Or; David T.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Or; David T..The latest application filed is for "multi-step pre-clean for selective metal gap fill".

Company Profile

1.20.22

Or; David T. - Santa Clara CA
Or; David T. - San Jose CA
Or; David T. - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi-step Pre-clean For Selective Metal Gap Fill App 20220270871 - Cen; Xi ; et al.	2022-08-25
Multi-step pre-clean for selective metal gap fill Grant 11,380,536 - Cen , et al. July 5, 2	2022-07-05
Method for forming a metal gapfill Grant 11,355,391 - Cen , et al. June 7, 2	2022-06-07
Multi-Step Pre-Clean for Selective Metal Gap Fill App 20210351032 - Cen; Xi ; et al.	2021-11-11
Method For Forming A Metal Gapfill App 20200303250 - CEN; Xi ; et al.	2020-09-24
Directional SiO.sub.2 etch using plasma pre-treatment and high-temperature etchant deposition Grant 9,653,318 - Or , et al. May 16, 2	2017-05-16
Plasma cleaning apparatus and method Grant 9,552,968 - Deehan , et al. January 24, 2	2017-01-24
Directional Sio2 Etch Using Plasma Pre-treatment And High-temperature Etchant Deposition App 20160247689 - OR; David T. ; et al.	2016-08-25
Etch Enhancement Via Controlled Introduction Of Chamber Contaminants App 20160133441 - GERMAIN; JONATHAN ; et al.	2016-05-12
Directional SiO.sub.2 etch using plasma pre-treatment and high-temperature etchant deposition Grant 9,245,769 - Or , et al. January 26, 2	2016-01-26
Directional SiO.sub.2 etch using low-temperature etchant deposition and plasma post-treatment Grant 9,202,745 - Or , et al. December 1, 2	2015-12-01
Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition Grant 9,177,780 - Or , et al. November 3, 2	2015-11-03
Process chamber lid design with built-in plasma source for short lifetime species Grant 9,004,006 - Kao , et al. April 14, 2	2015-04-14
Directional SIO.sub.2 etch using low-temperature etchant deposition and plasma post-treatment Grant 8,980,761 - Or , et al. March 17, 2	2015-03-17
Directional Sio2 Etch Using Plasma Pre-treatment And High-temperature Etchant Deposition App 20150072508 - OR; David T. ; et al.	2015-03-12
Directional Sio2 Etch Using Low-temperature Etchant Deposition And Plasma Post-treatment App 20140363979 - OR; David T. ; et al.	2014-12-11
Plasma Cleaning Apparatus And Method App 20140283872 - DEEHAN; Martin ; et al.	2014-09-25
Directional Sio2 Etch Using Plasma Pre-treatment And High-temperature Etchant Deposition App 20140193979 - OR; David T. ; et al.	2014-07-10
Apparatus For Providing Plasma To A Process Chamber App 20140165911 - KAO; CHIEN-TEH ; et al.	2014-06-19
Silicon oxide recess etch Grant 8,748,322 - Fung , et al. June 10, 2	2014-06-10
Plasma cleaning apparatus and method Grant 8,721,796 - Deehan , et al. May 13, 2	2014-05-13
Directional Sio2 Etch Using Low-temperature Etchant Deposition And Plasma Post-treatment App 20140094036 - OR; David T. ; et al.	2014-04-03
Selective etching of silicon nitride Grant 8,252,696 - Lu , et al. August 28, 2	2012-08-28
Process Chamber Lid Design With Built-in Plasma Source For Short Lifetime Species App 20110265721 - Kao; Chien-Teh ; et al.	2011-11-03
Direct real-time monitoring and feedback control of RF plasma output for wafer processing Grant 7,910,853 - Or , et al. March 22, 2	2011-03-22
Substrate support lift mechanism Grant 7,871,470 - Schieve , et al. January 18, 2	2011-01-18
Plasma Cleaning Apparatus And Method App 20100101602 - Deehan; Martin ; et al.	2010-04-29
Nf3/h2 Remote Plasma Process With High Etch Selectivity Of Psg/bpsg Over Thermal Oxide And Low Density Surface Defects App 20100099263 - Kao; Chien-Teh ; et al.	2010-04-22
Direct Real-time Monitoring And Feedback Control Of Rf Plasma Output For Wafer Processing App 20090218324 - Or; David T. ; et al.	2009-09-03
Selective Etching Of Silicon Nitride App 20090104782 - LU; XINLAING ; et al.	2009-04-23
Substrate support lift pin Grant D568,914 - Or , et al. May 13, 2	2008-05-13
Substrate Support Lift Mechanism App 20060240542 - Schieve; Eric W. ; et al.	2006-10-26
In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber App 20060051966 - Or; David T. ; et al.	2006-03-09
Reduced friction lift pin App 20050194100 - Or, David T. ; et al.	2005-09-08
Reduced friction lift pin Grant 6,887,317 - Or , et al. May 3, 2	2005-05-03
Substrate support lift mechanism App 20040177813 - Schieve, Eric W. ; et al.	2004-09-16
Reduced friction lift pin App 20040045509 - Or, David T. ; et al.	2004-03-11
300 mm CVD chamber design for metal-organic thin film deposition Grant 6,364,949 - Or , et al. April 2, 2	2002-04-02
Magnetron with cooling system for process chamber of processing system Grant 5,953,827 - Or , et al. September 21, 1	1999-09-21

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