Ooyabu; Jun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ooyabu; Jun.The latest application filed is for "plasma processing method and apparatus".

Company Profile

0.13.12

Ooyabu; Jun - Nirasaki JP
Ooyabu; Jun - Yamanashi JP
Ooyabu; Jun - Nirasaki-shi JP
Ooyabu; Jun - Ryuo-cho JP
Ooyabu; Jun - Yamanashi-Ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing method and apparatus Grant 8,512,510 - Koshiishi , et al. August 20, 2	2013-08-20
Flow rate control system and shower plate used for partial pressure control system Grant 8,109,288 - Nagaoka , et al. February 7, 2	2012-02-07
Plasma Processing Method And Apparatus App 20110214813 - Koshiishi; Akira ; et al.	2011-09-08
Ring mechanism, and plasma processing device using the ring mechanism Grant 7,882,800 - Koshiishi , et al. February 8, 2	2011-02-08
Plasma Processing Method And Apparatus App 20100043974 - Koshiishi; Akira ; et al.	2010-02-25
Focus ring and plasma processing apparatus Grant 7,658,816 - Koshiishi , et al. February 9, 2	2010-02-09
Plasma processing apparatus and method Grant 7,506,610 - Koshiishi , et al. March 24, 2	2009-03-24
Plasma processing apparatus and method, and electrode plate for plasma processing apparatus Grant 7,494,561 - Koshiishi , et al. February 24, 2	2009-02-24
Partial pressure control system, flow rate control system and shower plate used for partial pressure control system Grant 7,481,240 - Nagaoka , et al. January 27, 2	2009-01-27
Flow rate control system and shower plate used for partial pressure control system App 20080300728 - Nagaoka; Hideki ; et al.	2008-12-04
Focus ring and plasma processing apparatus App 20070169891 - Koshiishi; Akira ; et al.	2007-07-26
Plasma processing method and apparatus App 20060000803 - Koshiishi; Akira ; et al.	2006-01-05
Plasma processing apparatus and method, and electrode plate for plasma processing apparatus App 20050269292 - Koshiishi, Akira ; et al.	2005-12-08
Plasma processing apparatus and method App 20050257743 - Koshiishi, Akira ; et al.	2005-11-24
Plasma processing apparatus App 20050106869 - Ooyabu, Jun ; et al.	2005-05-19
Partial pressure control system, flow rate control system and shower plate used for partial pressure control system App 20050029369 - Nagaoka, Hideki ; et al.	2005-02-10
Ring mechanism, and plasma processing device using the ring mechanism App 20050005859 - Koshiishi, Akira ; et al.	2005-01-13
Worktable device and plasma processing apparatus for semiconductor process Grant 6,723,202 - Nagaiwa , et al. April 20, 2	2004-04-20
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Grant 6,576,860 - Koshimizu , et al. June 10, 2	2003-06-10
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate App 20020179577 - Koshimizu, Chishio ; et al.	2002-12-05
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Grant 6,426,477 - Koshimizu , et al. July 30, 2	2002-07-30
Worktable device and plasma processing apparatus for semiconductor process App 20020029745 - Nagaiwa, Toshifumi ; et al.	2002-03-14
Plasma processing system Grant 6,072,147 - Koshiishi , et al. June 6, 2	2000-06-06
Upper electrode for manufacturing semiconductors Grant D412,513 - Ooyabu August 3, 1	1999-08-03

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