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name:-0.03472900390625
name:-0.00098013877868652
Okumura; Masahiko Patent Filings

Okumura; Masahiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Okumura; Masahiko.The latest application filed is for "substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid".

Company Profile
0.18.15
  • Okumura; Masahiko - Setagaya-ku N/A JP
  • Okumura; Masahiko - Tokyo JP
  • Okumura; Masahiko - Yaizu JP
  • OKUMURA; Masahiko - Yaizu-shi JP
  • Okumura; Masahiko - Tokyo-To JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Immersion lithographic apparatus rinsing outer contour of substrate with immersion space
Grant 8,941,808 - Nakano , et al. January 27, 2
2015-01-27
Exposure apparatus, exposure method, and device manufacturing method
Grant 8,780,326 - Kiuchi , et al. July 15, 2
2014-07-15
Exposure apparatus, cleaning method, and device fabricating method
Grant 8,654,306 - Shiraishi , et al. February 18, 2
2014-02-18
Indicator for pressure container
Grant 8,136,472 - Yamauchi , et al. March 20, 2
2012-03-20
Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid
App 20120008112 - Nakano; Katsushi ;   et al.
2012-01-12
Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid
Grant 8,040,489 - Nakano , et al. October 18, 2
2011-10-18
Exposure apparatus, exposure method, and device manufacturing method
App 20110222037 - Kiuchi; Tohru ;   et al.
2011-09-15
Interferometric position-measuring devices and methods
Grant 7,876,452 - Sogard , et al. January 25, 2
2011-01-25
Indicator For Pressure Container
App 20100269748 - YAMAUCHI; Junji ;   et al.
2010-10-28
Exposure apparatus, cleaning method, and device fabricating method
App 20090316120 - Shiraishi; Kenichi ;   et al.
2009-12-24
Holding Device And Exposure Apparatus
App 20090097009 - OKUMURA; Masahiko
2009-04-16
Indicator for pressure container
App 20090056615 - Yamauchi; Junji ;   et al.
2009-03-05
Interferometric Position-measuring Devices And Methods
App 20080291464 - Sogard; Michael R. ;   et al.
2008-11-27
Substrate processing method, exposure apparatus, and method for producing device
App 20080246931 - Nakano; Katsushi ;   et al.
2008-10-09
Substrate Processing Method, Exposure Apparatus, and Method For Producing Device
App 20080143980 - Nakano; Katsushi ;   et al.
2008-06-19
Exposure apparatus and device manufacturing method
App 20080137047 - Mizutani; Takeyuki ;   et al.
2008-06-12
Substrate processing method, exposure apparatus, and method for producing device
App 20070242248 - Nakano; Katsushi ;   et al.
2007-10-18
Stage apparatus and exposure apparatus
App 20070188732 - Shibazaki; Yuichi ;   et al.
2007-08-16
Exposure apparatus and stage device, and device manufacturing method
Grant 7,068,350 - Nishi , et al. June 27, 2
2006-06-27
Exposure apparatus and stage device, and device manufacturing method
App 20050024610 - Nishi, Kenji ;   et al.
2005-02-03
System and method for calibrating mirrors of a stage assembly
Grant 6,842,248 - Binnard , et al. January 11, 2
2005-01-11
Method and apparatus for positioning substrate and the like
Grant 6,624,433 - Okumura , et al. September 23, 2
2003-09-23
Method And Apparatus For Positioning Substrate And The Like
App 20020113218 - OKUMURA, MASAHIKO ;   et al.
2002-08-22
Method and apparatus for positioning substrate
Grant 6,400,445 - Nishi , et al. June 4, 2
2002-06-04
Method for positioning substrate
App 20010016293 - Nishi, Kenji ;   et al.
2001-08-23
Method for positioning substrate
Grant 6,225,012 - Nishi , et al. May 1, 2
2001-05-01
Projection exposure apparatus and method
Grant 6,122,036 - Yamasaki , et al. September 19, 2
2000-09-19
Method and apparatus for aligning a mask and a set of substrates to be exposed
Grant 5,798,530 - Okumura August 25, 1
1998-08-25
Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate
Grant 5,654,553 - Kawakubo , et al. August 5, 1
1997-08-05
Tilting apparatus
Grant 5,473,424 - Okumura December 5, 1
1995-12-05

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