Oi; Fumio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Oi; Fumio.The latest application filed is for "organic-solvent dispersion of fine polysilsesquioxane particle, process for producing the same, aqueous dispersion polysilsesquioxane particle, and process".

Company Profile

0.7.6

Oi; Fumio - Wakayama JP
Oi; Fumio - Ashiya JP
Oi; Fumio - Hyogo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Organic-solvent dispersion of fine polysilsesquioxane particle, process for producing the same, aqueous dispersion of fine polysilsesquioxane particle, and process for producing the same Grant 8,088,863 - Ma , et al. January 3, 2	2012-01-03
Process for producing high-purity 4,4'-dihydroxydiphenyl sulfone Grant 7,456,321 - Ogata , et al. November 25, 2	2008-11-25
Organic-Solvent Dispersion of Fine Polysilsesquioxane Particle, Process for Producing the Same, Aqueous Dispersion Polysilsesquioxane Particle, and Process App 20080004359 - Ma; Chenghuan ; et al.	2008-01-03
Process for producing dihydroxydiphenylsulfone Grant 6,974,886 - Oi , et al. December 13, 2	2005-12-13
Color developer and thermal recording material containing the same App 20050272603 - Oi, Fumio ; et al.	2005-12-08
Process for producing high-purity 4,4'-dihydroxydiphenyl sulfone App 20050272956 - Ogata, Eiji ; et al.	2005-12-08
Process for producing mixture of dihydroxydiphenylsulfone isomers Grant 6,965,054 - Oi , et al. November 15, 2	2005-11-15
Process for producing dihydroxydiphenyl sulfone App 20050171384 - Oi, Fumio ; et al.	2005-08-04
Process for producing mixture of dihydroxydiphenylsulfone isomers Grant 6,861,562 - Oi , et al. March 1, 2	2005-03-01
Process for producing mixture of dihydroxydiphenylsulfone isomers App 20040254400 - Oi, Fumio ; et al.	2004-12-16
Process for producing mixture of dihydroxydiphenylsulfone isomers App 20040242935 - Oi, Fumio ; et al.	2004-12-02
Radiation-sensitive positive resist composition Grant 5,456,996 - Ozaki , et al. October 10, 1	1995-10-10
Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture Grant 5,080,997 - Hioki , et al. January 14, 1	1992-01-14

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