Ohnishi; Ryuji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohnishi; Ryuji.The latest application filed is for "resist underlayer film formation composition and method for forming resist pattern using the same".

Company Profile

0.13.12

Ohnishi; Ryuji - Toyama JP
OHNISHI; Ryuji - Toyama-shi JP
Ohnishi; Ryuji - Takamatsu JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound Grant 10,113,083 - Ohnishi , et al. October 30, 2	2018-10-30
Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same Grant 9,927,705 - Fujitani , et al. March 27, 2	2018-03-27
Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same Grant 9,746,768 - Ohnishi , et al. August 29, 2	2017-08-29
Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same Grant 9,494,864 - Ohnishi , et al. November 15, 2	2016-11-15
Resist underlayer film formation composition and method for forming resist pattern using the same Grant 9,448,480 - Nishita , et al. September 20, 2	2016-09-20
Resist Underlayer Film Formation Composition And Method For Forming Resist Pattern Using The Same App 20160238936 - NISHITA; Tokio ; et al.	2016-08-18
Resist Underlayer Film-forming Composition Containing Polymer Which Contains Nitrogen-containing Ring Compound App 20160186006 - OHNISHI; Ryuji ; et al.	2016-06-30
Additive For Resist Underlayer Film-forming Composition And Resist Underlayer Film-forming Composition Containing The Same App 20160147152 - FUJITANI; Noriaki ; et al.	2016-05-26
Resist underlayer film-forming composition for EUV lithography containing condensation polymer Grant 9,240,327 - Sakamoto , et al. January 19, 2	2016-01-19
Resist Overlayer Film Forming Composition For Lithography And Method For Producing Semiconductor Device Using The Same App 20150362835 - OHNISHI; Ryuji ; et al.	2015-12-17
Resist Overlayer Film Forming Composition For Lithography And Method For Manufacturing Semiconductor Device Using The Same App 20150248057 - Ohnishi; Ryuji ; et al.	2015-09-03
Resist overlayer film forming composition for lithography Grant 9,046,768 - Ohnishi , et al. June 2, 2	2015-06-02
Resist underlayer film forming composition and method for forming resist pattern using the same Grant 8,962,234 - Ohnishi , et al. February 24, 2	2015-02-24
Resist Overlayer Film Forming Composition For Lithography App 20140255847 - Ohnishi; Ryuji ; et al.	2014-09-11
Resist Underlayer Film-forming Composition For Euv Lithography Containing Condensation Polymer App 20140170567 - Sakamoto; Rikimaru ; et al.	2014-06-19
Resist underlayer film forming composition, and method for forming resist pattern using the same Grant 8,722,840 - Sakamoto , et al. May 13, 2	2014-05-13
Resist Underlayer Film Forming Composition And Method For Forming Resist Pattern Using The Same App 20140004465 - Ohnishi; Ryuji ; et al.	2014-01-02
Resist Underlayer Film Forming Composition, And Method For Forming Resist Pattern Using The Same App 20130230809 - Sakamoto; Rikimaru ; et al.	2013-09-05
Method and apparatus for detecting significant difference of sheet material Grant 4,975,971 - Ohnishi December 4, 1	1990-12-04

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