Osawa; Morimi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Osawa; Morimi.The latest application filed is for "mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure".

Company Profile

0.11.10

Osawa; Morimi - Kawasaki N/A JP
Osawa; Morimi - Kawaski JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure Grant 8,553,198 - Yao , et al. October 8, 2	2013-10-08
Mask Pattern Correction Device, Method of Correcting Mask Pattern, Light Exposure Correction Device, and Method of Correcting Light Exposure App 20120236279 - YAO; Teruyoshi ; et al.	2012-09-20
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure Grant 8,227,153 - Yao , et al. July 24, 2	2012-07-24
Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask Grant 7,971,160 - Osawa , et al. June 28, 2	2011-06-28
Semiconductor device and yield calculation method Grant 7,870,520 - Osawa January 11, 2	2011-01-11
Mask Pattern Correction Device, Method Of Correcting Mask Pattern, Light Exposure Correction Device, And Method Of Correcting Light Exposure App 20100209834 - YAO; Teruyoshi ; et al.	2010-08-19
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure Grant 7,732,107 - Yao , et al. June 8, 2	2010-06-08
Apparatus and method for correcting pattern dimension and photo mask and test photo mask Grant 7,601,471 - Osawa , et al. October 13, 2	2009-10-13
Semiconductor Device And Yield Calculation Method App 20080172644 - OSAWA; Morimi	2008-07-17
Creating Method Of Photomask Pattern Data, Photomask Created By Using The Photomask Pattern Data, And Manufacturing Method Of Semiconductor Apparatus Using The Photomask App 20080113280 - OSAWA; Morimi ; et al.	2008-05-15
Pattern size correcting device and pattern size correcting method Grant 7,240,307 - Aoyama , et al. July 3, 2	2007-07-03
Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method Grant 7,205,078 - Osawa , et al. April 17, 2	2007-04-17
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure App 20060018529 - Yao; Teruyoshi ; et al.	2006-01-26
Apparatus and method for correcting pattern dimension and photo mask and test photo mask App 20050233226 - Osawa, Morimi ; et al.	2005-10-20
Pattern size correcting device and pattern size correcting method App 20050121628 - Aoyama, Hajime ; et al.	2005-06-09
Light intensity simulation method, program product, and designing method of photomask Grant 6,862,726 - Futatsuya , et al. March 1, 2	2005-03-01
Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method App 20050040344 - Osawa, Morimi ; et al.	2005-02-24
Light intensity simulation method, program product, and designing method of photomask App 20040025138 - Futatsuya, Hiroki ; et al.	2004-02-05
Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method Grant 6,677,089 - Ogino , et al. January 13, 2	2004-01-13
Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method App 20020177056 - Ogino, Kozo ; et al.	2002-11-28

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