Onishi; Yasunobu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Onishi; Yasunobu.The latest application filed is for "semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus".

Company Profile

0.27.19

Onishi; Yasunobu - Yokohama-shi JP
Onishi; Yasunobu - Yokohama JP
Onishi; Yasunobu - Kanagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor Device Manufacturing Method To Form Resist Pattern, And Substrate Processing Apparatus App 20110229826 - KAWAMURA; Daisuke ; et al.	2011-09-22
Semiconductor device manufacturing method to form resist pattern Grant 7,968,272 - Kawamura , et al. June 28, 2	2011-06-28
Pattern Forming Method and Method of Manufacturing Semiconductor Device App 20110039214 - ITO; Shinichi ; et al.	2011-02-17
Pattern forming method and method of manufacturing semiconductor device Grant 7,794,922 - Ito , et al. September 14, 2	2010-09-14
Resist pattern forming method and manufacturing method of semiconductor device Grant 7,687,227 - Shiobara , et al. March 30, 2	2010-03-30
Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist Grant 7,319,944 - Nakamura , et al. January 15, 2	2008-01-15
Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device Grant 7,300,884 - Seino , et al. November 27, 2	2007-11-27
Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus App 20070128554 - Kawamura; Daisuke ; et al.	2007-06-07
Method for forming pattern Grant 7,198,886 - Sato , et al. April 3, 2	2007-04-03
Resist pattern forming method and manufacturing method of semiconductor device App 20070042297 - Shiobara; Eishi ; et al.	2007-02-22
Pattern forming method and method of manufacturing semiconductor device App 20060263726 - Ito; Shinichi ; et al.	2006-11-23
Resist pattern forming method and method of manufacturing semiconductor device App 20060194449 - Takeishi; Tomoyuki ; et al.	2006-08-31
Pattern forming method and method of manufacturing semiconductor device App 20060127815 - Sato; Yasuhiko ; et al.	2006-06-15
Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device App 20060115990 - Seino; Yuriko ; et al.	2006-06-01
Pattern forming method and method for manufacturing semiconductor device Grant 7,026,099 - Kato , et al. April 11, 2	2006-04-11
Method for manufacturing semiconductor device App 20060008746 - Onishi; Yasunobu ; et al.	2006-01-12
Method for forming pattern App 20050233255 - Sato, Yasuhiko ; et al.	2005-10-20
Pattern forming method and method for manufacturing semiconductor device App 20050214695 - Kato, Hirokazu ; et al.	2005-09-29
Method for forming a pattern and method of manufacturing semiconductor device App 20050153245 - Sato, Yasuhiko ; et al.	2005-07-14
Pattern forming method App 20040265745 - Sho, Koutaro ; et al.	2004-12-30
Computer implemented method for development profile simulation, computer program product for controlling a computer system so as to simulate development profile, and computer implemented method for mask pattern data correction App 20040236548 - Nakamura, Hiroko ; et al.	2004-11-25
Method for forming a pattern and method of manufacturing semiconductor device Grant 6,806,021 - Sato , et al. October 19, 2	2004-10-19
Photosensitive composition having uniform concentration distribution of components and pattern formation method using the same Grant 6,703,181 - Hayashi , et al. March 9, 2	2004-03-09
Pattern forming method and method for manufacturing semiconductor device App 20030215749 - Kato, Hirokazu ; et al.	2003-11-20
Manufacturing method of semiconductor device using mask pattern having high etching resistance Grant 6,576,562 - Ohuchi , et al. June 10, 2	2003-06-10
Method of forming a pattern Grant 6,569,595 - Sato , et al. May 27, 2	2003-05-27
Method for forming a pattern and method of manufacturing semiconductor device App 20030064323 - Sato, Yasuhiko ; et al.	2003-04-03
Manufacturing method of semiconductor device using mask pattern having high etching resistance App 20020119612 - Ohuchi, Junko ; et al.	2002-08-29
Method for forming pattern App 20020061453 - Sato, Yasuhiko ; et al.	2002-05-23
Method of forming a pattern App 20010034131 - Sato, Yasuhiko ; et al.	2001-10-25
Composition for underlying film and method of forming a pattern using the film Grant 6,054,254 - Sato , et al. April 25, 2	2000-04-25
Method of forming a pattern using polysilane Grant 6,025,117 - Nakano , et al. February 15, 2	2000-02-15
Resist composition for forming a pattern comprising a pyridinium compound as an additive Grant 5,658,706 - Niki , et al. August 19, 1	1997-08-19
Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups Grant 5,403,695 - Hayase , et al. April 4, 1	1995-04-04
Pattern formation resist and pattern formation method Grant 5,279,921 - Onishi , et al. January 18, 1	1994-01-18
Polysilanes, polysiloxanes and silicone resist materials containing these compounds Grant 5,198,520 - Onishi , et al. March 30, 1	1993-03-30
Photosensitive composition Grant 5,100,768 - Niki , et al. March 31, 1	1992-03-31
A silicone resist materials containing a polysiloxane and a photo-sensitive agent Grant 5,017,453 - Onishi , et al. May 21, 1	1991-05-21
Polysilane compound and photosensitive composition Grant 4,871,646 - Hayase , et al. October 3, 1	1989-10-03
Photopolymerizable epoxy resin composition Grant 4,835,193 - Hayase , et al. May 30, 1	1989-05-30
Photosensitive composition and method of forming a resist pattern with copolymer of polyvinyl phenol Grant 4,828,958 - Hayase , et al. May 9, 1	1989-05-09
Polysilanes, Polysiloxanes and silicone resist materials containing these compounds Grant 4,822,716 - Onishi , et al. April 18, 1	1989-04-18
Photo-curable epoxy resin composition Grant 4,666,951 - Onishi , et al. May 19, 1	1987-05-19
Photo-curable epoxy resin composition Grant 4,495,042 - Hayase , et al. January 22, 1	1985-01-22
Photo-curable epoxy resin composition Grant 4,479,860 - Hayase , et al. October 30, 1	1984-10-30
Photocurable silicon compound composition Grant 4,476,290 - Hayase , et al. October 9, 1	1984-10-09

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