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Patent applications and USPTO patent grants for Okabe; Ichiro.The latest application filed is for "dual damascene semiconductor devices".
Patent | Date |
---|---|
Method of forming a fine pattern using a silicon-oxide-based film, semiconductor device with a silicon-oxide-based film and method of manufacture thereof Grant 6,992,013 - Okabe , et al. January 31, 2 | 2006-01-31 |
Dual damascene semiconductor devices Grant 6,852,619 - Okabe February 8, 2 | 2005-02-08 |
Dual damascene semiconductor devices App 20030227090 - Okabe, Ichiro | 2003-12-11 |
Method of forming fine pattern Grant 6,586,163 - Okabe , et al. July 1, 2 | 2003-07-01 |
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