loadpatents
name:-0.033576011657715
name:-0.029307842254639
name:-0.002312183380127
Ohtake; Hiroto Patent Filings

Ohtake; Hiroto

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohtake; Hiroto.The latest application filed is for "method of plasma etching of silicon-containing organic film using sulfur-based chemistry".

Company Profile
2.29.28
  • Ohtake; Hiroto - Hillsboro OR
  • Ohtake; Hiroto - Portland OR
  • Ohtake; Hiroto - Beaverton OR
  • Ohtake; Hiroto - Miyagi JP
  • Ohtake; Hiroto - Kurokawa-gun JP
  • Ohtake; Hiroto - Tokyo N/A JP
  • Ohtake; Hiroto - Minato-ku N/A JP
  • OHTAKE; Hiroto - Kanagawa JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of plasma etching of silicon-containing organic film using sulfur-based chemistry
Grant 10,529,589 - Karakas , et al. J
2020-01-07
Power modulation for etching high aspect ratio features
Grant 10,410,873 - Ohtake , et al. Sept
2019-09-10
Process for performing self-limited etching of organic materials
Grant 10,381,238 - Ohtake , et al. A
2019-08-13
Multi-frequency power modulation for etching high aspect ratio features
Grant 10,340,123 - Ohtake
2019-07-02
Method Of Plasma Etching Of Silicon-containing Organic Film Using Sulfur-based Chemistry
App 20180358233 - Karakas; Erdinc ;   et al.
2018-12-13
Selective SiARC removal
Grant 10,115,591 - Sridhar , et al. October 30, 2
2018-10-30
Process For Performing Self-limited Etching Of Organic Materials
App 20180254191 - Ohtake; Hiroto ;   et al.
2018-09-06
Selective SiARC Removal
App 20180197730 - Sridhar; Shyam ;   et al.
2018-07-12
Multi-frequency Power Modulation For Etching High Aspect Ratio Features
App 20170345619 - Ohtake; Hiroto
2017-11-30
Power Modulation For Etching High Aspect Ratio Features
App 20170207099 - Ohtake; Hiroto ;   et al.
2017-07-20
Plasma etching method
Grant 9,570,312 - Takeda , et al. February 14, 2
2017-02-14
Method of selectively removing a region formed of silicon oxide and plasma processing apparatus
Grant 9,502,537 - Kitamura , et al. November 22, 2
2016-11-22
Plasma etching method
Grant 9,412,607 - Kamada , et al. August 9, 2
2016-08-09
Multilayer film etching method and plasma processing apparatus
Grant 9,373,520 - Yoshimura , et al. June 21, 2
2016-06-21
Plasma processing method
Grant 9,305,795 - Kamada , et al. April 5, 2
2016-04-05
Etching method
Grant 9,105,585 - Matsuoka , et al. August 11, 2
2015-08-11
Etching method
Grant 9,087,798 - Ohtake , et al. July 21, 2
2015-07-21
Multilayer Film Etching Method And Plasma Processing Apparatus
App 20150140822 - YOSHIMURA; Shota ;   et al.
2015-05-21
Semiconductor device manufacturing method
Grant 9,034,698 - Ozu , et al. May 19, 2
2015-05-19
Plasma Etching Method
App 20150099366 - Takeda; Ryohei ;   et al.
2015-04-09
Plasma Processing Method
App 20150064926 - Kamada; Tomiko ;   et al.
2015-03-05
Method Of Selectively Removing A Region Formed Of Silicon Oxide And Plasma Processing Apparatus
App 20150064922 - KITAMURA; Akinori ;   et al.
2015-03-05
Semiconductor Device Manufacturing Method
App 20150056773 - Ozu; Toshihisa ;   et al.
2015-02-26
Etching Method
App 20150044877 - Ohtake; Hiroto ;   et al.
2015-02-12
Plasma Etching Method
App 20140332372 - Kamada; Tomiko ;   et al.
2014-11-13
Etching Method
App 20140308817 - Matsuoka; Hironori ;   et al.
2014-10-16
Dry metal etching method
Grant 8,808,562 - Ohsawa , et al. August 19, 2
2014-08-19
Semiconductor device capable of reducing interelectrode leak current and manufacturing method thereof
Grant 8,803,285 - Ohtake , et al. August 12, 2
2014-08-12
Highly selective spacer etch process with reduced sidewall spacer slimming
Grant 8,664,125 - Raley , et al. March 4, 2
2014-03-04
Wiring structure and method for manufacturing the same
Grant 8,592,303 - Tada , et al. November 26, 2
2013-11-26
Highly Selective Spacer Etch Process With Reduced Sidewall Spacer Slimming
App 20130164940 - RALEY; Angelique Denise ;   et al.
2013-06-27
Dry Metal Etching Method
App 20130065398 - OHSAWA; Yusuke ;   et al.
2013-03-14
Semiconductor device
Grant 8,278,763 - Tada , et al. October 2, 2
2012-10-02
Semiconductor Device
App 20120013023 - TADA; Munehiro ;   et al.
2012-01-19
Method Of Producing A Dual Damascene Multilayer Interconnection And Multilayer Interconnection Structure
App 20110316161 - OHTAKE; Hiroto ;   et al.
2011-12-29
Semiconductor device, method for manufacturing semiconductor device and apparatus for manufacturing semiconductor
Grant 8,043,957 - Tada , et al. October 25, 2
2011-10-25
Multilayer wiring structure, semiconductor device, pattern transfer mask and method for manufacturing multilayer wiring structure
Grant 7,999,392 - Ohtake , et al. August 16, 2
2011-08-16
Wiring Structure And Method For Manufacturing The Same
App 20100151675 - TADA; Munehiro ;   et al.
2010-06-17
Wiring structure and method for manufacturing the same
Grant 7,701,060 - Tada , et al. April 20, 2
2010-04-20
Semiconductor device and having trench interconnection
Grant 7,622,808 - Ohtake , et al. November 24, 2
2009-11-24
Semiconductor Device, Method For Manufacturing Semiconductor Device And Apparatus For Manufacturing Semiconductor
App 20090267198 - Tada; Munehiro ;   et al.
2009-10-29
Semiconductor device and its manufacturing method
Grant 7,482,694 - Ohtake , et al. January 27, 2
2009-01-27
Method Of Producing Multilayer Interconnection And Multilayer Interconnection Structure
App 20090014887 - Ohtake; Hiroto ;   et al.
2009-01-15
Multilayer Wiring Structure, Semiconductor Device, Pattern Transfer Mask and Method for Manufacturing Multilayer Wiring Structure
App 20080136043 - Ohtake; Hiroto ;   et al.
2008-06-12
Semiconductor Device Capable Of Reducing Interelectrode Leak Current And Manufacturing Method Thereof
App 20070262417 - Ohtake; Hiroto ;   et al.
2007-11-15
Wiring structure and method for manufacturing the same
App 20070013069 - Tada; Munehiro ;   et al.
2007-01-18
Semiconductor device having trench interconnection and manufacturing method of semiconductor device
App 20060131754 - Ohtake; Hiroto ;   et al.
2006-06-22
Method of manufacturing a semiconductor device capable of etching a multi-layer of organic films at a high selectivity
Grant 6,972,453 - Ohtake , et al. December 6, 2
2005-12-06
Semiconductor device and its manufacturing method
App 20050253272 - Ohtake, Hiroto ;   et al.
2005-11-17
Method of manufacturing a semiconductor device capable of etching a multi-layer of organic films at a high selectivity
App 20020155639 - Ohtake, Hiroto ;   et al.
2002-10-24
Method for plasma treatment and apparatus for plasma treatment
Grant 6,054,063 - Ohtake , et al. April 25, 2
2000-04-25

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed