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Patent applications and USPTO patent grants for Onoda; Hajime.The latest application filed is for "apparatus and method for cleaning semiconductor substrate".
Patent | Date |
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Apparatus and method for cleaning semiconductor substrate Grant 9,761,466 - Ogawa , et al. September 12, 2 | 2017-09-12 |
Apparatus And Method For Cleaning Semiconductor Substrate App 20140238452 - OGAWA; Yoshihiro ;   et al. | 2014-08-28 |
Apparatus and method for cleaning semiconductor substrate Grant 8,758,521 - Ogawa , et al. June 24, 2 | 2014-06-24 |
Substrate Cleaning Apparatus And Substrate Cleaning Method App 20120031441 - Tomita; Hiroshi ;   et al. | 2012-02-09 |
Substrate cleaning apparatus and substrate cleaning method Grant 8,066,020 - Tomita , et al. November 29, 2 | 2011-11-29 |
Apparatus And Method For Cleaning Semiconductor Substrate App 20110067734 - OGAWA; Yoshihiro ;   et al. | 2011-03-24 |
Semiconductor manufacturing apparatus for use in process of cleaning semiconductor substrate and method of manufacturing semiconductor device using the same App 20080006295 - Miyazaki; Kunihiro ;   et al. | 2008-01-10 |
Substrate cleaning apparatus and substrate cleaning method App 20070095363 - Tomita; Hiroshi ;   et al. | 2007-05-03 |
Diaphragm gas meter Grant 7,032,447 - Onoda April 25, 2 | 2006-04-25 |
Diaphragm gas meter App 20050155424 - Onoda, Hajime | 2005-07-21 |
Drying apparatus and drying method Grant 6,412,501 - Onoda , et al. July 2, 2 | 2002-07-02 |
Substrate drying apparatus Grant 5,657,553 - Tarui , et al. August 19, 1 | 1997-08-19 |
Process for producing synthetic quartz glass powder Grant 5,516,350 - Onoda , et al. May 14, 1 | 1996-05-14 |
Automatic power generation type flowmeter Grant 5,199,307 - Onoda , et al. April 6, 1 | 1993-04-06 |
Low meter system provided with a pulse generator Grant 4,265,127 - Onoda May 5, 1 | 1981-05-05 |
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