Ohto; Masaru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohto; Masaru.The latest application filed is for "cleaning liquid for semiconductor elements and cleaning method using same".

Company Profile

0.12.22

Ohto; Masaru - Tokyo JP
Ohto; Masaru - Chiba JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cleaning liquid composition, method for cleaning semiconductor element, and method for manufacturing semiconductor element Grant 9,587,208 - Shimada , et al. March 7, 2	2017-03-07
Cleaning liquid for semiconductor elements and cleaning method using same Grant 9,422,512 - Shimada , et al. August 23, 2	2016-08-23
Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same Grant 9,334,161 - Ohto , et al. May 10, 2	2016-05-10
Processing liquid for suppressing pattern collapse of fine metal structure, and method for producing fine metal structure using same Grant 9,196,472 - Ohto , et al. November 24, 2	2015-11-24
Cleaning Liquid For Semiconductor Elements And Cleaning Method Using Same App 20150210966 - Shimada; Kenji ; et al.	2015-07-30
Cleaning Liquid Composition, Method For Cleaning Semiconductor Element, And Method For Manufacturing Semiconductor Element App 20150152366 - Shimada; Kenji ; et al.	2015-06-04
Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquid Grant 8,980,812 - Matsunaga , et al. March 17, 2	2015-03-17
Etching composition for metal material and method for manufacturing semiconductor device by using same Grant 8,658,053 - Yaguchi , et al. February 25, 2	2014-02-25
Processing Liquid For Suppressing Pattern Collapse Of Microstructure, And Method For Producing Microstructure Using Same App 20130171828 - Matsunaga; Hiroshi ; et al.	2013-07-04
Treatment Liquid For Inhibiting Pattern Collapse In Microstructures, And Microstructure Manufacturing Method Using Said Treatment Liquid App 20130165365 - Matsunaga; Hiroshi ; et al.	2013-06-27
Treatment Liquid For Inhibiting Pattern Collapse In Microstructures, And Microstructure Manufacturing Method Using Said Treatment Liquid App 20130161284 - Matsunaga; Hiroshi ; et al.	2013-06-27
Treatment Solution For Preventing Pattern Collapse In Metal Fine Structure Body, And Process For Production Of Metal Fine Structure Body Using Same App 20120214722 - Ohto; Masaru ; et al.	2012-08-23
Treatment Solution For Preventing Pattern Collapse In Metal Fine Structure Body, And Process For Production Of Metal Fine Structure Body Using Same App 20120205345 - Ohto; Masaru ; et al.	2012-08-16
Processing Liquid For Suppressing Pattern Collapse Of Fine Metal Structure And Method For Producing Fine Metal Structure Using Same App 20120181249 - Ohto; Masaru ; et al.	2012-07-19
Processing Liquid For Suppressing Pattern Collapse Of Fine Metal Structure, And Method For Producing Fine Metal Structure Using Same App 20120135604 - Ohto; Masaru ; et al.	2012-05-31
Cleaning composition and process for producing semiconductor device Grant 7,977,292 - Matsunaga , et al. July 12, 2	2011-07-12
Etching Composition For Metal Material And Method For Manufacturing Semiconductor Device By Using Same App 20100216315 - Yaguchi; Kazuyoshi ; et al.	2010-08-26
Composition For Removing Residue From Wiring Board And Cleaning Method App 20100051066 - Kuwabara; Eiko ; et al.	2010-03-04
Cleaning Composition And Process For Producing Semiconductor Device App 20100029085 - Matsunaga; Hiroshi ; et al.	2010-02-04
Cleaning liquid and cleaning method Grant 7,572,758 - Shimada , et al. August 11, 2	2009-08-11
Cleaning liquid and cleaning method App 20070099810 - Matsunaga; Hiroshi ; et al.	2007-05-03
Cleaning liquid and cleaning method App 20060040838 - Shimada; Kenji ; et al.	2006-02-23
Method for releasing resist App 20040256358 - Shimizu, Hidetaka ; et al.	2004-12-23
Cleaning solution and cleaning process using the solution App 20040224866 - Matsunaga, Hiroshi ; et al.	2004-11-11
Etching agent composition for thin films having high permittivity and process for etching App 20040188385 - Yamada, Kenji ; et al.	2004-09-30
Resist stripping liquid containing fluorine compound App 20040029753 - Ikemoto, Kazuto ; et al.	2004-02-12
Method for removing resists App 20030148624 - Ikemoto, Kazuto ; et al.	2003-08-07

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