Osaki; Hitoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Osaki; Hitoshi.The latest application filed is for "pattern-forming method and radiation-sensitive composition".

Company Profile

15.13.24

Osaki; Hitoshi - Tokyo JP
Osaki; Hitoshi - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Modification method of surface of base, composition, and polymer Grant 11,426,761 - Komatsu , et al. August 30, 2	2022-08-30
Composition for pattern formation, and pattern-forming method Grant 11,370,872 - Hori , et al. June 28, 2	2022-06-28
Method and composition for selectively modifying base material surface Grant 11,211,246 - Komatsu , et al. December 28, 2	2021-12-28
Pattern-forming method Grant 11,195,714 - Osaki , et al. December 7, 2	2021-12-07
Pattern-forming Method And Radiation-sensitive Composition App 20210318614 - OSAKI; Hitoshi	2021-10-14
Method And Composition For Selectively Modifying Base Material Surface App 20210166935 - KOMATSU; Hiroyuki ; et al.	2021-06-03
Method and composition for selectively modifying base material surface Grant 10,950,438 - Komatsu , et al. March 16, 2	2021-03-16
Selective modification method of a base material surface Grant 10,923,342 - Osaki , et al. February 16, 2	2021-02-16
Pattern-forming Method App 20200402789 - OSAKI; Hitoshi ; et al.	2020-12-24
Modification Method Of Surface Of Base, Composition, And Polymer App 20200384499 - KOMATSU; Hiroyuki ; et al.	2020-12-10
Pattern-forming Method And Radiation-sensitive Composition App 20200379348 - OSAKI; Hitoshi	2020-12-03
Pattern-forming method and composition Grant 10,691,019 - Komatsu , et al.	2020-06-23
Method For Forming Cover Film App 20200148845 - OSAKI; Hitoshi	2020-05-14
Pattern-forming Method And Patterned Substrate App 20200118819 - KOMATSU; Hiroyuki ; et al.	2020-04-16
Modification Method Of Substrate Surface, And Composition And Polymer App 20200087530 - KOMATSU; Hiroyuki ; et al.	2020-03-19
Selective Modification Method Of A Base Material Surface App 20200051813 - OSAKI; Hitoshi ; et al.	2020-02-13
Substrate Treatment Method, Substrate Treatment System And Directed Self-assembling Material App 20200013617 - KOMATSU; Hiroyuki ; et al.	2020-01-09
Pattern-forming method and composition Grant 10,394,121 - Osaki A	2019-08-27
Pattern-forming Method And Composition App 20190235386 - Komatsu; Hiroyuki ; et al.	2019-08-01
Composition For Film Formation, Film-forming Method And Directed Self-assembly Lithography Process App 20190233561 - KOMATSU; Hiroyuki ; et al.	2019-08-01
Method And Composition For Selectively Modifying Base Material Surface App 20190198317 - KOMATSU; Hiroyuki ; et al.	2019-06-27
Method And Composition For Selectively Modifying Base Material Surface App 20190198316 - KOMATSU; Hiroyuki ; et al.	2019-06-27
Composition, Modification Method And Selective Modification Method Of Base Material Surface, Pattern-forming Method, And Polymer App 20190194365 - KOMATSU; Hiroyuki ; et al.	2019-06-27
Composition For Pattern Formation, And Pattern-forming Method App 20190135967 - HORI; Masafumi ; et al.	2019-05-09
Pattern-forming Method And Composition App 20190107777 - OSAKI; Hitoshi	2019-04-11
Pattern-forming method and composition Grant 10,175,575 - Osaki J	2019-01-08
Forming Method Of Contact Hole Pattern App 20180192524 - OSAKI; Hitoshi	2018-07-05
Pattern-forming method Grant 9,847,232 - Osaki , et al. December 19, 2	2017-12-19
Pattern-forming Method And Composition App 20170351174 - OSAKI; Hitoshi	2017-12-07
Pattern-forming Method App 20170255096 - OSAKI; Hitoshi	2017-09-07
Resist pattern-forming method and photoresist composition Grant 9,594,303 - Osaki , et al. March 14, 2	2017-03-14
Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound Grant 9,040,221 - Osaki , et al. May 26, 2	2015-05-26
Radiation-sensitive Resin Composition, Resist-patterning Method, And Block Copolymer App 20150093704 - OSAKI; Hitoshi	2015-04-02
Resist Pattern-forming Method And Photoresist Composition App 20150010866 - Osaki; Hitoshi ; et al.	2015-01-08
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, And Polymer And Compound App 20130122426 - Osaki; Hitoshi ; et al.	2013-05-16

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