Ohzone; Takashi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ohzone; Takashi.The latest application filed is for "method of fabricating semiconductor device".
- Ohzone; Takashi - Yawata JP
- Ohzone; Takashi - Moriguchi JP
- Ohzone; Takashi - Kyoto JP
| Patent | Date |
|---|---|
| Method of fabricating semiconductor device Grant RE37,228 - Fuse , et al. June 12, 2 | 2001-06-12 |
| Method of fabricating semiconductor device Grant 4,918,027 - Fuse , et al. April 17, 1 | 1990-04-17 |
| Method of doping impurities into sidewall of trench by use of plasma source Grant 4,861,729 - Fuse , et al. August 29, 1 | 1989-08-29 |
| Method for fabrication of semiconductor devices Grant 4,261,792 - Tsuji , et al. April 14, 1 | 1981-04-14 |
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