Patent | Date |
---|
Semiconductor device and control method thereof Grant 11,456,028 - Sakui , et al. September 27, 2 | 2022-09-27 |
Semiconductor device Grant 11,437,349 - Sakui , et al. September 6, 2 | 2022-09-06 |
Semiconductor device comprising memory semiconductor chip in which memory cell is laminated on semiconductor substrate Grant 11,404,396 - Sakui , et al. August 2, 2 | 2022-08-02 |
Semiconductor Device And Method For Manufacturing Same App 20220208710 - OHBA; Takayuki | 2022-06-30 |
Semiconductor Device And Method For Manufacturing Same App 20220208683 - OHBA; Takayuki | 2022-06-30 |
Semiconductor apparatus including penetration electrodes connecting laminated semiconductor chips Grant 11,309,290 - Sakui , et al. April 19, 2 | 2022-04-19 |
Semiconductor apparatus Grant 11,302,379 - Sakui , et al. April 12, 2 | 2022-04-12 |
Semiconductor Device And Control Method Thereof App 20210280234 - Sakui; Koji ;   et al. | 2021-09-09 |
Semiconductor Device App 20210225810 - Sakui; Koji ;   et al. | 2021-07-22 |
Semiconductor Device App 20210225427 - Sakui; Koji ;   et al. | 2021-07-22 |
Three-dimensional Device And Manufacturing Method Thereof App 20210202477 - SUGATANI; Shinji ;   et al. | 2021-07-01 |
Semiconductor Apparatus App 20210118863 - Sakui; Koji ;   et al. | 2021-04-22 |
Semiconductor Apparatus App 20210104497 - Sakui; Koji ;   et al. | 2021-04-08 |
Semiconductor Apparatus App 20210104272 - Sakui; Koji ;   et al. | 2021-04-08 |
Semiconductor Device App 20200303009 - Sakui; Koji ;   et al. | 2020-09-24 |
Method of producing semiconductor device Grant 9,748,217 - Ohba August 29, 2 | 2017-08-29 |
Method Of Producing Semiconductor Device App 20130344655 - Ohba; Takayuki | 2013-12-26 |
Method of manufacturing semiconductor device Grant 8,415,202 - Ohba April 9, 2 | 2013-04-09 |
Method Of Manufacturing Semiconductor Device App 20110165730 - OHBA; Takayuki | 2011-07-07 |
Method of forming a dielectric film Grant 7,563,729 - Xiao , et al. July 21, 2 | 2009-07-21 |
Semiconductor device and a manufacturing method thereof Grant 7,279,790 - Kitada , et al. October 9, 2 | 2007-10-09 |
Method for fabricating a semiconductor device including the use of a compound containing silicon and nitrogen to form an insulation film of SiN, SiCN or SiOCN App 20070072381 - Furuhashi; Masayuki ;   et al. | 2007-03-29 |
Method for fabricating a semiconductor device including the use of a compound containing silicon and nitrogen to form an insulation film of SiN or SiCN Grant 7,166,516 - Furuhashi , et al. January 23, 2 | 2007-01-23 |
Manufacture method for semiconductor device with patterned film of ZrO.sub.2 or the like Grant 6,998,303 - Sugita , et al. February 14, 2 | 2006-02-14 |
Method of forming a dielectric film App 20050282400 - Xiao, Shiqin ;   et al. | 2005-12-22 |
Semiconductor device production method and semiconductor device production apparatus Grant 6,805,138 - Akbar , et al. October 19, 2 | 2004-10-19 |
Semiconductor device fabrication method App 20040132257 - Furuhashi, Masayuki ;   et al. | 2004-07-08 |
Manufacture method for semiconductor device with patterned film of ZrO2 or the like App 20040038555 - Sugita, Yoshihiro ;   et al. | 2004-02-26 |
Semiconductor device production method and semiconductor device production apparatus App 20040029381 - Akbar, Ade Asneil ;   et al. | 2004-02-12 |
Semiconductor device production method and semiconductor device production apparatus Grant 6,664,179 - Akbar , et al. December 16, 2 | 2003-12-16 |
Semiconductor device production method and semiconductor device production apparatus App 20030136423 - Akbar, Ade Asneil ;   et al. | 2003-07-24 |
Semiconductor device and a manufacturing method thereof App 20030042610 - Kitada, Hideki ;   et al. | 2003-03-06 |
Method and apparatus for wiring, wire, and integrated circuit App 20020022365 - Ohba, Takayuki | 2002-02-21 |
Vacuum treatment apparatus and a method for manufacturing semiconductor device therein Grant RE36,925 - Ohba , et al. October 31, 2 | 2000-10-31 |
Vacuum treatment apparatus and a cleaning method therefor Grant 5,522,412 - Ohba , et al. June 4, 1 | 1996-06-04 |
Chemical vapor deposition system Grant 5,264,038 - Hara , et al. November 23, 1 | 1993-11-23 |
Method for manufacturing semiconductor device Grant 5,232,872 - Ohba August 3, 1 | 1993-08-03 |
Method of selectively forming a silicon-containing metal layer Grant 4,902,645 - Ohba February 20, 1 | 1990-02-20 |
Method of selectively depositing tungsten upon a semiconductor substrate Grant 4,804,560 - Shioya , et al. February 14, 1 | 1989-02-14 |