Osanai; Eiji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Osanai; Eiji.The latest application filed is for "positioning system and position measuring method for use in exposure apparatus".

Company Profile

0.13.0

Osanai; Eiji - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Positioning system and position measuring method for use in exposure apparatus Grant 6,285,444 - Osanai , et al. September 4, 2	2001-09-04
Positioning apparatus and exposure apparatus using the same Grant 6,028,376 - Osanai , et al. February 22, 2	2000-02-22
Stage feeding device Grant 5,939,852 - Akutsu , et al. August 17, 1	1999-08-17
Exposure apparatus and device manufacturing method using the same Grant 5,933,215 - Inoue , et al. August 3, 1	1999-08-03
Stage and exposure apparatus using same Grant 5,909,272 - Osanai , et al. June 1, 1	1999-06-01
Stage apparatus and exposure apparatus and device producing method using the same Grant 5,864,389 - Osanai , et al. January 26, 1	1999-01-26
Positioning system and method and apparatus for device manufacture Grant 5,858,587 - Yamane , et al. January 12, 1	1999-01-12
Stage apparatus and method of mounting a substrate on a substrate holding surface of a substrate chuck in which a substrate is mounted in a Z-axis direction Grant 5,717,482 - Akutsu , et al. February 10, 1	1998-02-10
Exposure apparatus including an antivibration control system Grant 5,610,686 - Osanai March 11, 1	1997-03-11
Parallel-moving apparatus and lens moving device in an exposing apparatus using the same Grant 5,376,988 - Osanai December 27, 1	1994-12-27
Positioning mechanism Grant 5,280,677 - Kubo , et al. January 25, 1	1994-01-25
Motion guiding device Grant 5,228,358 - Sakino , et al. July 20, 1	1993-07-20
Movement guiding mechanism Grant 5,040,431 - Sakino , et al. August 20, 1	1991-08-20

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