Ohtoshi; Hirokazu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohtoshi; Hirokazu.The latest application filed is for "leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program".

Company Profile

0.11.5

Ohtoshi; Hirokazu - Nara JP
Ohtoshi; Hirokazu - Nara-shi JP
Ohtoshi; Hirokazu - Nagahama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program Grant 7,641,382 - Izawa , et al. January 5, 2	2010-01-05
Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program App 20060068081 - Izawa; Hiroshi ; et al.	2006-03-30
Apparatus and method for processing a substrate Grant 6,833,155 - Shimoda , et al. December 21, 2	2004-12-21
Substrate treatment process Grant 6,694,792 - Tanaka , et al. February 24, 2	2004-02-24
Deposited-film formation apparatus, deposited-film formation process, vacuum system, leak judgment method, and computer-readable recording medium with recorded leak-judgment- executable program App 20030207021 - Izawa, Hiroshi ; et al.	2003-11-06
Apparatus and method for processing a substrate App 20030194482 - Shimoda, Hiroshi ; et al.	2003-10-16
Apparatus and method for processing a substrate Grant 6,602,347 - Shimoda , et al. August 5, 2	2003-08-05
Substrate treatment process App 20020038665 - Tanaka, Masatoshi ; et al.	2002-04-04
Process For Producing Photovoltaic Device App 20020037602 - OKADA, NAOTO ; et al.	2002-03-28
Process for producing photovoltaic element Grant 6,261,862 - Hori , et al. July 17, 2	2001-07-17
Photoelectric conversion element having a surface member or a protection member and building material using the same Grant 6,153,823 - Shiozaki , et al. November 28, 2	2000-11-28
Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus Grant 5,817,181 - Okamura , et al. October 6, 1	1998-10-06
Process for forming deposited film for light-receiving member, light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus Grant 5,455,138 - Okamura , et al. October 3, 1	1995-10-03
Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member Grant 5,314,780 - Takei , et al. May 24, 1	1994-05-24
Electrophotographic light-receiving member Grant 5,284,730 - Takei , et al. February 8, 1	1994-02-08
Apparatus for forming deposited films with microwave plasma CVD method Grant 5,232,507 - Ohtoshi , et al. August 3, 1	1993-08-03

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.