Ohtoshi; Kenji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohtoshi; Kenji.The latest application filed is for "rotation angle measuring method of multi-charged particle beam image, rotation angle adjustment method of multi-charged particle beam image, and multi-charged particle beam writing apparatus".

Company Profile

0.11.10

Ohtoshi; Kenji - Kawasaki JP
Ohtoshi; Kenji - Kanagawa JP
OHTOSHI; Kenji - Kawasaki-shi JP
Ohtoshi; Kenji - Funabashi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatus Grant 9,653,262 - Iizuka , et al. May 16, 2	2017-05-16
Charged particle beam writing apparatus and charged particle beam writing method Grant 9,472,372 - Yamada , et al. October 18, 2	2016-10-18
Rotation angle measuring method of multi-charged particle beam image, rotation angle adjustment method of multi-charged particle beam image, and multi-charged particle beam writing apparatus Grant 9,466,461 - Iizuka , et al. October 11, 2	2016-10-11
Rotation Angle Measuring Method Of Multi-charged Particle Beam Image, Rotation Angle Adjustment Method Of Multi-charged Particle Beam Image, And Multi-charged Particle Beam Writing Apparatus App 20160211111 - IIZUKA; Osamu ; et al.	2016-07-21
Method Of Measuring Beam Position Of Multi Charged Particle Beam, And Multi Charged Particle Beam Writing Apparatus App 20160086764 - IIZUKA; Osamu ; et al.	2016-03-24
Charged Particle Beam Writing Apparatus And Charged Particle Beam Writing Method App 20160020063 - Yamada; Taku ; et al.	2016-01-21
Charged particle beam writing apparatus, and charged particle beam writing method Grant 9,190,245 - Motosugi , et al. November 17, 2	2015-11-17
Charged Particle Beam Writing Apparatus, And Charged Particle Beam Writing Method App 20150228455 - MOTOSUGI; Tomoo ; et al.	2015-08-13
Lithography apparatus and focusing method for charged particle beam Grant 8,253,112 - Iizuka , et al. August 28, 2	2012-08-28
Focusing method of charged particle beam and astigmatism adjusting method of charged particle Grant 8,188,443 - Ohtoshi , et al. May 29, 2	2012-05-29
Method of acquiring offset deflection amount for shaped beam and lithography apparatus Grant 8,008,631 - Nakayama , et al. August 30, 2	2011-08-30
Method of calculating deflection aberration correcting voltage and charged particle beam writing method Grant 7,679,068 - Kamikubo , et al. March 16, 2	2010-03-16
Method Of Acquiring Offset Deflection Amount For Shaped Beam And Lithography Apparatus App 20100001203 - Nakayama; Takahito ; et al.	2010-01-07
Lithography Apparatus And Focusing Method For Charged Particle Beam App 20090314950 - IIZUKA; Osamu ; et al.	2009-12-24
Deflector for equipment of electron beam lithography and equipment of electron beam lithography Grant 7,521,689 - Sanmiya , et al. April 21, 2	2009-04-21
Charged beam drawing apparatus and charged beam drawing method Grant 7,476,881 - Hattori , et al. January 13, 2	2009-01-13
Focusing Method Of Charged Particle Beam And Astigmatism Adjusting Method Of Charged Particle App 20080217553 - Ohtoshi; Kenji ; et al.	2008-09-11
Deflector For Equipment Of Electron Beam Lithography And Equipment Of Electron Beam Lithography App 20070181819 - SANMIYA; Yoshimasa ; et al.	2007-08-09
Method Of Calculating Deflection Aberration Correcting Voltage And Charged Particle Beam Writing Method App 20070158576 - Kamikubo; Takashi ; et al.	2007-07-12
Charged Beam Drawing Apparatus And Charged Beam Drawing Method App 20070114461 - HATTORI; Kiyoshi ; et al.	2007-05-24
Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus Grant 5,539,211 - Ohtoshi , et al. July 23, 1	1996-07-23

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