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Low Coefficient of Friction Ethylene-Based Compositions
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Coating Compositions For Photolithography
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Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
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Wet-strippable Silicon-containing Antireflectant
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Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device
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Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom
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Copolymer With Acid-labile Group, Photoresist Composition, Coated Substrate, And Method Of Forming An Electronic Device
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Photoacid-generating Copolymer And Associated Photoresist Composition, Coated Substrate, And Method Of Forming An Electronic Device
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Photoacid-generating Copolymer And Associated Photoresist Composition, Coated Substrate, And Method Of Forming An Electronic Device
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Coating compositions for use with an overcoated photoresist
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Photosensitive Copolymer, Photoresist Comprising The Copolymer, And Method Of Forming An Electronic Device
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Photosensitive copolymer and photoresist composition
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Coating Compositions For Photolithography
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Polymer Composition, Photoresist Comprising The Polymer Composition, And Coated Article Comprising The Photoresist
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Photosensitive Copolymer, Photoresist Comprising The Copolymer, And Articles Formed Therefrom
App 20130209934 - Ongayi; Owendi ; et al. | 2013-08-15 |
Coating compositions for use with an overcoated photoresist
Grant 8,501,383 - Zampini , et al. August 6, 2 | 2013-08-06 |
Coating compositions for photolithography
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Coating Compositions For Use With An Overcoated Photoresist
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Photosensitive Copolymer And Photoresist Composition
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Coating Compositions For Use With An Overcoated Photoresist
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Coating Compositions For Use With An Overcoated Photoresist
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Coating compositions for photolithography
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Coating compositions for photolithography
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