Ooe; Masayuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ooe; Masayuki.The latest application filed is for "positive photosensitive resin composition, method for producing patterned cured film and electronic component".

Company Profile

0.10.7

Ooe; Masayuki - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Positive photosensitive resin composition, method for producing patterned cured film and electronic component Grant 9,134,608 - Kotani , et al. September 15, 2	2015-09-15
Photosensitive polymer composition, method of producing pattern and electronic parts Grant 8,852,726 - Ooe , et al. October 7, 2	2014-10-07
Positive Photosensitive Resin Composition, Method For Producing Patterned Cured Film And Electronic Component App 20120288798 - Kotani; Masashi ; et al.	2012-11-15
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Grant 8,304,149 - Nunomura , et al. November 6, 2	2012-11-06
Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts App 20120263920 - Ooe; Masayuki ; et al.	2012-10-18
Photosensitive polymer composition, method of producing pattern and electronic parts Grant 8,231,959 - Ooe , et al. July 31, 2	2012-07-31
Photosensitive Polymer Composition, Method Of Forming Relief Patterns, And Electronic Equipment App 20110076458 - NUNOMURA; Masataka ; et al.	2011-03-31
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Grant 7,851,128 - Nunomura , et al. December 14, 2	2010-12-14
Positive photosensitive resin composition, method for forming pattern, and electronic part Grant 7,638,254 - Hattori , et al. December 29, 2	2009-12-29
Positive Photosensitive Resin Composition, Method For Forming Pattern, And Electronic Part App 20090011364 - HATTORI; Takashi ; et al.	2009-01-08
Positive photosensitive resin composition, method for forming pattern, and electronic part Grant 7,435,525 - Hattori , et al. October 14, 2	2008-10-14
Positive photosensitive resin composition, method for forming pattern, and electronic part App 20070122733 - Hattori; Takashi ; et al.	2007-05-31
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment App 20070072122 - Nunomura; Masataka ; et al.	2007-03-29
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Grant 7,150,947 - Nunomura , et al. December 19, 2	2006-12-19
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment App 20040029045 - Nunomura, Masataka ; et al.	2004-02-12

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