Oikawa; Tomo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Oikawa; Tomo.The latest application filed is for "method for purifying resin for photolithography".

Company Profile

0.11.10

Oikawa; Tomo - Ichihara JP
Oikawa; Tomo - Chiba N/A JP
OIKAWA; Tomo - Ichihara-Shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for purifying resin for photolithography Grant 9,023,982 - Oikawa May 5, 2	2015-05-05
Copolymer and composition for semiconductor lithography and process for producing the copolymer Grant 8,859,180 - Oikawa , et al. October 14, 2	2014-10-14
Method for producing resist copolymer having low molecular weight Grant 8,759,462 - Oikawa June 24, 2	2014-06-24
Method For Purifying Resin For Photolithography App 20140155564 - OIKAWA; Tomo	2014-06-05
Method for producing a copolymer for photoresist Grant 8,455,596 - Oikawa , et al. June 4, 2	2013-06-04
Method For Producing Resist Copolymer Having Low Molecular Weight App 20130123446 - Oikawa; Tomo	2013-05-16
Copolymer for immersion lithography and compositions Grant 8,211,615 - Yamagishi , et al. July 3, 2	2012-07-03
Resist polymer and method for producing the polymer Grant 8,163,852 - Yamagishi , et al. April 24, 2	2012-04-24
Positive resist composition and method of forming resist pattern Grant 7,972,762 - Muroi , et al. July 5, 2	2011-07-05
Method For Producing A Copolymer For Photoresist App 20100222526 - Oikawa; Tomo ; et al.	2010-09-02
Copolymer for semiconductor lithography and process for production thereof Grant 7,695,889 - Yamagishi , et al. April 13, 2	2010-04-13
Copolymer For Immersion Lithography And Compositions App 20100047710 - Yamagishi; Takanori ; et al.	2010-02-25
Positive Resist Composition And Method Of Forming Resist Pattern App 20090233220 - Muroi; Masaaki ; et al.	2009-09-17
Resist polymer and method for producing the polymer App 20090123868 - Yamagishi; Takanori ; et al.	2009-05-14
Copolymer for semiconductor lithography and process for production thereof App 20060257784 - Yamagishi; Takanori ; et al.	2006-11-16
Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process Grant 7,045,582 - Yamagishi , et al. May 16, 2	2006-05-16
Resist polymer and method for producing the polymer App 20050287474 - Yamagishi, Takanori ; et al.	2005-12-29
Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process App 20050131184 - Yamagishi, Takanori ; et al.	2005-06-16
Resist polymer and method for producing the polymer App 20040167298 - Yamagishi, Takanori ; et al.	2004-08-26

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