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Patent applications and USPTO patent grants for Ong; Ben.The latest application filed is for "method of fabricating a nitrogenated silicon oxide layer and mos device having same".
Patent | Date |
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Method of fabricating a nitrogenated silicon oxide layer and MOS device having same Grant 7,928,020 - Liu , et al. April 19, 2 | 2011-04-19 |
Method Of Fabricating A Nitrogenated Silicon Oxide Layer And Mos Device Having Same App 20090088002 - Liu; Jinping ;   et al. | 2009-04-02 |
Kiosk for printing and communicating video game images Grant 6,383,080 - Link , et al. May 7, 2 | 2002-05-07 |
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