loadpatents
name:-0.013988018035889
name:-0.014343023300171
name:-0.0024042129516602
Okorn-Schmidt; Harald Patent Filings

Okorn-Schmidt; Harald

Patent Applications and Registrations

Patent applications and USPTO patent grants for Okorn-Schmidt; Harald.The latest application filed is for "method and device for plating a recess in a substrate".

Company Profile
2.13.12
  • Okorn-Schmidt; Harald - Klagenfurt AT
  • Okorn-Schmidt; Harald - Villach AT
  • Okorn-Schmidt; Harald - Putnam Valley NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method and device for plating a recess in a substrate
Grant 11,164,748 - Markut , et al. November 2, 2
2021-11-02
Method And Device For Plating A Recess In A Substrate
App 20190228975 - Markut; Franz ;   et al.
2019-07-25
Wet-dry integrated wafer processing system
Grant 10,249,521 - Lill , et al.
2019-04-02
Wet-dry Integrated Wafer Processing System
App 20170271180 - LILL; Thorsten ;   et al.
2017-09-21
Method and apparatus for surface treatment using inorganic acid and ozone
Grant 9,653,328 - Okorn-Schmidt , et al. May 16, 2
2017-05-16
Methods and structures for protecting one area while processing another area on a chip
Grant 9,472,402 - Kim , et al. October 18, 2
2016-10-18
Methods and structures for protecting one area while processing another area on a chip
Grant 9,059,000 - Kim , et al. June 16, 2
2015-06-16
Methods and Structures for Protecting One Area While Processing Another Area on a Chip
App 20150004802 - Kim; Deok-kee ;   et al.
2015-01-01
Method And Apparatus For Surface Treatment Using Inorganic Acid And Ozone
App 20140209129 - OKORN-SCHMIDT; Harald ;   et al.
2014-07-31
Method and apparatus for surface treatment using inorganic acid and ozone
Grant 8,709,165 - Okorn-Schmidt , et al. April 29, 2
2014-04-29
Process for treating a semiconductor wafer
Grant 8,668,777 - Okorn-Schmidt , et al. March 11, 2
2014-03-11
Process For Treating A Semiconductor Wafer
App 20120160276 - OKORN-SCHMIDT; Harald ;   et al.
2012-06-28
Method And Apparatus For Surface Treatment Using Inorganic Acid And Ozone
App 20120138097 - OKORN-SCHMIDT; Harald ;   et al.
2012-06-07
Method for etching chemically inert metal oxides
Grant 7,887,711 - Buchanan , et al. February 15, 2
2011-02-15
Methods and structures for protecting one area while processing another area on a chip
Grant 7,497,959 - Kim , et al. March 3, 2
2009-03-03
Methods and structures for protecting one area while processing another area on a chip
App 20080261128 - Kim; Deok-kee ;   et al.
2008-10-23
Apparatus and Method For Wet Treatment of Wafers
App 20070295367 - Okorn-Schmidt; Harald
2007-12-27
Methods And Structures For Protecting One Area While Processing Another Area On A Chip
App 20050255386 - Kim, Deok-kee ;   et al.
2005-11-17
Method for etching chemically inert metal oxides
App 20030230549 - Buchanan, Douglas A. ;   et al.
2003-12-18
Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxide
App 20030196679 - Cotte, John Michael ;   et al.
2003-10-23

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