Ohsawa; Youichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohsawa; Youichi.The latest application filed is for "sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method".

Company Profile

0.103.83

Ohsawa; Youichi - Joetsu JP
Ohsawa; Youichi - Jyoetsu N/A JP
OHSAWA; Youichi - Joetsu-shi JP
Ohsawa; Youichi - Niigata JP
Ohsawa; Youichi - Niigata-ken JP
Ohsawa; Youichi - Nakakubiki-gun JP
Ohsawa; Youichi - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method Grant 9,233,919 - Ohsawa , et al. January 12, 2	2016-01-12
Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition Grant 8,900,793 - Sagehashi , et al. December 2, 2	2014-12-02
Chemically amplified negative resist composition and patterning process Grant 8,859,181 - Masunaga , et al. October 14, 2	2014-10-14
Sulfonium Salt-containing Polymer, Resist Composition, Patterning Process, And Sulfonium Salt Monomer And Making Method App 20140296561 - OHSAWA; Youichi ; et al.	2014-10-02
Patterning process and resist composition Grant 8,822,136 - Hatakeyama , et al. September 2, 2	2014-09-02
Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process Grant 8,815,492 - Ohsawa , et al. August 26, 2	2014-08-26
Positive resist composition and patterning process Grant 8,795,942 - Kobayashi , et al. August 5, 2	2014-08-05
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method Grant 8,785,105 - Ohsawa , et al. July 22, 2	2014-07-22
Patterning process and resist composition Grant 8,741,546 - Hatakeyama , et al. June 3, 2	2014-06-03
Patterning process and resist composition Grant 8,741,554 - Hatakeyama , et al. June 3, 2	2014-06-03
Positive resist composition and patterning process Grant 8,703,384 - Kobayashi , et al. April 22, 2	2014-04-22
Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process Grant 8,691,490 - Ohashi , et al. April 8, 2	2014-04-08
Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom Grant 8,686,166 - Sagehashi , et al. April 1, 2	2014-04-01
Polymer, chemically amplified positive resist composition and pattern forming process Grant 8,632,939 - Masunaga , et al. January 21, 2	2014-01-21
Chemically amplified resist composition and patterning process Grant 8,628,908 - Watanabe , et al. January 14, 2	2014-01-14
Photoacid generator, resist composition, and patterning process Grant 8,609,889 - Ohashi , et al. December 17, 2	2013-12-17
Sulfonium salt, resist composition, and patterning process Grant 8,597,869 - Sagehashi , et al. December 3, 2	2013-12-03
Sulfonium salt, resist composition, and patterning process Grant 8,535,869 - Ohsawa , et al. September 17, 2	2013-09-17
Patterning Process And Resist Composition App 20130209936 - Hatakeyama; Jun ; et al.	2013-08-15
Patterning process and resist composition Grant 8,507,175 - Hatakeyama , et al. August 13, 2	2013-08-13
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS App 20130108964 - Ohsawa; Youichi ; et al.	2013-05-02
Patterning Process And Resist Composition App 20130108960 - Hatakeyama; Jun ; et al.	2013-05-02
Patterning process and resist composition Grant 8,426,115 - Hatakeyama , et al. April 23, 2	2013-04-23
Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process Grant 8,394,570 - Ohashi , et al. March 12, 2	2013-03-12
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS App 20130034813 - Ohsawa; Youichi ; et al.	2013-02-07
Chemically amplified positive photoresist composition and pattern forming process Grant 8,361,693 - Masunaga , et al. January 29, 2	2013-01-29
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process Grant 8,349,533 - Ohsawa , et al. January 8, 2	2013-01-08
Preparation Of 2,2-bis (fluoroalkyl) Oxirane And Preparation Of Photoacid Generator Therefrom App 20130005997 - SAGEHASHI; Masayoshi ; et al.	2013-01-03
Photoresist undercoat-forming material and patterning process Grant 8,338,078 - Hatakeyama , et al. December 25, 2	2012-12-25
Polymer, Chemically Amplified Resist Composition, And Patterning Process Using Said Chemically Amplified Resist Composition App 20120308932 - SAGEHASHI; Masayoshi ; et al.	2012-12-06
Resist Composition And Patterning Process App 20120288796 - KATAYAMA; Kazuhiro ; et al.	2012-11-15
Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same Grant 8,283,104 - Ohashi , et al. October 9, 2	2012-10-09
Chemically Amplified Resist Composition And Patterning Process App 20120225386 - Watanabe; Takeru ; et al.	2012-09-06
Resist Composition And Patterning Process Using The Same App 20120214100 - Kobayashi; Tomohiro ; et al.	2012-08-23
Chemically-amplified positive resist composition and patterning process thereof Grant 8,202,677 - Takeda , et al. June 19, 2	2012-06-19
Polymer, Positive Resist Composition, And Patterning Process App 20120135357 - KOBAYASHI; Tomohiro ; et al.	2012-05-31
Positive Resist Composition And Patterning Process App 20120135350 - Kobayashi; Tomohiro ; et al.	2012-05-31
Sulfonium Salt-containing Polymer, Resist Composition, Patterning Process, And Sulfonium Salt Monomer And Making Method App 20120129103 - Ohsawa; Youichi ; et al.	2012-05-24
Sulfonium salt, resist composition, and patterning process Grant 8,173,354 - Ohsawa , et al. May 8, 2	2012-05-08
Sulfonium Salt, Resist Composition, And Patterning Process App 20120100486 - Sagehashi; Masayoshi ; et al.	2012-04-26
Sulfonium Salt, Resist Composition, And Patterning Process App 20120045724 - OHSAWA; Youichi ; et al.	2012-02-23
Photoacid generator, resist composition, and patterning process Grant 8,114,571 - Ohashi , et al. February 14, 2	2012-02-14
Photoacid generator, resist composition, and patterning process Grant 8,114,570 - Ohsawa , et al. February 14, 2	2012-02-14
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process Grant 8,105,748 - Ohashi , et al. January 31, 2	2012-01-31
Positive resist composition and patterning process Grant 8,062,828 - Ohsawa , et al. November 22, 2	2011-11-22
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process Grant 8,057,985 - Ohashi , et al. November 15, 2	2011-11-15
Sulfonium salt-containing polymer, resist composition, and patterning process Grant 8,048,610 - Ohsawa , et al. November 1, 2	2011-11-01
Sulfonium salt-containing polymer, resist composition, and patterning process Grant 8,039,198 - Tachibana , et al. October 18, 2	2011-10-18
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 8,030,515 - Kobayashi , et al. October 4, 2	2011-10-04
Positive resist compositions and patterning process Grant 8,021,822 - Ohsawa , et al. September 20, 2	2011-09-20
Positive resist compositions and patterning process Grant 8,017,302 - Ohsawa , et al. September 13, 2	2011-09-13
Polymer, Chemically Amplified Positive Resist Composition And Pattern Forming Process App 20110212391 - Masunaga; Keiichi ; et al.	2011-09-01
Chemically Amplified Negative Resist Composition And Patterning Process App 20110212390 - Masunaga; Keiichi ; et al.	2011-09-01
Positive resist compositions and patterning process Grant 7,993,811 - Ohsawa , et al. August 9, 2	2011-08-09
Novel Sulfonium Salt, Polymer, Method For Producing The Polymer, Resist Composition And Patterning Process App 20110189607 - OHASHI; Masaki ; et al.	2011-08-04
Resist composition and patterning process Grant 7,977,027 - Takeda , et al. July 12, 2	2011-07-12
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process App 20110160481 - KOBAYASHI; Katsuhiro ; et al.	2011-06-30
Patterning Process And Resist Composition App 20110091812 - Hatakeyama; Jun ; et al.	2011-04-21
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,928,262 - Kobayashi , et al. April 19, 2	2011-04-19
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,919,226 - Ohsawa , et al. April 5, 2	2011-04-05
Patterning Process And Resist Composition App 20110033803 - Hatakeyama; Jun ; et al.	2011-02-10
Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern Grant 7,871,761 - Hatakeyama , et al. January 18, 2	2011-01-18
Sulfonium Salt, Resist Composition, And Patterning Process App 20110008735 - OHSAWA; Youichi ; et al.	2011-01-13
Photoacid Generator, Resist Composition, And Patterning Process App 20110003247 - Ohashi; Masaki ; et al.	2011-01-06
Chemically Amplified Positive Photoresist Composition And Pattern Forming Process App 20100316955 - Masunaga; Keiichi ; et al.	2010-12-16
Patterning Process And Resist Composition App 20100304297 - HATAKEYAMA; Jun ; et al.	2010-12-02
Novel Sulfonate And Its Derivative, Photosensitive Acid Generator, And Resist Composition And Patterning Process Using The Same App 20100209827 - OHASHI; Masaki ; et al.	2010-08-19
Sulfonium Salt, Acid Generator, Resist Composition, Photomask Blank, And Patterning Process App 20100143830 - OHASHI; Masaki ; et al.	2010-06-10
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process App 20100119970 - Ohsawa; Youichi ; et al.	2010-05-13
Photoresist Undercoat-forming Material And Patterning Process App 20100104977 - Hatakeyama; Jun ; et al.	2010-04-29
Polymerizable Anion-containing Sulfonium Salt And Polymer, Resist Composition, And Patterning Process App 20100099042 - OHASHI; Masaki ; et al.	2010-04-22
Polymerizable Anion-containing Sulfonium Salt And Polymer, Resist Composition, And Patterning Process App 20100055608 - Ohashi; Masaki ; et al.	2010-03-04
Photoacid generator, resist composition, and patterning process Grant 7,670,751 - Ohashi , et al. March 2, 2	2010-03-02
Chemically-amplified positive resist composition and patterning process thereof App 20100009286 - Takeda; Takanobu ; et al.	2010-01-14
Resist composition and patterning process using the same Grant 7,629,106 - Hatakeyama , et al. December 8, 2	2009-12-08
Nitrogen-containing organic compound, resist composition and patterning process Grant 7,629,108 - Watanabe , et al. December 8, 2	2009-12-08
Novel Photoacid Generator, Resist Composition, And Patterning Process App 20090274978 - OHASHI; Masaki ; et al.	2009-11-05
Sulfonium Salt-containing Polymer, Resist Composition, And Patterning Process App 20090269696 - OHSAWA; Youichi ; et al.	2009-10-29
Novel Photoacid Generator, Resist Composition, And Patterning Process App 20090246694 - Ohsawa; Youichi ; et al.	2009-10-01
Sulfonium Salt-containing Polymer, Resist Composition, And Patterning Process App 20090233223 - TACHIBANA; Seiichiro ; et al.	2009-09-17
Positive Resist Composition And Patterning Process App 20090202943 - Ohsawa; Youichi ; et al.	2009-08-13
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process Grant 7,569,326 - Ohsawa , et al. August 4, 2	2009-08-04
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,569,324 - Kobayashi , et al. August 4, 2	2009-08-04
Positive Resist Compositions And Patterning Process App 20090186296 - OHSAWA; Youichi ; et al.	2009-07-23
Positive Resist Compositions And Patterning Process App 20090186297 - Ohsawa; Youichi ; et al.	2009-07-23
Positive Resist Compositions And Patterning Process App 20090186298 - OHSAWA; Youichi ; et al.	2009-07-23
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,556,909 - Kobayashi , et al. July 7, 2	2009-07-07
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,531,290 - Kobayashi , et al. May 12, 2	2009-05-12
Photoacid generators, resist compositions, and patterning process Grant 7,527,912 - Ohsawa , et al. May 5, 2	2009-05-05
Thermal acid generator, resist undercoat material and patterning process Grant 7,514,202 - Ohsawa , et al. April 7, 2	2009-04-07
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,511,169 - Ohsawa , et al. March 31, 2	2009-03-31
Silicon-containing resist composition and patterning process Grant 7,510,816 - Takemura , et al. March 31, 2	2009-03-31
Novel Photoacid Generator, Resist Composition, And Patterning Process App 20090061358 - OHASHI; Masaki ; et al.	2009-03-05
Photoacid generators, chemically amplified resist compositions, and patterning process Grant 7,498,126 - Ohsawa , et al. March 3, 2	2009-03-03
Photoacid generators, chemically amplified resist compositions, and patterning process Grant 7,494,760 - Ohsawa , et al. February 24, 2	2009-02-24
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20080318160 - Ohsawa; Youichi ; et al.	2008-12-25
Resist composition and patterning process using the same Grant 7,459,261 - Hatakeyama , et al. December 2, 2	2008-12-02
Positive resist composition and patterning process App 20080153030 - Kobayashi; Tomohiro ; et al.	2008-06-26
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process App 20080124656 - KOBAYASHI; Katsuhiro ; et al.	2008-05-29
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process App 20080102407 - Ohsawa; Youichi ; et al.	2008-05-01
Nitrogen-containing organic compound, resist composition and patterning process App 20080102405 - Watanabe; Takeru ; et al.	2008-05-01
Resist Composition And Patterning Process App 20080096128 - TAKEDA; Takanobu ; et al.	2008-04-24
Novel photoacid generators, resist compositions, and patterning process App 20080085469 - Ohsawa; Youichi ; et al.	2008-04-10
Chemically amplified positive resist composition and patterning process Grant 7,335,458 - Ohsawa , et al. February 26, 2	2008-02-26
Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern App 20080032231 - Hatakeyama; Jun ; et al.	2008-02-07
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process App 20070298352 - KOBAYASHI; Katsuhiro ; et al.	2007-12-27
Chemically amplified positive resist composition and patterning process Grant 7,312,016 - Koitabashi , et al. December 25, 2	2007-12-25
Photoacid generators, chemically amplified resist compositions, and patterning process App 20070292768 - Ohsawa; Youichi ; et al.	2007-12-20
Photoacid generators, chemically amplified resist compositions, and patterning process App 20070287096 - Ohsawa; Youichi ; et al.	2007-12-13
Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method Grant 7,303,852 - Hatakeyama , et al. December 4, 2	2007-12-04
Thermal acid generator, resist undercoat material and patterning process App 20070264596 - Ohsawa; Youichi ; et al.	2007-11-15
Chemically amplified positive resist composition and patterning process Grant 7,288,363 - Koitabashi , et al. October 30, 2	2007-10-30
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same Grant 7,282,316 - Kobayashi , et al. October 16, 2	2007-10-16
Photoacid generators, chemically amplified resist compositions, and patterning process Grant 7,235,343 - Ohsawa , et al. June 26, 2	2007-06-26
Resist composition and patterning process using the same App 20070111140 - Hatakeyama; Jun ; et al.	2007-05-17
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20070099113 - Kobayashi; Katsuhiro ; et al.	2007-05-03
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20070099112 - Kobayashi; Katsuhiro ; et al.	2007-05-03
Photo acid generator, chemical amplification resist material Grant 7,211,367 - Kobayashi , et al. May 1, 2	2007-05-01
Chemically amplified positive resist composition and patterning process App 20070037091 - Koitabashi; Ryuji ; et al.	2007-02-15
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20060228648 - Ohsawa; Youichi ; et al.	2006-10-12
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process Grant 7,109,311 - Ohsawa , et al. September 19, 2	2006-09-19
Resist compositions and patterning process Grant 7,105,267 - Hatakeyama , et al. September 12, 2	2006-09-12
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process Grant 7,101,651 - Ohsawa , et al. September 5, 2	2006-09-05
Chemically amplified positive resist composition and patterning process App 20060188810 - Ohsawa; Youichi ; et al.	2006-08-24
Photo acid generator, chemical amplification resist material and pattern formation method Grant 7,090,961 - Kobayashi , et al. August 15, 2	2006-08-15
Photo acid generator, chemical amplification resist material and pattern formation method App 20060160023 - Kobayashi; Tomohiro ; et al.	2006-07-20
Resist composition and patterning process using the same App 20060147836 - Hatakeyama; Jun ; et al.	2006-07-06
Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process Grant 7,056,640 - Ohsawa , et al. June 6, 2	2006-06-06
Silicon-containing resist composition and patterning process App 20060073413 - Takemura; Katsuya ; et al.	2006-04-06
Chemically amplified positive resist composition and patterning process App 20050233245 - Koitabashi, Ryuji ; et al.	2005-10-20
Photoacid generators, chemically amplified resist compositions, and patterning process Grant 6,916,591 - Ohsawa , et al. July 12, 2	2005-07-12
Resist composition Grant 6,916,593 - Hatakeyama , et al. July 12, 2	2005-07-12
Novel sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning process using the same App 20050048395 - Kobayashi, Katsuhiro ; et al.	2005-03-03
Chemical amplification, positive resist compositions Grant 6,838,224 - Ohsawa , et al. January 4, 2	2005-01-04
Photoacid generators, chemically amplified resist compositions, and patterning process App 20040229162 - Ohsawa, Youichi ; et al.	2004-11-18
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process App 20040166432 - Ohsawa, Youichi ; et al.	2004-08-26
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process App 20040167322 - Ohsawa, Youichi ; et al.	2004-08-26
Resist composition App 20040106063 - Hatakeyama, Jun ; et al.	2004-06-03
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process Grant 6,713,612 - Kobayashi , et al. March 30, 2	2004-03-30
Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process App 20040033432 - Ohsawa, Youichi ; et al.	2004-02-19
Photoacid generators, chemically amplified positive resist compositions, and patterning process App 20040033440 - Maeda, Kazunori ; et al.	2004-02-19
Onium salts, photoacid generators, resist compositions, and patterning process Grant 6,692,893 - Ohsawa , et al. February 17, 2	2004-02-17
Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process Grant 6,689,530 - Ohsawa , et al. February 10, 2	2004-02-10
Chemical amplification, positive resist compositions Grant 6,682,869 - Ohsawa , et al. January 27, 2	2004-01-27
Resist composition Grant 6,673,511 - Hatakeyama , et al. January 6, 2	2004-01-06
Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method App 20030235779 - Hatakeyama, Jun ; et al.	2003-12-25
Photo acid generator, chemical amplification resist material and pattern formation method App 20030224290 - Kobayashi, Tomohiro ; et al.	2003-12-04
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process App 20030224298 - Kobayashi, Katsuhiro ; et al.	2003-12-04
Photoacid generators, chemically amplified resist compositions, and patterning process App 20030215738 - Ohsawa, Youichi ; et al.	2003-11-20
Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process App 20030180653 - Ohsawa, Youichi ; et al.	2003-09-25
Resist compositions and patterning process App 20030113659 - Hatakeyama, Jun ; et al.	2003-06-19
Onium salts, photoacid generators, resist compositions, and patterning process Grant 6,551,758 - Ohsawa , et al. April 22, 2	2003-04-22
Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process Grant 6,440,634 - Ohsawa , et al. August 27, 2	2002-08-27
Onium salts, photoacid generators, resist compositions, and patterning process Grant 6,416,928 - Ohsawa , et al. July 9, 2	2002-07-09
Novel onium salts, photoacid generators, resist compositions, and patterning process App 20020076643 - Ohsawa, Youichi ; et al.	2002-06-20
Novel onium salts, photoacid generators, resist compositions, and patterning process App 20020077493 - Ohsawa, Youichi ; et al.	2002-06-20
Resist compositions and patterning process Grant 6,395,446 - Seki , et al. May 28, 2	2002-05-28
Resist compositions and patterning process Grant 6,338,931 - Maeda , et al. January 15, 2	2002-01-15
Chemical amplification, positive resist compositions App 20010038971 - Ohsawa, Youichi ; et al.	2001-11-08
Chemical amplification, positive resist compositions App 20010033994 - Ohsawa, Youichi ; et al.	2001-10-25
Resist compositions and patterning process App 20010033990 - Hatakeyama, Jun ; et al.	2001-10-25
Positive resist composition Grant 6,156,481 - Takeda , et al. December 5, 2	2000-12-05
Sulfonium salts and chemically amplified positive resist compositions Grant 5,847,218 - Ohsawa , et al. December 8, 1	1998-12-08
Tristertbutoxyphenyl sulfonium tosylate compound Grant 5,633,409 - Watanabe , et al. May 27, 1	1997-05-27
Sulfonium salt and resist composition Grant 5,569,784 - Watanabe , et al. October 29, 1	1996-10-29
III-V compound semiconductor device formed on silicon substrate Grant 5,473,174 - Ohsawa December 5, 1	1995-12-05