Okayasu; Tetsuo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Okayasu; Tetsuo.The latest application filed is for "top-layer membrane formation composition and method for forming resist pattern using same".

Company Profile

1.8.11

Okayasu; Tetsuo - Kakegawa JP
Okayasu; Tetsuo - Shizuoka JP
OKAYASU; Tetsuo - Kakegawa-shi JP
OKAYASU; Tetsuo - Shizouka JP
Okayasu; Tetsuo - Ogasa-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Top-layer membrane formation composition and method for forming resist pattern using same Grant 10,268,117 - Suzuki , et al.	2019-04-23
Composition for forming overlay film, and resist pattern formation method employing the same Grant 9,810,988 - Wang , et al. November 7, 2	2017-11-07
Composition for forming topcoat layer and resist pattern formation method employing the same Grant 9,804,493 - Kim , et al. October 31, 2	2017-10-31
Top-layer Membrane Formation Composition And Method For Forming Resist Pattern Using Same App 20170090288 - SUZUKI; Masato ; et al.	2017-03-30
Composition For Forming Fine Resist Pattern And Pattern Forming Method Using Same App 20160327867 - OKAYASU; Tetsuo ; et al.	2016-11-10
Composition for forming topcoat layer and resist pattern formation method employing the same Grant 9,482,952 - Wang , et al. November 1, 2	2016-11-01
Composition for forming fine resist pattern and pattern forming method using same Grant 9,448,485 - Okayasu , et al. September 20, 2	2016-09-20
Composition For Forming Topcoat Layer And Resist Pattern Formation Method Employing The Same App 20160011510 - WANG; Xiaowei ; et al.	2016-01-14
Composition For Forming Overlay Film, And Resist Pattern Formation Method Employing The Same App 20150331323 - WANG; Xiaowei ; et al.	2015-11-19
Composition For Forming Topcoat Layer And Resist Pattern Formation Method Employing The Same App 20150147701 - KIM; Hyun-woo ; et al.	2015-05-28
Composition For Forming Fine Resist Pattern And Pattern Forming Method Using Same App 20150017587 - Okayasu; Tetsuo ; et al.	2015-01-15
Process for Preventing Development Defect and Composition for Use in the Same App 20100324330 - Akiyama; Yasushi ; et al.	2010-12-23
Process for preventing development defect and composition for use in the same Grant 7,799,513 - Akiyama , et al. September 21, 2	2010-09-21
Water soluble resin composition and method for pattern formation using the same Grant 7,745,093 - Nishibe , et al. June 29, 2	2010-06-29
Water Soluble Resin Composition and Method for Pattern Formation Using the Same App 20080193880 - Nishibe; Takeshi ; et al.	2008-08-14
Process for preventing development defect and composition for use in the same App 20050221236 - Akiyama, Yasushi ; et al.	2005-10-06

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