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OKAWA; Tatsuro Patent Filings

OKAWA; Tatsuro

Patent Applications and Registrations

Patent applications and USPTO patent grants for OKAWA; Tatsuro.The latest application filed is for "exposure apparatus and computer readable non-transitory storage medium".

Company Profile
0.3.4
  • OKAWA; Tatsuro - Saitama JP
  • Okawa; Tatsuro - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Exposure Apparatus And Computer Readable Non-transitory Storage Medium
App 20180067402 - YAMADA; Akio ;   et al.
2018-03-08
Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same
Grant 9,607,807 - Yamada , et al. March 28, 2
2017-03-28
Charged Particle Beam Exposure Apparatus Suitable For Drawing On Line Patterns, And Exposure Method Using The Same
App 20160133438 - Yamada; Akio ;   et al.
2016-05-12
Electron beam exposure apparatus and electron beam exposure method
Grant 8,487,281 - Kurokawa , et al. July 16, 2
2013-07-16
Electron Beam Exposure Apparatus And Electron Beam Exposure Method
App 20120312975 - Kobayashi; Katsuhiko ;   et al.
2012-12-13
Electron Beam Exposure Apparatus And Electron Beam Exposure Method
App 20120256106 - Kurokawa; Masaki ;   et al.
2012-10-11

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