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Patent applications and USPTO patent grants for Oluseyi; Hakeem.The latest application filed is for "method of etching tungsten or tungsten nitride in semiconductor structures".
Patent | Date |
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Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy Grant 6,633,391 - Oluseyi , et al. October 14, 2 | 2003-10-14 |
Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing system Grant 6,603,538 - Oluseyi , et al. August 5, 2 | 2003-08-05 |
Method of etching tungsten or tungsten nitride in semiconductor structures App 20030003757 - Nallan, Padmapani ;   et al. | 2003-01-02 |
Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures Grant 6,423,644 - Nallan , et al. July 23, 2 | 2002-07-23 |
Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures App 20020028582 - Nallan, Padmapani ;   et al. | 2002-03-07 |
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