Okada; Soichiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Okada; Soichiro.The latest application filed is for "substrate treatment method and substrate treatment system".
- Okada; Soichiro - Kumamoto JP
- OKADA; Soichiro - Koshi City Kumamoto
- Okada; Soichiro - Koshi JP
| Patent | Date |
|---|---|
| Mask forming method Grant 11,205,571 - Yaegashi , et al. December 21, 2 | 2021-12-21 |
| Substrate Treatment Method And Substrate Treatment System App 20210318618 - SHIMURA; Satoru ; et al. | 2021-10-14 |
| Mask Forming Method App 20200090927 - Yaegashi; Hidetami ; et al. | 2020-03-19 |
| Method for processing target object Grant 9,911,621 - Tobana , et al. March 6, 2 | 2018-03-06 |
| Substrate treatment method, computer storage medium, and substrate treatment system Grant 9,748,101 - Muramatsu , et al. August 29, 2 | 2017-08-29 |
| Method For Processing Target Object App 20170148641 - TOBANA; Toshikatsu ; et al. | 2017-05-25 |
| Liquid processing apparatus, liquid processing method, and storage medium Grant 9,165,797 - Yoshihara , et al. October 20, 2 | 2015-10-20 |
| Substrate Treatment Method, Computer Storage Medium, And Substrate Treatment System App 20150255271 - Muramatsu; Makoto ; et al. | 2015-09-10 |
| Liquid Processing Apparatus, Liquid Processing Method, And Storage Medium App 20130189852 - Yoshihara; Kousuke ; et al. | 2013-07-25 |
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