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name:-0.023527860641479
name:-0.017783880233765
name:-0.0013649463653564
OOYA; Yoshinobu Patent Filings

OOYA; Yoshinobu

Patent Applications and Registrations

Patent applications and USPTO patent grants for OOYA; Yoshinobu.The latest application filed is for "plasma processing apparatus".

Company Profile
1.19.19
  • OOYA; Yoshinobu - Miyagi JP
  • Ooya; Yoshinobu - Nirasaki JP
  • Ooya; Yoshinobu - Nirasaki City JP
  • Ooya; Yoshinobu - Yamanashi N/A JP
  • Ooya; Yoshinobu - Nirasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma Processing Apparatus
App 20210272780 - TOMURA; Maju ;   et al.
2021-09-02
Etching method
Grant 10,410,877 - Takashima , et al. Sept
2019-09-10
Etching method
Grant 10,381,237 - Takeda , et al. A
2019-08-13
Etching Method
App 20180261465 - TAKEDA; Ryohei ;   et al.
2018-09-13
Plasma Processing Apparatus
App 20180174805 - TOMURA; Maju ;   et al.
2018-06-21
Etching method
Grant 9,997,374 - Takeda , et al. June 12, 2
2018-06-12
Etching method and plasma processing apparatus
Grant 9,922,806 - Tomura , et al. March 20, 2
2018-03-20
Method for calculating distance, method for neutralizing electrostatic chuck, and processing apparatus
Grant 9,812,996 - Nagai , et al. November 7, 2
2017-11-07
Etching Method
App 20170178921 - TAKEDA; Ryohei ;   et al.
2017-06-22
Etching Method
App 20170178922 - TAKASHIMA; Ryuichi ;   et al.
2017-06-22
Etching method and etching apparatus
Grant 9,659,789 - Takeda , et al. May 23, 2
2017-05-23
Etching Method And Plasma Processing Apparatus
App 20160379856 - TOMURA; Maju ;   et al.
2016-12-29
Plasma processing apparatus
Grant 9,478,387 - Ooya , et al. October 25, 2
2016-10-25
Etching Method And Etching Apparatus
App 20160189975 - TAKEDA; Ryohei ;   et al.
2016-06-30
Method For Calculating Distance, Method For Neutralizing Electrostatic Chuck, And Processing Apparatus
App 20150162233 - NAGAI; Kenji ;   et al.
2015-06-11
Etching method
Grant 8,906,808 - Takashima , et al. December 9, 2
2014-12-09
Substrate processing apparatus and substrate processing method
Grant 8,790,489 - Honda , et al. July 29, 2
2014-07-29
Plasma Processing Apparatus
App 20140102638 - Ooya; Yoshinobu ;   et al.
2014-04-17
Plasma processing method and plasma processing apparatus
Grant 8,642,478 - Ooya , et al. February 4, 2
2014-02-04
Plasma etching apparatus, plasma etching method and storage medium
Grant 8,641,916 - Yatsuda , et al. February 4, 2
2014-02-04
Etching Method
App 20140011363 - TAKASHIMA; Ryuichi ;   et al.
2014-01-09
Plasma processing method
Grant 8,420,547 - Ooya April 16, 2
2013-04-16
Plasma etching method, plasma etching apparatus and storage medium
Grant 8,383,001 - Mochiki , et al. February 26, 2
2013-02-26
Plasma Processing Method And Plasma Processing Apparatus
App 20120214313 - Ooya; Yoshinobu ;   et al.
2012-08-23
Substrate Processing Apparatus And Substrate Processing Method
App 20120000886 - HONDA; Masanobu ;   et al.
2012-01-05
Plasma Processing Apparatus And Method
App 20110272097 - Koshiishi; Akira ;   et al.
2011-11-10
Plasma processing apparatus and method
Grant 7,988,816 - Koshiishi , et al. August 2, 2
2011-08-02
Plasma Etching Method, Plasma Etching Apparatus And Storage Medium
App 20100213162 - Mochiki; Hiromasa ;   et al.
2010-08-26
Plasma Processing Method
App 20100210114 - OOYA; Yoshinobu
2010-08-19
Plasma Etching Apparatus, Plasma Etching Method And Storage Medium
App 20100190350 - YATSUDA; Koichi ;   et al.
2010-07-29
Plasma Etching Method, Plasma Etching Apparatus, Control Program And Computer-readable Storage Medium
App 20090170335 - TANAKA; Satoshi ;   et al.
2009-07-02
Plasma processing apparatus and method
App 20060066247 - Koshiishi; Akira ;   et al.
2006-03-30
Plasma ashing method
App 20050106875 - Kubota, Kazuhiro ;   et al.
2005-05-19

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