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Method for manufacturing a semiconductor device having a multi-layered insulating structure of SiOCH layers and an SiO.sub.2 layer Grant 7,833,901 - Ohto , et al. November 16, 2 | 2010-11-16 |
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Semiconductor device and method of manufacturing the same Grant 7,745,937 - Usami , et al. June 29, 2 | 2010-06-29 |
Semiconductor method having silicon-diffused metal wiring layer Grant 7,737,555 - Ohto , et al. June 15, 2 | 2010-06-15 |
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Semiconductor device having two distinct sioch layers Grant 7,132,732 - Ohto , et al. November 7, 2 | 2006-11-07 |
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Semiconductor device and manufacturing method thereof App 20040155342 - Usami, Tatsuya ;   et al. | 2004-08-12 |
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Semiconductor device and method and apparatus for manufacturing the same App 20010054765 - Ohto, Koichi ;   et al. | 2001-12-27 |
Plasma CVD apparatus App 20010047759 - Matsui, Takayuki ;   et al. | 2001-12-06 |
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Method for fabricating semiconductor device and apparatus for fabricating same App 20010003064 - Ohto, Koichi | 2001-06-07 |