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Processing method for conservation of processing gases Grant 7,628,931 - Saito , et al. December 8, 2 | 2009-12-08 |
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device Grant 7,595,885 - Sakai , et al. September 29, 2 | 2009-09-29 |
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Gas recirculation flow control method and apparatus for use in vacuum system Grant 6,782,907 - Kawasaki , et al. August 31, 2 | 2004-08-31 |
Plasma processing apparatus with reduced parasitic capacity and loss in RF power Grant 6,780,278 - Hayashi , et al. August 24, 2 | 2004-08-24 |
Plasma processing apparatus and plasma processing method App 20040144491 - Ohuchi, Junko ;   et al. | 2004-07-29 |
High speed silicon etching method App 20040097079 - Mimura, Takanori ;   et al. | 2004-05-20 |
Method for fabricating a pattern and method for manufacturing a semiconductor device App 20040058533 - Sakai, Takayuki ;   et al. | 2004-03-25 |
Method for manufacturing a semiconductor device using recirculation of a process gas Grant 6,689,699 - Sakai , et al. February 10, 2 | 2004-02-10 |
Method of manufacturing semiconductor device and semiconductor device App 20040017011 - Narita, Masaki ;   et al. | 2004-01-29 |
Method for manufacturing a semiconductor device App 20030181031 - Kojima, Akihiro ;   et al. | 2003-09-25 |
Manufacturing method of semiconductor device using mask pattern having high etching resistance Grant 6,576,562 - Ohuchi , et al. June 10, 2 | 2003-06-10 |
Plasma processing App 20020192972 - Narita, Masaki ;   et al. | 2002-12-19 |
Dry etching method and apparatus App 20020155724 - Sakai, Takayuki ;   et al. | 2002-10-24 |
Method of making semiconductor device App 20020155727 - Narita, Masaki ;   et al. | 2002-10-24 |
Gas recirculation flow control method and apparatus for use in vacuum system App 20020134439 - Kawasaki, Hiroyuki ;   et al. | 2002-09-26 |
Manufacturing method of semiconductor device using mask pattern having high etching resistance App 20020119612 - Ohuchi, Junko ;   et al. | 2002-08-29 |
Plasma processing method and plasma processing apparatus Grant 6,433,297 - Kojima , et al. August 13, 2 | 2002-08-13 |
Plasma processing apparatus with reduced parasitic capacity and loss in RF power App 20020042204 - Hayashi, Hisataka ;   et al. | 2002-04-11 |
Semiconductor processing apparatus and method for manufacturing a semiconductor device App 20020034880 - Sakai, Itsuko ;   et al. | 2002-03-21 |
Semiconductor Device With A Thin Gate Stack Having A Plurality Of Insulating Layers App 20020014657 - OHIWA, TOKUHISA ;   et al. | 2002-02-07 |
Plasma processing method App 20010051232 - Sakai, Itsuko ;   et al. | 2001-12-13 |
Method of forming a pattern App 20010034131 - Sato, Yasuhiko ;   et al. | 2001-10-25 |
Gas recovery system and gas recovery method App 20010015133 - Sakai, Itsuko ;   et al. | 2001-08-23 |
Fabrication process using a multi-layer antireflective layer Grant 5,998,100 - Azuma , et al. December 7, 1 | 1999-12-07 |
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Fabrication process using a thin resist Grant 5,759,746 - Azuma , et al. June 2, 1 | 1998-06-02 |
Method of etching silicon nitride film Grant 5,756,402 - Jimbo , et al. May 26, 1 | 1998-05-26 |
Thin film forming method and apparatus Grant 5,658,389 - Matsuda , et al. August 19, 1 | 1997-08-19 |
Dry etching method Grant 5,310,454 - Ohiwa , et al. May 10, 1 | 1994-05-10 |