loadpatents
name:-0.067225933074951
name:-0.034034013748169
name:-0.00053977966308594
Ohiwa; Tokuhisa Patent Filings

Ohiwa; Tokuhisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohiwa; Tokuhisa.The latest application filed is for "sputtering apparatus and manufacturing method of magnetoresistive element".

Company Profile
0.33.39
  • Ohiwa; Tokuhisa - Yokkaichi JP
  • OHIWA; Tokuhisa - Seoul KR
  • Ohiwa; Tokuhisa - Tokyo N/A JP
  • OHIWA; Tokuhisa - Kawasaki-shi JP
  • Ohiwa; Tokuhisa - Mie-ken JP
  • Ohiwa; Tokuhisa - Yokkaichi-Shi JP
  • Ohiwa; Tokuhisa - Kawasaki JP
  • Ohiwa; Tokuhisa - Kanagawa JP
  • Ohiwa; Tokuhisa - Kanagawa-ken JP
  • Ohiwa; Tokuhisa - Fishkill NY
  • Ohiwa; Tokuhisa - Takatsu-ku JP
  • Ohiwa; Tokuhisa - Yokohama JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma processing method and manufacturing method of semiconductor device
Grant 9,177,781 - Tahara , et al. November 3, 2
2015-11-03
Sputtering Apparatus And Manufacturing Method Of Magnetoresistive Element
App 20150259788 - NAGAMINE; Makoto ;   et al.
2015-09-17
Deposit removal method
Grant 9,126,229 - Tahara , et al. September 8, 2
2015-09-08
Plasma Etching Method And Plasma Etching Apparatus
App 20140284308 - MATSUYAMA; Shoichiro ;   et al.
2014-09-25
Deposit Removal Method
App 20140083979 - Tahara; Shigeru ;   et al.
2014-03-27
Semiconductor device producing method
Grant 8,513,134 - Omura , et al. August 20, 2
2013-08-20
Semiconductor device and method for manufacturing same
Grant 8,487,365 - Sasaki , et al. July 16, 2
2013-07-16
Method for manufacturing semiconductor device including a patterned SiOC film as a mask
Grant 8,211,783 - Sakurai , et al. July 3, 2
2012-07-03
Semiconductor Device Producing Method
App 20120021605 - OMURA; Mitsuhiro ;   et al.
2012-01-26
Plasma Processing Method And Manufacturing Method Of Semiconductor Device
App 20120009786 - TAHARA; Shigeru ;   et al.
2012-01-12
Semiconductor Device And Method For Manufacturing Same
App 20110291178 - SASAKI; Toshiyuki ;   et al.
2011-12-01
Method For Manufacturing Semiconductor Device
App 20110183497 - SAKURAI; Noriko ;   et al.
2011-07-28
Substrate Cleaning Method And Substrate Cleaning Apparatus
App 20110168205 - TAHARA; Shigeru ;   et al.
2011-07-14
Method of manufacturing semiconductor device
Grant 7,767,582 - Nishiyama , et al. August 3, 2
2010-08-03
Capacitive coupling plasma processing apparatus
Grant 7,767,055 - Himori , et al. August 3, 2
2010-08-03
Processing method for conservation of processing gases
Grant 7,628,931 - Saito , et al. December 8, 2
2009-12-08
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
Grant 7,595,885 - Sakai , et al. September 29, 2
2009-09-29
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
App 20080137083 - Sakai; Takayuki ;   et al.
2008-06-12
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
Grant 7,349,088 - Sakai , et al. March 25, 2
2008-03-25
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
Grant 7,327,455 - Sakai , et al. February 5, 2
2008-02-05
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
App 20070273880 - Sakai; Takayuki ;   et al.
2007-11-29
Etching method
Grant 7,285,498 - Ogawa , et al. October 23, 2
2007-10-23
Substrate Transferring Apparatus, Substrate Processing Apparatus, And Substrate Processing Method
App 20070227033 - Kobayashi; Yoshiyuki ;   et al.
2007-10-04
Method of manufacturing semiconductor device
App 20070082493 - Nishiyama; Nobuyasu ;   et al.
2007-04-12
Plasma processing method
Grant 7,182,879 - Sakai , et al. February 27, 2
2007-02-27
Capacitive coupling plasma processing apparatus
App 20060118044 - Himori; Shinji ;   et al.
2006-06-08
Method for fabricating a pattern and method for manufacturing a semiconductor device
Grant 7,045,462 - Sakai , et al. May 16, 2
2006-05-16
High speed silicon etching method
Grant 7,022,616 - Mimura , et al. April 4, 2
2006-04-04
Processing method for conservation of processing gases
App 20050279731 - Saito, Masashi ;   et al.
2005-12-22
Method of manufacturing semiconductor device
App 20050215062 - Miyagawa, Osamu ;   et al.
2005-09-29
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
App 20050140975 - Sakai, Takayuki ;   et al.
2005-06-30
Method of sequentially processing a plurality of lots each including semiconductor substrates
Grant 6,911,398 - Narita , et al. June 28, 2
2005-06-28
Method of manufacturing semiconductor device and semiconductor device
Grant 6,887,802 - Narita , et al. May 3, 2
2005-05-03
Etching method
App 20050085077 - Ogawa, Kazuto ;   et al.
2005-04-21
High precision pattern forming method of manufacturing a semiconductor device
Grant 6,846,750 - Ohiwa , et al. January 25, 2
2005-01-25
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
App 20040238126 - Hayashi, Hisataka ;   et al.
2004-12-02
Semiconductor device including trench capacitor and manufacturing method of the same
App 20040188739 - Takenaka, Keiichi ;   et al.
2004-09-30
Method of manufacturing semiconductor device
App 20040192034 - Ohiwa, Tokuhisa ;   et al.
2004-09-30
Plasma processing method
App 20040168766 - Sakai, Itsuko ;   et al.
2004-09-02
Gas recirculation flow control method and apparatus for use in vacuum system
Grant 6,782,907 - Kawasaki , et al. August 31, 2
2004-08-31
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
Grant 6,780,278 - Hayashi , et al. August 24, 2
2004-08-24
Plasma processing apparatus and plasma processing method
App 20040144491 - Ohuchi, Junko ;   et al.
2004-07-29
High speed silicon etching method
App 20040097079 - Mimura, Takanori ;   et al.
2004-05-20
Method for fabricating a pattern and method for manufacturing a semiconductor device
App 20040058533 - Sakai, Takayuki ;   et al.
2004-03-25
Method for manufacturing a semiconductor device using recirculation of a process gas
Grant 6,689,699 - Sakai , et al. February 10, 2
2004-02-10
Method of manufacturing semiconductor device and semiconductor device
App 20040017011 - Narita, Masaki ;   et al.
2004-01-29
Method for manufacturing a semiconductor device
App 20030181031 - Kojima, Akihiro ;   et al.
2003-09-25
Manufacturing method of semiconductor device using mask pattern having high etching resistance
Grant 6,576,562 - Ohuchi , et al. June 10, 2
2003-06-10
Plasma processing
App 20020192972 - Narita, Masaki ;   et al.
2002-12-19
Dry etching method and apparatus
App 20020155724 - Sakai, Takayuki ;   et al.
2002-10-24
Method of making semiconductor device
App 20020155727 - Narita, Masaki ;   et al.
2002-10-24
Gas recirculation flow control method and apparatus for use in vacuum system
App 20020134439 - Kawasaki, Hiroyuki ;   et al.
2002-09-26
Manufacturing method of semiconductor device using mask pattern having high etching resistance
App 20020119612 - Ohuchi, Junko ;   et al.
2002-08-29
Plasma processing method and plasma processing apparatus
Grant 6,433,297 - Kojima , et al. August 13, 2
2002-08-13
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
App 20020042204 - Hayashi, Hisataka ;   et al.
2002-04-11
Semiconductor processing apparatus and method for manufacturing a semiconductor device
App 20020034880 - Sakai, Itsuko ;   et al.
2002-03-21
Semiconductor Device With A Thin Gate Stack Having A Plurality Of Insulating Layers
App 20020014657 - OHIWA, TOKUHISA ;   et al.
2002-02-07
Plasma processing method
App 20010051232 - Sakai, Itsuko ;   et al.
2001-12-13
Method of forming a pattern
App 20010034131 - Sato, Yasuhiko ;   et al.
2001-10-25
Gas recovery system and gas recovery method
App 20010015133 - Sakai, Itsuko ;   et al.
2001-08-23
Fabrication process using a multi-layer antireflective layer
Grant 5,998,100 - Azuma , et al. December 7, 1
1999-12-07
Polycide etching with HCL and chlorine
Grant 5,874,363 - Hoh , et al. February 23, 1
1999-02-23
Fabrication process using a thin resist
Grant 5,759,746 - Azuma , et al. June 2, 1
1998-06-02
Method of etching silicon nitride film
Grant 5,756,402 - Jimbo , et al. May 26, 1
1998-05-26
Thin film forming method and apparatus
Grant 5,658,389 - Matsuda , et al. August 19, 1
1997-08-19
Dry etching method
Grant 5,310,454 - Ohiwa , et al. May 10, 1
1994-05-10

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