loadpatents
name:-0.0015637874603271
name:-0.069642066955566
name:-0.0005338191986084
Okano; Haruo Patent Filings

Okano; Haruo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Okano; Haruo.The latest application filed is for "method for production of semiconductor device".

Company Profile
0.66.0
  • Okano; Haruo - Chiba-ken JP
  • Okano; Haruo - Chiba JP
  • Okano; Haruo - Tokyo JP
  • Okano; Haruo - Kawasaki JP
  • Okano; Haruo - Den-enchofu-honmachi JP
  • Okano; Haruo - Yokohama JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for production of semiconductor device
Grant 6,306,756 - Hasunuma , et al. October 23, 2
2001-10-23
Semiconductor device manufacturing method, manufacturing apparatus, simulation method and simulator
Grant 6,185,472 - Onga , et al. February 6, 2
2001-02-06
Method for production of semiconductor device
Grant 6,090,701 - Hasunuma , et al. July 18, 2
2000-07-18
Polishing apparatus and method for planarizing layer on a semiconductor wafer
Grant 5,948,205 - Kodera , et al. September 7, 1
1999-09-07
Polishing apparatus and method for planarizing layer on a semiconductor wafer
Grant 5,914,275 - Kodera , et al. June 22, 1
1999-06-22
Polishing method and polishing apparatus
Grant 5,775,980 - Sasaki , et al. July 7, 1
1998-07-07
Method for forming a film on a substrate by activating a reactive gas
Grant 5,776,557 - Okano , et al. July 7, 1
1998-07-07
Semiconductor device having a metal film formed in a groove in an insulating film
Grant 5,731,634 - Matsuo , et al. March 24, 1
1998-03-24
Method of manufacturing semiconductor device
Grant 5,707,487 - Hori , et al. January 13, 1
1998-01-13
Method of forming a metal oxide film
Grant 5,686,151 - Imai , et al. November 11, 1
1997-11-11
Semiconductor device having a single-crystal metal wiring
Grant 5,661,345 - Wada , et al. August 26, 1
1997-08-26
Magnetron plasma processing apparatus and processing method
Grant 5,660,671 - Harada , et al. August 26, 1
1997-08-26
Plasma generating apparatus and surface processing apparatus
Grant 5,660,744 - Sekine , et al. August 26, 1
1997-08-26
Thin film forming method and apparatus
Grant 5,658,389 - Matsuda , et al. August 19, 1
1997-08-19
Method of manufacturing semiconductor device
Grant 5,654,237 - Suguro , et al. August 5, 1
1997-08-05
Method of making semiconductor integrated-circuit capacitor
Grant 5,641,702 - Imai , et al. June 24, 1
1997-06-24
Focused ion beam deposition using TMCTS
Grant 5,639,699 - Nakamura , et al. June 17, 1
1997-06-17
Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask
Grant 5,620,815 - Ito , et al. April 15, 1
1997-04-15
Polishing method and polishing apparatus
Grant 5,607,718 - Sasaki , et al. March 4, 1
1997-03-04
Semiconductor planarizing apparatus
Grant 5,597,341 - Kodera , et al. January 28, 1
1997-01-28
Method for forming a film on a substrate by activating a reactive gas
Grant 5,591,486 - Okano , et al. January 7, 1
1997-01-07
Semiconductor device and its fabricating method
Grant 5,582,640 - Okada , et al. December 10, 1
1996-12-10
Method for forming an electrode and/or wiring layer by reducing copper oxide or silver oxide
Grant 5,561,082 - Matsuo , et al. October 1, 1
1996-10-01
Method of forming a thin film
Grant 5,514,425 - Ito , et al. May 7, 1
1996-05-07
Semiconductor device with monocrystalline gate insulating film
Grant 5,514,904 - Onga , et al. May 7, 1
1996-05-07
Plasma processing apparatus
Grant 5,474,643 - Arami , et al. December 12, 1
1995-12-12
Method of manufacturing semiconductor device
Grant 5,445,710 - Hori , et al. * August 29, 1
1995-08-29
Method for planarizing a semiconductor device having a amorphous layer
Grant 5,445,996 - Kodera , et al. August 29, 1
1995-08-29
Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
Grant 5,444,207 - Sekine , et al. August 22, 1
1995-08-22
Semiconductor integrated-circuit capacitor having a carbon film electrode
Grant 5,440,157 - Imai , et al. August 8, 1
1995-08-08
Method of manufacturing semiconductor device
Grant 5,437,961 - Yano , et al. August 1, 1
1995-08-01
Method of manufacturing silicon oxide film containing fluorine
Grant 5,429,995 - Nishiyama , et al. July 4, 1
1995-07-04
Plasma processing apparatus
Grant 5,413,663 - Shimizu , et al. May 9, 1
1995-05-09
Method of manufacturing semiconductor devices
Grant 5,413,967 - Matsuda , et al. May 9, 1
1995-05-09
Dry etching method
Grant 5,411,631 - Hori , et al. May 2, 1
1995-05-02
Method for making aluminum single crystal interconnections on insulators
Grant 5,409,862 - Wada , et al. April 25, 1
1995-04-25
Permanent magnet magnetic circuit and magnetron plasma processing apparatus
Grant 5,387,893 - Oguriyama , et al. February 7, 1
1995-02-07
Method for forming a film on a substrate by activating a reactive gas
Grant 5,385,763 - Okano , et al. January 31, 1
1995-01-31
Method of cleaning a charged beam apparatus
Grant 5,312,519 - Sakai , et al. May 17, 1
1994-05-17
Dry etching method
Grant 5,310,454 - Ohiwa , et al. May 10, 1
1994-05-10
Method of manufacturing semiconductor device
Grant 5,302,240 - Hori , et al. April 12, 1
1994-04-12
Method for removing composite attached to material by dry etching
Grant 5,298,112 - Hayasaka , et al. March 29, 1
1994-03-29
Method of manufacturing semiconductor devices including depositing aluminum on aluminum leads
Grant 5,290,733 - Hayasaka , et al. March 1, 1
1994-03-01
Dry etching method
Grant 5,259,923 - Hori , et al. November 9, 1
1993-11-09
Method of manufacturing semiconductor devices including rounding of corner portions by etching
Grant 5,258,332 - Horioka , et al. November 2, 1
1993-11-02
Method of manufacturing semiconductor device
Grant 5,240,554 - Hori , et al. August 31, 1
1993-08-31
Apparatus for forming reduced pressure and for processing object
Grant 5,223,113 - Kaneko , et al. June 29, 1
1993-06-29
Support table for plate-like body and processing apparatus using the table
Grant 5,221,403 - Nozawa , et al. June 22, 1
1993-06-22
Method for forming a film on a substrate by activating a reactive gas
Grant 5,156,881 - Okano , et al. October 20, 1
1992-10-20
Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied
Grant 5,147,497 - Nozawa , et al. September 15, 1
1992-09-15
Phototreating method and apparatus therefor
Grant 5,112,645 - Sekine , et al. May 12, 1
1992-05-12
Method of oxide etching with condensed plasma reaction product
Grant 5,030,319 - Nishino , et al. July 9, 1
1991-07-09
Method of dry etching and apparatus for use in such method
Grant 4,878,995 - Arikado , et al. November 7, 1
1989-11-07
Dry etching apparatus
Grant 4,838,978 - Sekine , et al. June 13, 1
1989-06-13
Dry etching process
Grant 4,786,361 - Sekine , et al. November 22, 1
1988-11-22
Pattern-forming method
Grant 4,698,238 - Hayasaka , et al. October 6, 1
1987-10-06
Dry-etching method and apparatus therefor
Grant 4,668,337 - Sekine , et al. * May 26, 1
1987-05-26
Phototreating apparatus
Grant 4,642,171 - Sekine , et al. February 10, 1
1987-02-10
Magnet driving method and device for same
Grant 4,600,492 - Ooshio , et al. July 15, 1
1986-07-15
Method of selectively forming an insulation layer
Grant 4,595,601 - Horioka , et al. June 17, 1
1986-06-17
Dry etching apparatus and method using reactive gases
Grant 4,529,475 - Okano , et al. July 16, 1
1985-07-16
Dry etching apparatus using reactive ions
Grant 4,526,643 - Okano , et al. July 2, 1
1985-07-02
Dry Etching method and device therefor
Grant 4,492,610 - Okano , et al. January 8, 1
1985-01-08
RIE Apparatus utilizing a shielded magnetron to enhance etching
Grant 4,431,473 - Okano , et al. February 14, 1
1984-02-14
Ion source and ion etching process
Grant 4,277,304 - Horiike , et al. July 7, 1
1981-07-07
Method of forming an insulating film
Grant 4,178,396 - Okano , et al. December 11, 1
1979-12-11

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