Olin Microelectronic Chemicals, Inc.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Olin Microelectronic Chemicals, Inc..The latest application filed is for "radiation sensitive compositions of terpolymers containing organosilicon side chains".

Company Profile

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Olin Microelectronic Chemicals, Inc. - Norwalk CT
Olin Microelectronic Chemicals, Inc. - Cheshire CT

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radiation sensitive compositions of terpolymers containing organosilicon side chains Grant 6,042,989 - Schaedeli , et al. March 28, 2	2000-03-28
Process for removing residues from a semiconductor substrate Grant 6,033,993 - Love, Jr. , et al. March 7, 2	2000-03-07
Terpolymers containing organosilicon side chains Grant 6,028,154 - Schaedeli , et al. February 22, 2	2000-02-22
Process for preparing a radiation-sensitive composition Grant 6,027,853 - Malik , et al. February 22, 2	2000-02-22
Non-corrosive cleaning composition for removing plasma etching residues Grant 6,020,292 - Honda , et al. February 1, 2	2000-02-01
Photoresist compositions Grant 5,928,818 - Mertesdorf , et al. July 27, 1	1999-07-27
Terpolymers containing organosilicon side chains Grant 5,886,119 - Schaedeli , et al. March 23, 1	1999-03-23
Polymers containing protected styrene and unprotected hydroxbenzyl (meth) acrylamides Grant 5,863,701 - Mertesdorf January 26, 1	1999-01-26
Negative working photoresist composition based on polyimide primers Grant 5,856,065 - Hagen January 5, 1	1999-01-05
Organic solvent soluble photoresists which are developable in aqueous alkaline solutions Grant 5,849,808 - Schacht , et al. December 15, 1	1998-12-15
Non-corrosive stripping and cleaning composition Grant 5,798,323 - Honda , et al. August 25, 1	1998-08-25
Chemical imidization reagent for polyimide synthesis Grant 5,789,524 - Hsu , et al. August 4, 1	1998-08-04
Polymers containing protected styrene and unprotected hydroxybenzyl (meth)acrylamides Grant 5,780,566 - Mertesdorf July 14, 1	1998-07-14
Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers Grant 5,674,657 - Tan , et al. October 7, 1	1997-10-07

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