Copolymers, And Method For Analyzing Copolymer Compositions App 20130224654 - Yasuda; Atsushi ; et al.	2013-08-29
Method For Producing Polymer, Polymer For Lithography, Resist Composition, And Method For Producing Substrate App 20120115086 - Yasuda; Atsushi ; et al.	2012-05-10

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