Onodera; Haruna
Patent Applications and Registrations
Patent applications and USPTO patent grants for Onodera; Haruna.The latest application filed is for "method for regenerating highly water-absorbing polymer, method for producing highly water-absorbing recycled polymer, and use of alkali metal ion source".
- Onodera; Haruna - Sapporo-shi Hokkaido
- Onodera; Haruna - Hino JP
| Patent | Date |
|---|---|
| Method For Regenerating Highly Water-absorbing Polymer, Method For Producing Highly Water-absorbing Recycled Polymer, And Use Of Alkali Metal Ion Source App 20210039072 - Ito; Ryusei ; et al. | 2021-02-11 |
| Method to reduce radiation dose delivered by imaging system Grant 8,798,228 - Chandrashekarappa , et al. August 5, 2 | 2014-08-05 |
| Method To Reduce Radiation Dose Delivered By Imaging System App 20120224665 - Chandrashekarappa; Arun Kumar ; et al. | 2012-09-06 |
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