Onozawa; Kazuhisa
Patent Applications and Registrations
Patent applications and USPTO patent grants for Onozawa; Kazuhisa.The latest application filed is for "composition containing siloxane compound and phenol compound".
- Onozawa; Kazuhisa - Tokyo JP
| Patent | Date |
|---|---|
| Composition containing siloxane compound and phenol compound Grant 7,737,291 - Osasawara , et al. June 15, 2 | 2010-06-15 |
| Composition Containing Siloxane Compound and Phenol Compound App 20070232821 - Ogasawara; Kunio ; et al. | 2007-10-04 |
| Process of forming thin film and precursor for chemical vapor deposition Grant 6,743,933 - Onozawa , et al. June 1, 2 | 2004-06-01 |
| Precursor for chemical vapor deposition and thin film formation process using the same App 20040086643 - Onozawa, Kazuhisa ; et al. | 2004-05-06 |
| Process of forming thin film and precursor for chemical vapor deposition App 20030124251 - Onozawa, Kazuhisa ; et al. | 2003-07-03 |
| Process of producing a ruthenium or ruthenium oxide thin film Grant 6,316,064 - Onozawa , et al. November 13, 2 | 2001-11-13 |
| Method for processing waste gas exhausted from chemical vapor and deposition equipment Grant 5,855,651 - Kurita , et al. January 5, 1 | 1999-01-05 |
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