loadpatents
Patent applications and USPTO patent grants for Ono; Tetsuo.The latest application filed is for "plasma processing apparatus and plasma processing method".
Patent | Date |
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Plasma processing apparatus and plasma processing method Grant 11,417,501 - Shiina , et al. August 16, 2 | 2022-08-16 |
Plasma Processing Apparatus And Plasma Processing Method App 20210398777 - SHIINA; Masayuki ;   et al. | 2021-12-23 |
Dry etching method Grant 11,018,014 - Shen , et al. May 25, 2 | 2021-05-25 |
Plasma processing apparatus and plasma processing method Grant 10,727,088 - Morimoto , et al. | 2020-07-28 |
Plasma Processing Apparatus App 20200161092 - Inoue; Yoshiharu ;   et al. | 2020-05-21 |
Plasma processing apparatus Grant 10,600,619 - Inoue , et al. | 2020-03-24 |
Plasma processing apparatus and plasma processing method Grant 10,559,481 - Morimoto , et al. Feb | 2020-02-11 |
Plasma processing apparatus Grant 10,522,331 - Ohgoshi , et al. Dec | 2019-12-31 |
Plasma Processing Method And Plasma Processing Device App 20180366335 - TANAKA; Junya ;   et al. | 2018-12-20 |
Method and apparatus for plasma processing Grant 10,121,640 - Muto , et al. November 6, 2 | 2018-11-06 |
Plasma processing method and plasma processing device Grant 10,090,162 - Tanaka , et al. October 2, 2 | 2018-10-02 |
Plasma Processing Method And Plasma Processing Device App 20180047573 - Tanaka; Junya ;   et al. | 2018-02-15 |
Plasma Processing Apparatus And Plasma Processing Method App 20170092468 - SHIINA; Masayuki ;   et al. | 2017-03-30 |
Plasma Processing Apparatus App 20170040143 - Ohgoshi; Yasuo ;   et al. | 2017-02-09 |
Plasma Processing Apparatus And Plasma Processing Method App 20170025289 - Morimoto; Michikazu ;   et al. | 2017-01-26 |
Plasma processing apparatus Grant 9,514,967 - Ohgoshi , et al. December 6, 2 | 2016-12-06 |
Dry Etching Method App 20160307765 - Shen; Ze ;   et al. | 2016-10-20 |
Plasma Processing Apparatus App 20160225587 - Inoue; Yoshiharu ;   et al. | 2016-08-04 |
Plasma Processing Apparatus And Plasma Processing Method App 20160181131 - Morimoto; Michikazu ;   et al. | 2016-06-23 |
Plasma Processing Method App 20160181118 - KUDOU; Yutaka ;   et al. | 2016-06-23 |
Plasma processing method Grant 9,349,603 - Inoue , et al. May 24, 2 | 2016-05-24 |
Plasma processing apparatus and plasma processing method Grant 9,305,803 - Morimoto , et al. April 5, 2 | 2016-04-05 |
Plasma Processing Method App 20160079073 - MATSUI; Miyako ;   et al. | 2016-03-17 |
Method And Apparatus For Plasma Processing App 20150170880 - MUTO; Satoru ;   et al. | 2015-06-18 |
Dry Etching Method App 20150099368 - SHEN; Ze ;   et al. | 2015-04-09 |
Method and apparatus for plasma processing Grant 8,969,211 - Muto , et al. March 3, 2 | 2015-03-03 |
Plasma Processing Method App 20140349418 - INOUE; Yoshiharu ;   et al. | 2014-11-27 |
Plasma etching method Grant 8,889,024 - Watanabe , et al. November 18, 2 | 2014-11-18 |
Method And Apparatus For Plasma Processing App 20140302682 - MUTO; Satoru ;   et al. | 2014-10-09 |
Plasma processing method Grant 8,828,254 - Inoue , et al. September 9, 2 | 2014-09-09 |
Plasma processing method Grant 8,801,951 - Inoue , et al. August 12, 2 | 2014-08-12 |
Plasma Etching Method App 20140220785 - Watanabe; Tomoyuki ;   et al. | 2014-08-07 |
Plasma etching method Grant 8,741,166 - Watanabe , et al. June 3, 2 | 2014-06-03 |
Plasma Processing Apparatus And Plasma Processing Method App 20140131314 - ANDO; Yoji ;   et al. | 2014-05-15 |
Plasma Processing Apparatus And Plasma Processing Method App 20140057445 - MORIMOTO; Michikazu ;   et al. | 2014-02-27 |
Plasma Processing Apparatus App 20140020831 - OHGOSHI; Yasuo ;   et al. | 2014-01-23 |
Plasma etching method Grant 8,580,131 - Watanabe , et al. November 12, 2 | 2013-11-12 |
Method for processing semiconductor device Grant 8,501,608 - Ono , et al. August 6, 2 | 2013-08-06 |
Plasma Etching Method App 20130157470 - WATANABE; Tomoyuki ;   et al. | 2013-06-20 |
Method of semiconductor processing Grant 8,440,513 - Ono , et al. May 14, 2 | 2013-05-14 |
Plasma Etching Method App 20130109184 - WATANABE; Tomoyuki ;   et al. | 2013-05-02 |
Self scanning system Grant 8,365,993 - Teraoka , et al. February 5, 2 | 2013-02-05 |
Plasma Processing Method And Plasma Processing Apparatus App 20130029492 - INOUE; Yoshiharu ;   et al. | 2013-01-31 |
Plasma Processing Method App 20130001197 - INOUE; Yoshiharu ;   et al. | 2013-01-03 |
Plasma Processing Apparatus And Plasma Processing Method App 20120252219 - MORIMOTO; Michikazu ;   et al. | 2012-10-04 |
Semiconductor fabricating apparatus with function of determining etching processing state Grant 8,071,397 - Usui , et al. December 6, 2 | 2011-12-06 |
Method For Processing Semiconductor Device App 20110104882 - ONO; Tetsuo ;   et al. | 2011-05-05 |
Plasma processing apparatus and plasma processing method Grant 7,771,607 - Tetsuka , et al. August 10, 2 | 2010-08-10 |
Method Of Semiconductor Processing App 20090325388 - Ono; Tetsuo ;   et al. | 2009-12-31 |
Plasma processing method and plasma processing apparatus Grant 7,611,993 - Ono , et al. November 3, 2 | 2009-11-03 |
Plasma processing apparatus and plasma processing method Grant 7,601,241 - Tetsuka , et al. October 13, 2 | 2009-10-13 |
Method of manufacturing gear from metal sheet and the gear manufactured by the method App 20090090007 - Takada; Masahiro ;   et al. | 2009-04-09 |
Plasma Processing Apparatus And Method For Stabilizing Inner Wall Of Processing Chamber App 20080257863 - Kitsunai; Hiroyuki ;   et al. | 2008-10-23 |
Product Sales Processing System App 20080128497 - Teraoka; Kazuharu ;   et al. | 2008-06-05 |
Semiconductor Fabricating Apparatus With Function Of Determining Etching Processing State App 20080020495 - Usui; Tatehito ;   et al. | 2008-01-24 |
Sample surface processing method Grant 7,259,104 - Ono , et al. August 21, 2 | 2007-08-21 |
Semiconductor fabricating apparatus with function of determining etching processing state Grant 7,259,866 - Usui , et al. August 21, 2 | 2007-08-21 |
Plasma Processing Method And Plasma Processing Apparatus App 20070184562 - ONO; Tetsuo ;   et al. | 2007-08-09 |
Plasma Processing Apparatus And Plasma Processing Method App 20070175586 - Tetsuka; Tsutomu ;   et al. | 2007-08-02 |
Surface processing method of a specimen and surface processing apparatus of the specimen Grant 7,049,243 - Ono , et al. May 23, 2 | 2006-05-23 |
Semiconductor fabricating apparatus with function of determining etching processing state App 20060077397 - Usui; Tatehito ;   et al. | 2006-04-13 |
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units App 20060000800 - Usui; Tatehito ;   et al. | 2006-01-05 |
Semiconductor fabricating apparatus with function of determining etching processing state Grant 6,972,848 - Usui , et al. December 6, 2 | 2005-12-06 |
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units Grant 6,967,109 - Usui , et al. November 22, 2 | 2005-11-22 |
Plasma processing method and plasma processing apparatus App 20050183822 - Ono, Tetsuo ;   et al. | 2005-08-25 |
Plasma processing apparatus and plasma processing method App 20050133162 - Tetsuka, Tsutomu ;   et al. | 2005-06-23 |
Plasma processing method and plasma processing apparatus Grant 6,888,094 - Ono , et al. May 3, 2 | 2005-05-03 |
Plasma processing apparatus and method for stabilizing inner wall of processing chamber App 20050087297 - Kitsunai, Hiroyuki ;   et al. | 2005-04-28 |
Method for processing plasma processing apparatus App 20050072444 - Shirayone, Shigeru ;   et al. | 2005-04-07 |
Method and apparatus for treating surface of semiconductor Grant 6,849,191 - Ono , et al. February 1, 2 | 2005-02-01 |
Surface processing method of a specimen and surface processing apparatus of the specimen App 20040259361 - Ono, Tetsuo ;   et al. | 2004-12-23 |
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units App 20040235310 - Usui, Tatehito ;   et al. | 2004-11-25 |
Semiconductor fabricating apparatus with function of determining etching processing state App 20040174530 - Usui, Tatehito ;   et al. | 2004-09-09 |
Plasma processing method and plasma processing apparatus App 20040159639 - Ono, Tetsuo ;   et al. | 2004-08-19 |
Method and apparatus for treating surface of semiconductor Grant 6,767,838 - Ono , et al. July 27, 2 | 2004-07-27 |
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units Grant 6,759,253 - Usui , et al. July 6, 2 | 2004-07-06 |
Ion current density measuring method and instrument, and semiconductor device manufacturing method App 20040092044 - Mise, Nobuyuki ;   et al. | 2004-05-13 |
Sample surface processing method App 20040058541 - Ono, Tetsuo ;   et al. | 2004-03-25 |
Plasma processing method and plasma processing apparatus Grant 6,700,090 - Ono , et al. March 2, 2 | 2004-03-02 |
Specimen surface processing method Grant 6,677,244 - Ono , et al. January 13, 2 | 2004-01-13 |
Method for processing surface of sample Grant 6,660,647 - Ono , et al. December 9, 2 | 2003-12-09 |
Ion current density measuring method and instrument, and semiconductor device manufacturing method Grant 6,656,752 - Mise , et al. December 2, 2 | 2003-12-02 |
Method And Apparatus For Treating Surface Of Semiconductor App 20030132198 - ONO, TETSUO ;   et al. | 2003-07-17 |
Communication Robot App 20020198626 - Imai, Michita ;   et al. | 2002-12-26 |
Plasma processing method App 20020125207 - Ono, Tetsuo ;   et al. | 2002-09-12 |
Plasma processing method App 20020123229 - Ono, Tetsuo ;   et al. | 2002-09-05 |
Apparatus for spheroidizing pulverized coals App 20010052198 - Ono, Tetsuo | 2001-12-20 |
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units App 20010014520 - Usui, Tatehito ;   et al. | 2001-08-16 |
Plasma processing apparatus Grant 6,033,481 - Yokogawa , et al. March 7, 2 | 2000-03-07 |
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum Grant 5,895,586 - Kaji , et al. April 20, 1 | 1999-04-20 |
Plasma processing apparatus Grant 5,891,252 - Yokogawa , et al. April 6, 1 | 1999-04-06 |
Surface treating apparatus, surface treating method and semiconductor device manufacturing method Grant 5,505,778 - Ono , et al. April 9, 1 | 1996-04-09 |
Surface processing method and an apparatus for carrying out the same Grant 5,462,635 - Ono , et al. October 31, 1 | 1995-10-31 |
Dry etching method Grant 5,401,357 - Okuhira , et al. March 28, 1 | 1995-03-28 |
Surface fabricating device Grant 5,110,407 - Ono , et al. May 5, 1 | 1992-05-05 |
Rotary compressor Grant 5,074,761 - Hirooka , et al. December 24, 1 | 1991-12-24 |
Scroll type compressor Grant 5,074,760 - Hirooka , et al. December 24, 1 | 1991-12-24 |
Circular fluorescent lamp Grant 5,034,655 - Murayama , et al. July 23, 1 | 1991-07-23 |
Process for production of coal-water mixture Grant 5,012,984 - Ishikawa , et al. May 7, 1 | 1991-05-07 |
Apparatus for generating light by utilizing microwave Grant 4,933,602 - Ono , et al. June 12, 1 | 1990-06-12 |
Capacity control device of scroll-type fluid compressor Grant 4,886,425 - Itahana , et al. December 12, 1 | 1989-12-12 |
Low-pressure discharge lamp Grant 4,879,493 - Mastuno , et al. November 7, 1 | 1989-11-07 |
Method for forming scroll members used in a scroll type fluid machine Grant 4,696,084 - Hirano , et al. September 29, 1 | 1987-09-29 |
Scroll type fluid machine with prevention of stress concentration Grant 4,666,380 - Hirano , et al. May 19, 1 | 1987-05-19 |
Low-pressure mercury vapor discharge lamp Grant 4,611,148 - Kato , et al. September 9, 1 | 1986-09-09 |
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