loadpatents
name:-0.038111925125122
name:-0.030648946762085
name:-0.00095987319946289
OOTANI; Michitaka Patent Filings

OOTANI; Michitaka

Patent Applications and Registrations

Patent applications and USPTO patent grants for OOTANI; Michitaka.The latest application filed is for "solvent composition".

Company Profile
0.26.30
  • OOTANI; Michitaka - Saitama JP
  • Ootani; Michitaka - Kawagoe JP
  • Ootani; Michitaka - Kawagoe-shi JP
  • Ootani; Michitaka - Fujimino-shi JP
  • Ootani; Michitaka - Tokyo JP
  • Ootani; Michitaka - Saitama-ken JP
  • Ootani, Michitaka - Chiyoda-ku JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Solvent Composition
App 20210238507 - OSAFUNE; Kanako ;   et al.
2021-08-05
Process for preparation of 2-fluoroacrylic esters
Grant 8,450,520 - Ishii , et al. May 28, 2
2013-05-28
Process for Preparation of 2-Fluoroacrylic Esters
App 20120059187 - Ishii; Akihiro ;   et al.
2012-03-08
Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
Grant 8,115,036 - Komoriya , et al. February 14, 2
2012-02-14
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern
App 20100204422 - Komoriya; Haruhiko ;   et al.
2010-08-12
Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
Grant 7,736,835 - Komoriya , et al. June 15, 2
2010-06-15
Ester compound, polymer, resist composition, and patterning process
Grant 7,666,967 - Harada , et al. February 23, 2
2010-02-23
Resist protective coating material and patterning process
Grant 7,569,323 - Hatakeyama , et al. August 4, 2
2009-08-04
Polymer, resist composition and patterning process
Grant 7,488,567 - Harada , et al. February 10, 2
2009-02-10
Top coat composition
Grant 7,402,626 - Maeda , et al. July 22, 2
2008-07-22
Polymer, resist composition and patterning process
Grant 7,378,218 - Harada , et al. May 27, 2
2008-05-27
Polymer, resist protective coating material, and patterning process
Grant 7,354,693 - Hatakeyama , et al. April 8, 2
2008-04-08
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern
App 20080003517 - Komoriya; Haruhiko ;   et al.
2008-01-03
Polymerizable ester compounds
Grant 7,276,623 - Harada , et al. October 2, 2
2007-10-02
Novel ester compound, polymer, resist composition, and patterning process
App 20070128555 - Harada; Yuji ;   et al.
2007-06-07
Process for producing top coat film used in lithography
App 20070087125 - Maeda; Kazuhiko ;   et al.
2007-04-19
Resist protective coating material and patterning process
App 20070026341 - Hatakeyama; Jun ;   et al.
2007-02-01
Polymers, resist compositions and patterning process
Grant 7,169,869 - Harada , et al. January 30, 2
2007-01-30
Polymer, resist composition and patterning process
App 20060269871 - Harada; Yuji ;   et al.
2006-11-30
Novel polymerizable ester compounds
App 20060269870 - Harada; Yuji ;   et al.
2006-11-30
Polymer, resist composition and patterning process
App 20060177765 - Harada; Yuji ;   et al.
2006-08-10
Polymers, resist compositions and patterning process
Grant 7,005,228 - Hatakeyama , et al. February 28, 2
2006-02-28
Polymer, resist protective coating material, and patterning process
App 20060029884 - Hatakeyama; Jun ;   et al.
2006-02-09
Polymers, resist compositions and patterning process
App 20050267275 - Harada, Yuji ;   et al.
2005-12-01
Top coat composition
App 20050250898 - Maeda, Kazuhiko ;   et al.
2005-11-10
Polymers, resist compositions and patterning process
Grant 6,946,235 - Harada , et al. September 20, 2
2005-09-20
Polymers, resist compositions and patterning process
Grant 6,933,095 - Harada , et al. August 23, 2
2005-08-23
Esters, polymers, resist compositions and patterning process
Grant 6,916,592 - Harada , et al. July 12, 2
2005-07-12
Polymers, resist compositions and patterning process
Grant 6,872,514 - Harada , et al. March 29, 2
2005-03-29
Polymers, resist compositions and patterning process
Grant 6,864,037 - Hatakeyama , et al. March 8, 2
2005-03-08
Polymers, resist compositions and patterning process
Grant 6,861,197 - Harada , et al. March 1, 2
2005-03-01
Chemically amplified resist compositions and patterning process
Grant 6,855,477 - Hatakeyama , et al. February 15, 2
2005-02-15
Polymers, resist compositions and patterning process
Grant 6,824,955 - Harada , et al. November 30, 2
2004-11-30
Resist compositions and patterning process
Grant 6,790,586 - Hatakeyama , et al. September 14, 2
2004-09-14
Positive resist composition and process for forming resist pattern using same
Grant 6,723,485 - Tsutsumi , et al. April 20, 2
2004-04-20
Polymers, resist compositions and patterning process
Grant 6,710,148 - Harada , et al. March 23, 2
2004-03-23
Polymers, resist compositions and patterning process
App 20040030079 - Harada, Yuji ;   et al.
2004-02-12
Fluorinated polymer
App 20040023176 - Harada, Yuji ;   et al.
2004-02-05
Ester compounds
Grant 6,680,389 - Harada , et al. January 20, 2
2004-01-20
Novel esters, polymers, resist compositions and patterning process
App 20030219678 - Harada, Yuji ;   et al.
2003-11-27
Polymers, resist compositions and patterning process
App 20030215739 - Harada, Yuji ;   et al.
2003-11-20
Polymers, resist compositions and patterning process
App 20030165773 - Harada, Yuji ;   et al.
2003-09-04
Ester compounds
Grant 6,603,037 - Harada , et al. August 5, 2
2003-08-05
Chemically amplified resist compositions and patterning process
App 20030099901 - Hatakeyama, Jun ;   et al.
2003-05-29
Novel Ester Compounds
App 20030100791 - Harada, Yuji ;   et al.
2003-05-29
Polymers, resist compositions and patterning process
App 20030082479 - Hatakeyama, Jun ;   et al.
2003-05-01
Polymers, resist compositions and patterning process
App 20030031952 - Harada, Yuji ;   et al.
2003-02-13
Polymers, resist compositions and patterning process
App 20030031953 - Hatakeyama, Jun ;   et al.
2003-02-13
Polymers, resist compositions and patterning process
App 20030008231 - Harada, Yuji ;   et al.
2003-01-09
Novel ester compounds
App 20020198390 - Harada, Yuji ;   et al.
2002-12-26
Polymers, resist compositions and patterning process
App 20020161148 - Harada, Yuji ;   et al.
2002-10-31
Resist compositions and patterning process
App 20020051935 - Hatakeyama, Jun ;   et al.
2002-05-02
Polymers, resist compositions and patterning process
App 20020051936 - Harada, Yuji ;   et al.
2002-05-02
Polymers, resist compositions and patterning process
App 20020048724 - Harada, Yuji ;   et al.
2002-04-25
Octafluorotricyclodecane derivatives and processes for producing same
App 20020022740 - Miyazawa, Satoru ;   et al.
2002-02-21

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