loadpatents
Patent applications and USPTO patent grants for OOTANI; Michitaka.The latest application filed is for "solvent composition".
Patent | Date |
---|---|
Solvent Composition App 20210238507 - OSAFUNE; Kanako ;   et al. | 2021-08-05 |
Process for preparation of 2-fluoroacrylic esters Grant 8,450,520 - Ishii , et al. May 28, 2 | 2013-05-28 |
Process for Preparation of 2-Fluoroacrylic Esters App 20120059187 - Ishii; Akihiro ;   et al. | 2012-03-08 |
Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern Grant 8,115,036 - Komoriya , et al. February 14, 2 | 2012-02-14 |
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern App 20100204422 - Komoriya; Haruhiko ;   et al. | 2010-08-12 |
Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern Grant 7,736,835 - Komoriya , et al. June 15, 2 | 2010-06-15 |
Ester compound, polymer, resist composition, and patterning process Grant 7,666,967 - Harada , et al. February 23, 2 | 2010-02-23 |
Resist protective coating material and patterning process Grant 7,569,323 - Hatakeyama , et al. August 4, 2 | 2009-08-04 |
Polymer, resist composition and patterning process Grant 7,488,567 - Harada , et al. February 10, 2 | 2009-02-10 |
Top coat composition Grant 7,402,626 - Maeda , et al. July 22, 2 | 2008-07-22 |
Polymer, resist composition and patterning process Grant 7,378,218 - Harada , et al. May 27, 2 | 2008-05-27 |
Polymer, resist protective coating material, and patterning process Grant 7,354,693 - Hatakeyama , et al. April 8, 2 | 2008-04-08 |
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern App 20080003517 - Komoriya; Haruhiko ;   et al. | 2008-01-03 |
Polymerizable ester compounds Grant 7,276,623 - Harada , et al. October 2, 2 | 2007-10-02 |
Novel ester compound, polymer, resist composition, and patterning process App 20070128555 - Harada; Yuji ;   et al. | 2007-06-07 |
Process for producing top coat film used in lithography App 20070087125 - Maeda; Kazuhiko ;   et al. | 2007-04-19 |
Resist protective coating material and patterning process App 20070026341 - Hatakeyama; Jun ;   et al. | 2007-02-01 |
Polymers, resist compositions and patterning process Grant 7,169,869 - Harada , et al. January 30, 2 | 2007-01-30 |
Polymer, resist composition and patterning process App 20060269871 - Harada; Yuji ;   et al. | 2006-11-30 |
Novel polymerizable ester compounds App 20060269870 - Harada; Yuji ;   et al. | 2006-11-30 |
Polymer, resist composition and patterning process App 20060177765 - Harada; Yuji ;   et al. | 2006-08-10 |
Polymers, resist compositions and patterning process Grant 7,005,228 - Hatakeyama , et al. February 28, 2 | 2006-02-28 |
Polymer, resist protective coating material, and patterning process App 20060029884 - Hatakeyama; Jun ;   et al. | 2006-02-09 |
Polymers, resist compositions and patterning process App 20050267275 - Harada, Yuji ;   et al. | 2005-12-01 |
Top coat composition App 20050250898 - Maeda, Kazuhiko ;   et al. | 2005-11-10 |
Polymers, resist compositions and patterning process Grant 6,946,235 - Harada , et al. September 20, 2 | 2005-09-20 |
Polymers, resist compositions and patterning process Grant 6,933,095 - Harada , et al. August 23, 2 | 2005-08-23 |
Esters, polymers, resist compositions and patterning process Grant 6,916,592 - Harada , et al. July 12, 2 | 2005-07-12 |
Polymers, resist compositions and patterning process Grant 6,872,514 - Harada , et al. March 29, 2 | 2005-03-29 |
Polymers, resist compositions and patterning process Grant 6,864,037 - Hatakeyama , et al. March 8, 2 | 2005-03-08 |
Polymers, resist compositions and patterning process Grant 6,861,197 - Harada , et al. March 1, 2 | 2005-03-01 |
Chemically amplified resist compositions and patterning process Grant 6,855,477 - Hatakeyama , et al. February 15, 2 | 2005-02-15 |
Polymers, resist compositions and patterning process Grant 6,824,955 - Harada , et al. November 30, 2 | 2004-11-30 |
Resist compositions and patterning process Grant 6,790,586 - Hatakeyama , et al. September 14, 2 | 2004-09-14 |
Positive resist composition and process for forming resist pattern using same Grant 6,723,485 - Tsutsumi , et al. April 20, 2 | 2004-04-20 |
Polymers, resist compositions and patterning process Grant 6,710,148 - Harada , et al. March 23, 2 | 2004-03-23 |
Polymers, resist compositions and patterning process App 20040030079 - Harada, Yuji ;   et al. | 2004-02-12 |
Fluorinated polymer App 20040023176 - Harada, Yuji ;   et al. | 2004-02-05 |
Ester compounds Grant 6,680,389 - Harada , et al. January 20, 2 | 2004-01-20 |
Novel esters, polymers, resist compositions and patterning process App 20030219678 - Harada, Yuji ;   et al. | 2003-11-27 |
Polymers, resist compositions and patterning process App 20030215739 - Harada, Yuji ;   et al. | 2003-11-20 |
Polymers, resist compositions and patterning process App 20030165773 - Harada, Yuji ;   et al. | 2003-09-04 |
Ester compounds Grant 6,603,037 - Harada , et al. August 5, 2 | 2003-08-05 |
Chemically amplified resist compositions and patterning process App 20030099901 - Hatakeyama, Jun ;   et al. | 2003-05-29 |
Novel Ester Compounds App 20030100791 - Harada, Yuji ;   et al. | 2003-05-29 |
Polymers, resist compositions and patterning process App 20030082479 - Hatakeyama, Jun ;   et al. | 2003-05-01 |
Polymers, resist compositions and patterning process App 20030031952 - Harada, Yuji ;   et al. | 2003-02-13 |
Polymers, resist compositions and patterning process App 20030031953 - Hatakeyama, Jun ;   et al. | 2003-02-13 |
Polymers, resist compositions and patterning process App 20030008231 - Harada, Yuji ;   et al. | 2003-01-09 |
Novel ester compounds App 20020198390 - Harada, Yuji ;   et al. | 2002-12-26 |
Polymers, resist compositions and patterning process App 20020161148 - Harada, Yuji ;   et al. | 2002-10-31 |
Resist compositions and patterning process App 20020051935 - Hatakeyama, Jun ;   et al. | 2002-05-02 |
Polymers, resist compositions and patterning process App 20020051936 - Harada, Yuji ;   et al. | 2002-05-02 |
Polymers, resist compositions and patterning process App 20020048724 - Harada, Yuji ;   et al. | 2002-04-25 |
Octafluorotricyclodecane derivatives and processes for producing same App 20020022740 - Miyazawa, Satoru ;   et al. | 2002-02-21 |
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