loadpatents
name:-0.032184839248657
name:-0.043342113494873
name:-0.00075078010559082
Okoroanyanwu; Uzodinma Patent Filings

Okoroanyanwu; Uzodinma

Patent Applications and Registrations

Patent applications and USPTO patent grants for Okoroanyanwu; Uzodinma.The latest application filed is for "mask structures and methods of manufacturing".

Company Profile
0.38.21
  • Okoroanyanwu; Uzodinma - Northampton MA
  • Okoroanyanwu; Uzodinma - Mountain View CA
  • Okoroanyanwu; Uzodinma - Clifton Park NY
  • Okoroanyanwu; Uzodinma - Northhampton MA
  • Okoroanyanwu; Uzodinma - Sunnyvale CA
  • OKOROANYANWU, UZODINMA - MOUNTAINVIEW CA
  • Okoroanyanwu; Uzodinma - Austin TX
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Mask structures and methods of manufacturing
Grant 9,195,132 - Patil , et al. November 24, 2
2015-11-24
Mask Structures And Methods Of Manufacturing
App 20150212402 - PATIL; Suraj K. ;   et al.
2015-07-30
Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis
Grant 8,852,854 - Wallow , et al. October 7, 2
2014-10-07
Optical polarizer with nanotube array
Grant 8,792,161 - LaFontaine , et al. July 29, 2
2014-07-29
Method for producing a high resolution resist pattern on a semiconductor wafer
Grant 8,715,912 - Okoroanyanwu , et al. May 6, 2
2014-05-06
Method for forming a high resolution resist pattern on a semiconductor wafer
Grant 8,586,269 - Okoroanyanwu , et al. November 19, 2
2013-11-19
Fluorine-passivated reticles for use in lithography and methods for fabricating the same
Grant 8,338,061 - Levinson , et al. December 25, 2
2012-12-25
Semiconductor device built on plastic substrate
Grant 8,044,387 - Buynoski , et al. October 25, 2
2011-10-25
Fluorine-passivated Reticles For Use In Lithography And Methods For Fabricating The Same
App 20110244377 - LEVINSON; Harry J. ;   et al.
2011-10-06
Processing a copolymer to form a polymer memory cell
Grant 8,012,673 - Pangrle , et al. September 6, 2
2011-09-06
Stacked organic memory devices and methods of operating and fabricating
Grant 8,003,436 - Tripsas , et al. August 23, 2
2011-08-23
Fluorine-passivated reticles for use in lithography and methods for fabricating the same
Grant 7,985,513 - Levinson , et al. July 26, 2
2011-07-26
EUV pellicle and method for fabricating semiconductor dies using same
Grant 7,767,985 - Okoroanyanwu , et al. August 3, 2
2010-08-03
Fluorine-passivated Reticles For Use In Lithography And Methods For Fabricating The Same
App 20090239155 - LEVINSON; Harry J. ;   et al.
2009-09-24
Stacked Organic Memory Devices And Methods Of Operating And Fabricating
App 20090081824 - Tripsas; Nicholas H. ;   et al.
2009-03-26
Stacked organic memory devices and methods of operating and fabricating
Grant 7,465,956 - Tripsas , et al. December 16, 2
2008-12-16
Method for producing a high resolution resist pattern on a semiconductor wafer
App 20080292996 - Okoroanyanwu; Uzodinma ;   et al.
2008-11-27
Method for forming a high resolution resist pattern on a semiconductor wafer
App 20080233494 - Okoroanyanwu; Uzodinma ;   et al.
2008-09-25
Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis
App 20080199813 - Wallow; Thomas ;   et al.
2008-08-21
Optical polarizer with nanotube array
App 20080198453 - LaFontaine; Bruno M. ;   et al.
2008-08-21
EUV pellicle and method for fabricating semiconductor dies using same
App 20080152873 - Okoroanyanwu; Uzodinma ;   et al.
2008-06-26
Two mask photoresist exposure pattern for dense and isolated regions
Grant 7,368,225 - Subramanian , et al. May 6, 2
2008-05-06
Method and system for contamination detection and monitoring a lithographic exposure tool and operating method for the same under controlled atmospheric conditions
App 20060066824 - Knappe; Uwe ;   et al.
2006-03-30
Dielectric pattern formation for organic electronic devices
Grant 7,012,013 - Okoroanyanwu , et al. March 14, 2
2006-03-14
Stacked organic memory devices and methods of operating and fabricating
Grant 6,979,837 - Tripsas , et al. December 27, 2
2005-12-27
Planar polymer memory device
Grant 6,977,389 - Tripsas , et al. December 20, 2
2005-12-20
CuS formation by anodic sulfide passivation of copper surface
Grant 6,893,895 - Okoroanyanwu , et al. May 17, 2
2005-05-17
Materials and methods for sublithographic patterning of gate structures in integrated circuit devices
Grant 6,884,735 - Okoroanyanwu , et al. April 26, 2
2005-04-26
Stacked organic memory devices and methods of operating and fabricating
Grant 6,870,183 - Tripsas , et al. March 22, 2
2005-03-22
Self assembly of conducting polymer for formation of polymer memory cell
Grant 6,852,586 - Buynoski , et al. February 8, 2
2005-02-08
Planar polymer memory device
App 20040238864 - Tripsas, Nicholas H. ;   et al.
2004-12-02
Process for improving the etch stability of ultra-thin photoresist
Grant 6,815,359 - Gabriel , et al. November 9, 2
2004-11-09
Stacked organic memory devices and methods of operating and fabricating
App 20040217347 - Tripsas, Nicholas H. ;   et al.
2004-11-04
Two mask photoresist exposure pattern for dense and isolated regions
Grant 6,803,178 - Subramanian , et al. October 12, 2
2004-10-12
Polymer memory device formed in via opening
Grant 6,787,458 - Tripsas , et al. September 7, 2
2004-09-07
SEM inspection and analysis of patterned photoresist features
Grant 6,774,365 - Okoroanyanwu , et al. August 10, 2
2004-08-10
Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices
Grant 6,767,693 - Okoroanyanwu July 27, 2
2004-07-27
Self-aligned pattern formation using wavelenghts
Grant 6,764,808 - Okoroanyanwu , et al. July 20, 2
2004-07-20
Sem Inspection And Analysis Of Patterned Photoresist Features
App 20040129880 - Okoroanyanwu, Uzodinma ;   et al.
2004-07-08
Method(s) facilitating formation of memory cell(s) and patterned conductive
Grant 6,753,247 - Okoroanyanwu , et al. June 22, 2
2004-06-22
Stacked organic memory devices and methods of operating and fabricating
App 20040084670 - Tripsas, Nicholas H. ;   et al.
2004-05-06
Selective photoresist hardening to facilitate lateral trimming
Grant 6,716,571 - Gabriel , et al. April 6, 2
2004-04-06
System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography
App 20030224265 - Okoroanyanwu, Uzodinma
2003-12-04
Process for reducing the critical dimensions of integrated circuit device features
Grant 6,653,231 - Okoroanyanwu , et al. November 25, 2
2003-11-25
Process for forming sub-lithographic photoresist features by modification of the photoresist surface
Grant 6,630,288 - Shields , et al. October 7, 2
2003-10-07
Self-aligned pattern formation using dual wavelengths
App 20030162135 - Okoroanyanwu, Uzodinma ;   et al.
2003-08-28
Process for preventing deformation of patterned photoresist features
Grant 6,589,709 - Okoroanyanwu , et al. July 8, 2
2003-07-08
Process for reducing the pitch of contact holes, vias, and trench structures in integrated circuits
Grant 6,589,713 - Okoroanyanwu July 8, 2
2003-07-08
Interconnect structure with silicon containing alicyclic polymers and low-k dielectric materials and method of making same with single and dual damascene techniques
Grant 6,475,904 - Okoroanyanwu , et al. November 5, 2
2002-11-05
Process for reducing the critical dimensions of integrated circuit device features
App 20020160628 - Okoroanyanwu, Uzodinma ;   et al.
2002-10-31
Process for forming sub-lithographic photoresist features by modification of the photoresist surface
App 20020160320 - Shields, Jeffrey A. ;   et al.
2002-10-31
Selective photoresist hardening to facilitate lateral trimming
App 20020139773 - Gabriel, Calvin T. ;   et al.
2002-10-03
Process for improving the etch stability of ultra-thin photoresist
App 20020142607 - Gabriel, Calvin T. ;   et al.
2002-10-03
Interconnect Structure With Silicon Containing Alicyclic Polymers And Low-k Dieletric Materials And Method Of Making Same With Single And Dual Damascene Techniques
App 20010012689 - OKOROANYANWU, UZODINMA ;   et al.
2001-08-09
Photoresist compositions comprising norbornene derivative polymers with acid labile groups
Grant 6,103,445 - Willson , et al. August 15, 2
2000-08-15

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed