Patent | Date |
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Mask structures and methods of manufacturing Grant 9,195,132 - Patil , et al. November 24, 2 | 2015-11-24 |
Mask Structures And Methods Of Manufacturing App 20150212402 - PATIL; Suraj K. ;   et al. | 2015-07-30 |
Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis Grant 8,852,854 - Wallow , et al. October 7, 2 | 2014-10-07 |
Optical polarizer with nanotube array Grant 8,792,161 - LaFontaine , et al. July 29, 2 | 2014-07-29 |
Method for producing a high resolution resist pattern on a semiconductor wafer Grant 8,715,912 - Okoroanyanwu , et al. May 6, 2 | 2014-05-06 |
Method for forming a high resolution resist pattern on a semiconductor wafer Grant 8,586,269 - Okoroanyanwu , et al. November 19, 2 | 2013-11-19 |
Fluorine-passivated reticles for use in lithography and methods for fabricating the same Grant 8,338,061 - Levinson , et al. December 25, 2 | 2012-12-25 |
Semiconductor device built on plastic substrate Grant 8,044,387 - Buynoski , et al. October 25, 2 | 2011-10-25 |
Fluorine-passivated Reticles For Use In Lithography And Methods For Fabricating The Same App 20110244377 - LEVINSON; Harry J. ;   et al. | 2011-10-06 |
Processing a copolymer to form a polymer memory cell Grant 8,012,673 - Pangrle , et al. September 6, 2 | 2011-09-06 |
Stacked organic memory devices and methods of operating and fabricating Grant 8,003,436 - Tripsas , et al. August 23, 2 | 2011-08-23 |
Fluorine-passivated reticles for use in lithography and methods for fabricating the same Grant 7,985,513 - Levinson , et al. July 26, 2 | 2011-07-26 |
EUV pellicle and method for fabricating semiconductor dies using same Grant 7,767,985 - Okoroanyanwu , et al. August 3, 2 | 2010-08-03 |
Fluorine-passivated Reticles For Use In Lithography And Methods For Fabricating The Same App 20090239155 - LEVINSON; Harry J. ;   et al. | 2009-09-24 |
Stacked Organic Memory Devices And Methods Of Operating And Fabricating App 20090081824 - Tripsas; Nicholas H. ;   et al. | 2009-03-26 |
Stacked organic memory devices and methods of operating and fabricating Grant 7,465,956 - Tripsas , et al. December 16, 2 | 2008-12-16 |
Method for producing a high resolution resist pattern on a semiconductor wafer App 20080292996 - Okoroanyanwu; Uzodinma ;   et al. | 2008-11-27 |
Method for forming a high resolution resist pattern on a semiconductor wafer App 20080233494 - Okoroanyanwu; Uzodinma ;   et al. | 2008-09-25 |
Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis App 20080199813 - Wallow; Thomas ;   et al. | 2008-08-21 |
Optical polarizer with nanotube array App 20080198453 - LaFontaine; Bruno M. ;   et al. | 2008-08-21 |
EUV pellicle and method for fabricating semiconductor dies using same App 20080152873 - Okoroanyanwu; Uzodinma ;   et al. | 2008-06-26 |
Two mask photoresist exposure pattern for dense and isolated regions Grant 7,368,225 - Subramanian , et al. May 6, 2 | 2008-05-06 |
Method and system for contamination detection and monitoring a lithographic exposure tool and operating method for the same under controlled atmospheric conditions App 20060066824 - Knappe; Uwe ;   et al. | 2006-03-30 |
Dielectric pattern formation for organic electronic devices Grant 7,012,013 - Okoroanyanwu , et al. March 14, 2 | 2006-03-14 |
Stacked organic memory devices and methods of operating and fabricating Grant 6,979,837 - Tripsas , et al. December 27, 2 | 2005-12-27 |
Planar polymer memory device Grant 6,977,389 - Tripsas , et al. December 20, 2 | 2005-12-20 |
CuS formation by anodic sulfide passivation of copper surface Grant 6,893,895 - Okoroanyanwu , et al. May 17, 2 | 2005-05-17 |
Materials and methods for sublithographic patterning of gate structures in integrated circuit devices Grant 6,884,735 - Okoroanyanwu , et al. April 26, 2 | 2005-04-26 |
Stacked organic memory devices and methods of operating and fabricating Grant 6,870,183 - Tripsas , et al. March 22, 2 | 2005-03-22 |
Self assembly of conducting polymer for formation of polymer memory cell Grant 6,852,586 - Buynoski , et al. February 8, 2 | 2005-02-08 |
Planar polymer memory device App 20040238864 - Tripsas, Nicholas H. ;   et al. | 2004-12-02 |
Process for improving the etch stability of ultra-thin photoresist Grant 6,815,359 - Gabriel , et al. November 9, 2 | 2004-11-09 |
Stacked organic memory devices and methods of operating and fabricating App 20040217347 - Tripsas, Nicholas H. ;   et al. | 2004-11-04 |
Two mask photoresist exposure pattern for dense and isolated regions Grant 6,803,178 - Subramanian , et al. October 12, 2 | 2004-10-12 |
Polymer memory device formed in via opening Grant 6,787,458 - Tripsas , et al. September 7, 2 | 2004-09-07 |
SEM inspection and analysis of patterned photoresist features Grant 6,774,365 - Okoroanyanwu , et al. August 10, 2 | 2004-08-10 |
Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices Grant 6,767,693 - Okoroanyanwu July 27, 2 | 2004-07-27 |
Self-aligned pattern formation using wavelenghts Grant 6,764,808 - Okoroanyanwu , et al. July 20, 2 | 2004-07-20 |
Sem Inspection And Analysis Of Patterned Photoresist Features App 20040129880 - Okoroanyanwu, Uzodinma ;   et al. | 2004-07-08 |
Method(s) facilitating formation of memory cell(s) and patterned conductive Grant 6,753,247 - Okoroanyanwu , et al. June 22, 2 | 2004-06-22 |
Stacked organic memory devices and methods of operating and fabricating App 20040084670 - Tripsas, Nicholas H. ;   et al. | 2004-05-06 |
Selective photoresist hardening to facilitate lateral trimming Grant 6,716,571 - Gabriel , et al. April 6, 2 | 2004-04-06 |
System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography App 20030224265 - Okoroanyanwu, Uzodinma | 2003-12-04 |
Process for reducing the critical dimensions of integrated circuit device features Grant 6,653,231 - Okoroanyanwu , et al. November 25, 2 | 2003-11-25 |
Process for forming sub-lithographic photoresist features by modification of the photoresist surface Grant 6,630,288 - Shields , et al. October 7, 2 | 2003-10-07 |
Self-aligned pattern formation using dual wavelengths App 20030162135 - Okoroanyanwu, Uzodinma ;   et al. | 2003-08-28 |
Process for preventing deformation of patterned photoresist features Grant 6,589,709 - Okoroanyanwu , et al. July 8, 2 | 2003-07-08 |
Process for reducing the pitch of contact holes, vias, and trench structures in integrated circuits Grant 6,589,713 - Okoroanyanwu July 8, 2 | 2003-07-08 |
Interconnect structure with silicon containing alicyclic polymers and low-k dielectric materials and method of making same with single and dual damascene techniques Grant 6,475,904 - Okoroanyanwu , et al. November 5, 2 | 2002-11-05 |
Process for reducing the critical dimensions of integrated circuit device features App 20020160628 - Okoroanyanwu, Uzodinma ;   et al. | 2002-10-31 |
Process for forming sub-lithographic photoresist features by modification of the photoresist surface App 20020160320 - Shields, Jeffrey A. ;   et al. | 2002-10-31 |
Selective photoresist hardening to facilitate lateral trimming App 20020139773 - Gabriel, Calvin T. ;   et al. | 2002-10-03 |
Process for improving the etch stability of ultra-thin photoresist App 20020142607 - Gabriel, Calvin T. ;   et al. | 2002-10-03 |
Interconnect Structure With Silicon Containing Alicyclic Polymers And Low-k Dieletric Materials And Method Of Making Same With Single And Dual Damascene Techniques App 20010012689 - OKOROANYANWU, UZODINMA ;   et al. | 2001-08-09 |
Photoresist compositions comprising norbornene derivative polymers with acid labile groups Grant 6,103,445 - Willson , et al. August 15, 2 | 2000-08-15 |