loadpatents
Patent applications and USPTO patent grants for Okano; Haruo.The latest application filed is for "method for production of semiconductor device".
Patent | Date |
---|---|
Method for production of semiconductor device Grant 6,306,756 - Hasunuma , et al. October 23, 2 | 2001-10-23 |
Semiconductor device manufacturing method, manufacturing apparatus, simulation method and simulator Grant 6,185,472 - Onga , et al. February 6, 2 | 2001-02-06 |
Method for production of semiconductor device Grant 6,090,701 - Hasunuma , et al. July 18, 2 | 2000-07-18 |
Polishing apparatus and method for planarizing layer on a semiconductor wafer Grant 5,948,205 - Kodera , et al. September 7, 1 | 1999-09-07 |
Polishing apparatus and method for planarizing layer on a semiconductor wafer Grant 5,914,275 - Kodera , et al. June 22, 1 | 1999-06-22 |
Polishing method and polishing apparatus Grant 5,775,980 - Sasaki , et al. July 7, 1 | 1998-07-07 |
Method for forming a film on a substrate by activating a reactive gas Grant 5,776,557 - Okano , et al. July 7, 1 | 1998-07-07 |
Semiconductor device having a metal film formed in a groove in an insulating film Grant 5,731,634 - Matsuo , et al. March 24, 1 | 1998-03-24 |
Method of manufacturing semiconductor device Grant 5,707,487 - Hori , et al. January 13, 1 | 1998-01-13 |
Method of forming a metal oxide film Grant 5,686,151 - Imai , et al. November 11, 1 | 1997-11-11 |
Semiconductor device having a single-crystal metal wiring Grant 5,661,345 - Wada , et al. August 26, 1 | 1997-08-26 |
Magnetron plasma processing apparatus and processing method Grant 5,660,671 - Harada , et al. August 26, 1 | 1997-08-26 |
Plasma generating apparatus and surface processing apparatus Grant 5,660,744 - Sekine , et al. August 26, 1 | 1997-08-26 |
Thin film forming method and apparatus Grant 5,658,389 - Matsuda , et al. August 19, 1 | 1997-08-19 |
Method of manufacturing semiconductor device Grant 5,654,237 - Suguro , et al. August 5, 1 | 1997-08-05 |
Method of making semiconductor integrated-circuit capacitor Grant 5,641,702 - Imai , et al. June 24, 1 | 1997-06-24 |
Focused ion beam deposition using TMCTS Grant 5,639,699 - Nakamura , et al. June 17, 1 | 1997-06-17 |
Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask Grant 5,620,815 - Ito , et al. April 15, 1 | 1997-04-15 |
Polishing method and polishing apparatus Grant 5,607,718 - Sasaki , et al. March 4, 1 | 1997-03-04 |
Semiconductor planarizing apparatus Grant 5,597,341 - Kodera , et al. January 28, 1 | 1997-01-28 |
Method for forming a film on a substrate by activating a reactive gas Grant 5,591,486 - Okano , et al. January 7, 1 | 1997-01-07 |
Semiconductor device and its fabricating method Grant 5,582,640 - Okada , et al. December 10, 1 | 1996-12-10 |
Method for forming an electrode and/or wiring layer by reducing copper oxide or silver oxide Grant 5,561,082 - Matsuo , et al. October 1, 1 | 1996-10-01 |
Method of forming a thin film Grant 5,514,425 - Ito , et al. May 7, 1 | 1996-05-07 |
Semiconductor device with monocrystalline gate insulating film Grant 5,514,904 - Onga , et al. May 7, 1 | 1996-05-07 |
Plasma processing apparatus Grant 5,474,643 - Arami , et al. December 12, 1 | 1995-12-12 |
Method of manufacturing semiconductor device Grant 5,445,710 - Hori , et al. * August 29, 1 | 1995-08-29 |
Method for planarizing a semiconductor device having a amorphous layer Grant 5,445,996 - Kodera , et al. August 29, 1 | 1995-08-29 |
Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field Grant 5,444,207 - Sekine , et al. August 22, 1 | 1995-08-22 |
Semiconductor integrated-circuit capacitor having a carbon film electrode Grant 5,440,157 - Imai , et al. August 8, 1 | 1995-08-08 |
Method of manufacturing semiconductor device Grant 5,437,961 - Yano , et al. August 1, 1 | 1995-08-01 |
Method of manufacturing silicon oxide film containing fluorine Grant 5,429,995 - Nishiyama , et al. July 4, 1 | 1995-07-04 |
Plasma processing apparatus Grant 5,413,663 - Shimizu , et al. May 9, 1 | 1995-05-09 |
Method of manufacturing semiconductor devices Grant 5,413,967 - Matsuda , et al. May 9, 1 | 1995-05-09 |
Dry etching method Grant 5,411,631 - Hori , et al. May 2, 1 | 1995-05-02 |
Method for making aluminum single crystal interconnections on insulators Grant 5,409,862 - Wada , et al. April 25, 1 | 1995-04-25 |
Permanent magnet magnetic circuit and magnetron plasma processing apparatus Grant 5,387,893 - Oguriyama , et al. February 7, 1 | 1995-02-07 |
Method for forming a film on a substrate by activating a reactive gas Grant 5,385,763 - Okano , et al. January 31, 1 | 1995-01-31 |
Method of cleaning a charged beam apparatus Grant 5,312,519 - Sakai , et al. May 17, 1 | 1994-05-17 |
Dry etching method Grant 5,310,454 - Ohiwa , et al. May 10, 1 | 1994-05-10 |
Method of manufacturing semiconductor device Grant 5,302,240 - Hori , et al. April 12, 1 | 1994-04-12 |
Method for removing composite attached to material by dry etching Grant 5,298,112 - Hayasaka , et al. March 29, 1 | 1994-03-29 |
Method of manufacturing semiconductor devices including depositing aluminum on aluminum leads Grant 5,290,733 - Hayasaka , et al. March 1, 1 | 1994-03-01 |
Dry etching method Grant 5,259,923 - Hori , et al. November 9, 1 | 1993-11-09 |
Method of manufacturing semiconductor devices including rounding of corner portions by etching Grant 5,258,332 - Horioka , et al. November 2, 1 | 1993-11-02 |
Method of manufacturing semiconductor device Grant 5,240,554 - Hori , et al. August 31, 1 | 1993-08-31 |
Apparatus for forming reduced pressure and for processing object Grant 5,223,113 - Kaneko , et al. June 29, 1 | 1993-06-29 |
Support table for plate-like body and processing apparatus using the table Grant 5,221,403 - Nozawa , et al. June 22, 1 | 1993-06-22 |
Method for forming a film on a substrate by activating a reactive gas Grant 5,156,881 - Okano , et al. October 20, 1 | 1992-10-20 |
Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied Grant 5,147,497 - Nozawa , et al. September 15, 1 | 1992-09-15 |
Phototreating method and apparatus therefor Grant 5,112,645 - Sekine , et al. May 12, 1 | 1992-05-12 |
Method of oxide etching with condensed plasma reaction product Grant 5,030,319 - Nishino , et al. July 9, 1 | 1991-07-09 |
Method of dry etching and apparatus for use in such method Grant 4,878,995 - Arikado , et al. November 7, 1 | 1989-11-07 |
Dry etching apparatus Grant 4,838,978 - Sekine , et al. June 13, 1 | 1989-06-13 |
Dry etching process Grant 4,786,361 - Sekine , et al. November 22, 1 | 1988-11-22 |
Pattern-forming method Grant 4,698,238 - Hayasaka , et al. October 6, 1 | 1987-10-06 |
Dry-etching method and apparatus therefor Grant 4,668,337 - Sekine , et al. * May 26, 1 | 1987-05-26 |
Phototreating apparatus Grant 4,642,171 - Sekine , et al. February 10, 1 | 1987-02-10 |
Magnet driving method and device for same Grant 4,600,492 - Ooshio , et al. July 15, 1 | 1986-07-15 |
Method of selectively forming an insulation layer Grant 4,595,601 - Horioka , et al. June 17, 1 | 1986-06-17 |
Dry etching apparatus and method using reactive gases Grant 4,529,475 - Okano , et al. July 16, 1 | 1985-07-16 |
Dry etching apparatus using reactive ions Grant 4,526,643 - Okano , et al. July 2, 1 | 1985-07-02 |
Dry Etching method and device therefor Grant 4,492,610 - Okano , et al. January 8, 1 | 1985-01-08 |
RIE Apparatus utilizing a shielded magnetron to enhance etching Grant 4,431,473 - Okano , et al. February 14, 1 | 1984-02-14 |
Ion source and ion etching process Grant 4,277,304 - Horiike , et al. July 7, 1 | 1981-07-07 |
Method of forming an insulating film Grant 4,178,396 - Okano , et al. December 11, 1 | 1979-12-11 |
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