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name:-0.032493829727173
name:-0.02481484413147
name:-0.00042510032653809
OKABE; SHOTARO Patent Filings

OKABE; SHOTARO

Patent Applications and Registrations

Patent applications and USPTO patent grants for OKABE; SHOTARO.The latest application filed is for "processing apparatus, exhaust processing process and plasma processing process".

Company Profile
0.22.20
  • OKABE; SHOTARO - NARA-SHI JP
  • Okabe; Shotaro - Utsunomiya JP
  • Okabe; Shotaro - Utsunomiya-shi JP
  • Okabe; Shotaro - Nara JP
  • Okabe, Shotaro - Nara-ken JP
  • Okabe; Shotaro - Nagahama JP
  • Okabe; Shotaro - Kawasaki JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Processing Apparatus, Exhaust Processing Process And Plasma Processing Process
App 20090145555 - SAWAYAMA; TADASHI ;   et al.
2009-06-11
Processing Apparatus, Exhaust Processing Process And Plasma Processing Process
App 20090114155 - Sawayama; Tadashi ;   et al.
2009-05-07
Processing Apparatus, Exhaust Processing Process And Plasma Processing Process
App 20090095420 - Sawayama; Tadashi ;   et al.
2009-04-16
Processing Apparatus, Exhaust Processing Process And Plasma Processing Process
App 20090084500 - Sawayama; Tadashi ;   et al.
2009-04-02
Method for forming deposited film and photovoltaic element
Grant 7,501,305 - Takai , et al. March 10, 2
2009-03-10
Method For Forming Deposited Film And Photovoltaic Element
App 20080096305 - Takai; Yasuyoshi ;   et al.
2008-04-24
Processing Apparatus, Exhaust Processing Process And Plasma Processing Process
App 20080014345 - SAWAYAMA; TADASHI ;   et al.
2008-01-17
Exhaust Processing Method, Plasma Processing Method And Plasma Processing Apparatus
App 20070169890 - SHISHIDO; TAKESHI ;   et al.
2007-07-26
Exhaust processing method, plasma processing method and plasma processing apparatus
Grant 7,211,708 - Shishido , et al. May 1, 2
2007-05-01
Method of forming silicon-based thin film, silicon-based thin film, and photovoltaic element
Grant 7,074,641 - Kondo , et al. July 11, 2
2006-07-11
Method of forming silicon-based thin film, silicon-based thin film, and photovoltaic element
App 20050227457 - Kondo, Takaharu ;   et al.
2005-10-13
Apparatus for manufacturing photovoltaic elements
App 20050161077 - Okabe, Shotaro ;   et al.
2005-07-28
Apparatus for forming deposited film
Grant 6,877,458 - Ozaki , et al. April 12, 2
2005-04-12
Semiconductor element, and method of forming silicon-based film
Grant 6,858,308 - Kondo , et al. February 22, 2
2005-02-22
Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis
Grant 6,794,275 - Kondo , et al. September 21, 2
2004-09-21
Processing apparatus, exhaust processing process and plasma processing process
App 20040161533 - Sawayama, Tadashi ;   et al.
2004-08-19
Apparatus and process for forming deposited film
App 20040011290 - Kondo, Takaharu ;   et al.
2004-01-22
Processing Apparatus, Exhaust Processing Process And Plasma Processing
App 20030164225 - SAWAYAMA, TADASHI ;   et al.
2003-09-04
Method of manufacturing photovoltaic element and apparatus therefor
App 20030124819 - Okabe, Shotaro ;   et al.
2003-07-03
Silicon film, semiconductor device, and process for forming silicon films
App 20030104664 - Kondo, Takaharu ;   et al.
2003-06-05
Semiconductor element, and method of forming silicon-based film
App 20030075717 - Kondo, Takaharu ;   et al.
2003-04-24
Deposition apparatus for manufacturing thin film
Grant 6,530,341 - Kohda , et al. March 11, 2
2003-03-11
Production apparatus of semiconductor layer employing DC bias and VHF power
App 20030022519 - Fujioka, Yasushi ;   et al.
2003-01-30
Process for producing a semiconductor device
Grant 6,495,392 - Sakai , et al. December 17, 2
2002-12-17
Method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device
Grant 6,399,411 - Hori , et al. June 4, 2
2002-06-04
Method of manufacturing photovoltaic element and apparatus therefor
Grant 6,368,944 - Okabe , et al. April 9, 2
2002-04-09
Process for producing a semiconductor device
App 20020016017 - Sakai, Akira ;   et al.
2002-02-07
Exhaust processing method, plasma processing method and plasma processing apparatus
App 20020006477 - Shishido, Takeshi ;   et al.
2002-01-17
Production process of semiconductor layer, fabrication process of photovoltaic cell and production apparatus of semiconductor layer
App 20020001924 - Fujioka, Yasushi ;   et al.
2002-01-03
Apparatus for forming deposited film
App 20010039924 - Ozaki, Hiroyuki ;   et al.
2001-11-15
Plasma processing apparatus and plasma processing method
Grant 6,313,430 - Fujioka , et al. November 6, 2
2001-11-06
Deposition of semiconductor layer by plasma process
Grant 6,287,943 - Fujioka , et al. September 11, 2
2001-09-11
Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device
Grant 6,159,300 - Hori , et al. December 12, 2
2000-12-12
Method and device for forming semiconductor thin film, and method and device for forming photovoltaic element
Grant 6,159,763 - Sakai , et al. December 12, 2
2000-12-12
Deposited-film-forming apparatus
Grant 6,153,013 - Sakai , et al. November 28, 2
2000-11-28
Continuous forming method for functional deposited films and deposition apparatus
Grant 5,968,274 - Fujioka , et al. October 19, 1
1999-10-19
Continuously film-forming apparatus provided with improved gas gate means
Grant 5,919,310 - Fujioka , et al. July 6, 1
1999-07-06
Photovoltaic element and fabrication process thereof
Grant 5,720,826 - Hayashi , et al. February 24, 1
1998-02-24
Photovoltaic elements and process and apparatus for their formation
Grant 5,589,007 - Fujioka , et al. December 31, 1
1996-12-31
Microwave plasma chemical vapor deposition apparatus with magnet on waveguide
Grant 4,913,928 - Sugita , et al. April 3, 1
1990-04-03
Plasma vapor deposition film forming apparatus
Grant 4,545,328 - Fujiyama , et al. October 8, 1
1985-10-08
Plasma vapor deposition film forming apparatus
Grant 4,539,934 - Fujiyama , et al. September 10, 1
1985-09-10

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