loadpatents
name:-0.36271405220032
name:-0.1555860042572
name:-0.041440963745117
Ohashi; Masaki Patent Filings

Ohashi; Masaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ohashi; Masaki.The latest application filed is for "chemically amplified negative resist composition and resist pattern forming process".

Company Profile
40.155.177
  • Ohashi; Masaki - Joetsu JP
  • Ohashi; Masaki - Joetsu-shi JP
  • Ohashi; Masaki - Kawasaki JP
  • Ohashi; Masaki - Jyoetsu JP
  • OHASHI; Masaki - Jyoetsu-shi JP
  • Ohashi; Masaki - Niigata-ken JP
  • Ohashi; Masaki - Mie JP
  • Ohashi; Masaki - Yokohama JP
  • Ohashi; Masaki - Shiga JP
  • Ohashi; Masaki - Kusatsu JP
  • Ohashi; Masaki - Aichi JP
  • Ohashi, Masaki - Nishikasugai-gun JP
  • Ohashi, Masaki - Aichi-ken JP
  • Ohashi, Masaki - Kusatsu-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Resist composition and patterning process
Grant 11,448,962 - Fujiwara , et al. September 20, 2
2022-09-20
Iodonium salt, resist composition, and pattern forming process
Grant 11,448,961 - Fujiwara , et al. September 20, 2
2022-09-20
Resist composition and patterning process
Grant 11,435,665 - Hatakeyama , et al. September 6, 2
2022-09-06
Chemically Amplified Negative Resist Composition And Resist Pattern Forming Process
App 20220276557 - Masunaga; Keiichi ;   et al.
2022-09-01
Onium salt, negative resist composition, and resist pattern forming process
Grant 11,429,023 - Domon , et al. August 30, 2
2022-08-30
Chemically Amplified Positive Resist Composition And Resist Pattern Forming Process
App 20220269174 - Kotake; Masaaki ;   et al.
2022-08-25
Resist composition and patterning process
Grant 11,415,887 - Hatakeyama , et al. August 16, 2
2022-08-16
Resist composition and patterning process
Grant 11,409,194 - Hatakeyama , et al. August 9, 2
2022-08-09
Resist Composition And Patterning Process
App 20220236643 - Adachi; Teppei ;   et al.
2022-07-28
Resist composition and patterning process
Grant 11,392,034 - Hatakeyama , et al. July 19, 2
2022-07-19
Composition for forming silicon-containing resist underlayer film and patterning process
Grant 11,385,544 - Ogihara , et al. July 12, 2
2022-07-12
Resist composition and patterning process
Grant 11,340,527 - Adachi , et al. May 24, 2
2022-05-24
Resist Composition And Pattern Forming Process
App 20220155687 - Ohashi; Masaki ;   et al.
2022-05-19
Molecular Resist Composition And Patterning Process
App 20220100089 - Ohashi; Masaki ;   et al.
2022-03-31
Resist composition and patterning process
Grant 11,281,101 - Hatakeyama , et al. March 22, 2
2022-03-22
Resist composition and patterning process
Grant 11,269,251 - Hatakeyama , et al. March 8, 2
2022-03-08
Resist composition and patterning process
Grant 11,269,253 - Hatakeyama , et al. March 8, 2
2022-03-08
Sulfonium salt, polymer, resist composition, and patterning process
Grant 11,262,653 - Ohashi , et al. March 1, 2
2022-03-01
Computer-readable Recording Medium Storing Response Processing Program, Response Processing Method, And Information Processing Apparatus
App 20220035849 - KAWAKAMI; Shinichi ;   et al.
2022-02-03
Sulfonium compound, resist composition, and patterning process
Grant 11,215,926 - Fujiwara , et al. January 4, 2
2022-01-04
Chemically amplified resist composition and patterning process
Grant 11,204,553 - Hatakeyama , et al. December 21, 2
2021-12-21
Resist composition and patterning process
Grant 11,187,980 - Hatakeyama , et al. November 30, 2
2021-11-30
Resist composition and patterning process
Grant 11,181,823 - Hatakeyama , et al. November 23, 2
2021-11-23
Resist composition and patterning process
Grant 11,175,580 - Hatakeyama , et al. November 16, 2
2021-11-16
Resist composition, patterning process, and barium salt
Grant 11,163,232 - Hatakeyama , et al. November 2, 2
2021-11-02
Computer-readable Recording Medium Storing Management Program, Management Method, And Information Processing Device
App 20210311978 - KAWAKAMI; Shinichi ;   et al.
2021-10-07
Sulfonium compound, positive resist composition, and resist pattern forming process
Grant 11,124,477 - Inoue , et al. September 21, 2
2021-09-21
Computer-readable Recording Medium Recording Answering Program, Answering Method, And Answering Device
App 20210271698 - KAWAKAMI; Shinichi ;   et al.
2021-09-02
Resist Composition And Patterning Process
App 20210200083 - ADACHI; Teppei ;   et al.
2021-07-01
Resist composition and patterning process
Grant 11,022,883 - Hatakeyama , et al. June 1, 2
2021-06-01
Photoacid generator, chemically amplified resist composition, and patterning process
Grant 11,022,881 - Honda , et al. June 1, 2
2021-06-01
Resist Composition And Patterning Process
App 20210141306 - ADACHI; Teppei ;   et al.
2021-05-13
Resist Composition And Patterning Process
App 20210048746 - Hatakeyama; Jun ;   et al.
2021-02-18
Positive Resist Composition And Patterning Process
App 20210003916 - Hatakeyama; Jun ;   et al.
2021-01-07
Resist composition and patterning process
Grant 10,871,711 - Hatakeyama , et al. December 22, 2
2020-12-22
Positive Resist Composition And Patterning Process
App 20200393760 - Hatakeyama; Jun ;   et al.
2020-12-17
Molecular Resist Composition And Patterning Process
App 20200379345 - Fukushima; Masahiro ;   et al.
2020-12-03
Onium Salt, Chemically Amplified Resist Composition And Patterning Process
App 20200369605 - Sagehashi; Masayoshi ;   et al.
2020-11-26
Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode
Grant 10,844,257 - Hatakeyama , et al. November 24, 2
2020-11-24
Resist composition and patterning process
Grant 10,816,899 - Hatakeyama , et al. October 27, 2
2020-10-27
Resist composition and patterning process
Grant 10,809,617 - Hatakeyama , et al. October 20, 2
2020-10-20
Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt
Grant 10,808,148 - Hatakeyama , et al. October 20, 2
2020-10-20
Resist composition and patterning process
Grant 10,802,400 - Hatakeyama , et al. October 13, 2
2020-10-13
Sulfonium Compound, Chemically Amplified Resist Composition, And Patterning Process
App 20200319550 - Fukushima; Masahiro ;   et al.
2020-10-08
Resist Composition And Patterning Process
App 20200301274 - TANIGUCHI; Ryosuke ;   et al.
2020-09-24
Resist Composition And Patterning Process
App 20200285149 - Hatakeyama; Jun ;   et al.
2020-09-10
Resist Composition And Patterning Process
App 20200272048 - Hatakeyama; Jun ;   et al.
2020-08-27
Resist Composition And Patterning Process
App 20200272049 - Hatakeyama; Jun ;   et al.
2020-08-27
Resist Composition And Patterning Process
App 20200249571 - Kind Code
2020-08-06
Resist Composition And Patterning Process
App 20200241414 - Hatakeyama; Jun ;   et al.
2020-07-30
Resist Composition And Patterning Process
App 20200241417 - Hatakeyama; Jun ;   et al.
2020-07-30
Chemically amplified negative resist composition and resist pattern forming process
Grant 10,725,377 - Kotake , et al.
2020-07-28
Resist composition and patterning process
Grant 10,725,378 - Hatakeyama , et al.
2020-07-28
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20200233303 - OGIHARA; Tsutomu ;   et al.
2020-07-23
Onium Salt, Chemically Amplified Resist Composition, And Patterning Process
App 20200223796 - Fukushima; Masahiro ;   et al.
2020-07-16
Positive Resist Composition And Patterning Process
App 20200209747 - Hatakeyama; Jun ;   et al.
2020-07-02
Resist Composition And Patterning Process
App 20200192222 - Hatakeyama; Jun ;   et al.
2020-06-18
Resist composition and patterning process
Grant 10,649,332 - Hatakeyama , et al.
2020-05-12
Onium Salt, Negative Resist Composition, And Resist Pattern Forming Process
App 20200133121 - Domon; Daisuke ;   et al.
2020-04-30
Resist composition and patterning process
Grant 10,620,533 - Hatakeyama , et al.
2020-04-14
Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode
Grant 10,610,116 - Hatakeyama , et al.
2020-04-07
Resist composition and patterning process
Grant 10,613,436 - Hatakeyama , et al.
2020-04-07
Onium Salt, Resist Composition, And Pattern Forming Process
App 20200102271 - Ohashi; Masaki ;   et al.
2020-04-02
Resist composition and patterning process
Grant 10,606,172 - Hatakeyama , et al.
2020-03-31
Resist Composition And Patterning Process
App 20200089112 - Hatakeyama; Jun ;   et al.
2020-03-19
Resist Composition And Patterning Process
App 20200089111 - Hatakeyama; Jun ;   et al.
2020-03-19
Iodonium Salt, Resist Composition, And Pattern Forming Process
App 20200081341 - Fujiwara; Takayuki ;   et al.
2020-03-12
Resist Composition And Patterning Process
App 20200073237 - Hatakeyama; Jun ;   et al.
2020-03-05
Sulfonium Compound, Positive Resist Composition, And Resist Pattern Forming Process
App 20200071268 - Inoue; Naoya ;   et al.
2020-03-05
Resist Composition And Patterning Process
App 20200050107 - Hatakeyama; Jun ;   et al.
2020-02-13
Resist Composition And Patterning Process
App 20200050105 - Hatakeyama; Jun ;   et al.
2020-02-13
Chemically Amplified Resist Composition And Patterning Process
App 20200050104 - Hatakeyama; Jun ;   et al.
2020-02-13
Resist composition and patterning process
Grant 10,520,809 - Hatakeyama , et al. Dec
2019-12-31
Resist composition and patterning process
Grant 10,520,811 - Hatakeyama , et al. Dec
2019-12-31
Resist composition and patterning process
Grant 10,509,314 - Hatakeyama , et al. Dec
2019-12-17
Resist Composition And Patterning Process
App 20190369491 - Hatakeyama; Jun ;   et al.
2019-12-05
Chemically amplified positive resist composition and resist pattern forming process
Grant 10,495,969 - Kotake , et al. De
2019-12-03
Resist Composition And Patterning Process
App 20190354012 - Hatakeyama; Jun ;   et al.
2019-11-21
Resist composition and patterning process
Grant 10,474,030 - Hatakeyama , et al. Nov
2019-11-12
Photoacid Generator, Chemically Amplified Resist Composition, And Patterning Process
App 20190324367 - Honda; Kazuya ;   et al.
2019-10-24
Positive resist composition, resist pattern forming process, and photomask blank
Grant 10,416,558 - Masunaga , et al. Sept
2019-09-17
Polymer compound for conductive polymer and method for producing the same
Grant 10,363,555 - Hatakeyama , et al.
2019-07-30
Resist composition and patterning process
Grant 10,323,113 - Hatakeyama , et al.
2019-06-18
Resist Composition And Patterning Process
App 20190155155 - Hatakeyama; Jun ;   et al.
2019-05-23
Resist composition and patterning process
Grant 10,295,904 - Hatakeyama , et al.
2019-05-21
Resist Composition And Patterning Process
App 20190113844 - Hatakeyama; Jun ;   et al.
2019-04-18
Resist Composition, Patterning Process, And Barium Salt
App 20190113846 - Hatakeyama; Jun ;   et al.
2019-04-18
Sulfonium compound, making method, resist composition, and pattern forming process
Grant 10,248,022 - Ohashi , et al.
2019-04-02
Resist Composition And Patterning Process
App 20190094690 - Hatakeyama; Jun ;   et al.
2019-03-28
Polymer, making method, resist composition, and patterning process
Grant 10,234,757 - Ohashi , et al.
2019-03-19
Resist composition and patterning process
Grant 10,222,696 - Hatakeyama , et al.
2019-03-05
Sulfonium Compound, Resist Composition, And Patterning Process
App 20190064665 - Fujiwara; Takayuki ;   et al.
2019-02-28
Sulfonium Salt, Polymer, Resist Composition, And Patterning Process
App 20190033716 - Ohashi; Masaki ;   et al.
2019-01-31
Sulfonium salt, resist composition, and patterning process
Grant 10,180,626 - Fujiwara , et al. Ja
2019-01-15
Sulfonium compound, resist composition, and pattern forming process
Grant 10,173,975 - Ohashi , et al. J
2019-01-08
Resist Composition And Patterning Process
App 20180373150 - Hatakeyama; Jun ;   et al.
2018-12-27
Resist composition and patterning process
Grant 10,162,262 - Hatakeyama , et al. Dec
2018-12-25
Resist Composition And Patterning Process
App 20180364574 - Hatakeyama; Jun ;   et al.
2018-12-20
Resist Composition And Patterning Process
App 20180364570 - Hatakeyama; Jun ;   et al.
2018-12-20
Resist Composition And Patterning Process
App 20180335696 - Hatakeyama; Jun ;   et al.
2018-11-22
Resist composition and patterning process
Grant 10,126,647 - Hatakeyama , et al. November 13, 2
2018-11-13
Polymer compound for a conductive polymer and method for producing same
Grant 10,125,202 - Hatakeyama , et al. November 13, 2
2018-11-13
Negative resist composition and resist pattern forming process
Grant 10,120,279 - Masunaga , et al. November 6, 2
2018-11-06
Resist composition and patterning process
Grant 10,101,653 - Hatakeyama , et al. October 16, 2
2018-10-16
Resist composition and patterning process
Grant 10,101,654 - Hatakeyama , et al. October 16, 2
2018-10-16
Resist Composition And Patterning Process
App 20180275512 - Hatakeyama; Jun ;   et al.
2018-09-27
Resist Composition And Patterning Process
App 20180267403 - Hatakeyama; Jun ;   et al.
2018-09-20
Resist composition, patterning process, and barium, cesium and cerium salts
Grant 10,078,264 - Hatakeyama , et al. September 18, 2
2018-09-18
Resist Composition And Patterning Process
App 20180239249 - Hatakeyama; Jun ;   et al.
2018-08-23
Sulfonium compound, resist composition, and patterning process
Grant 10,025,180 - Mitsui , et al. July 17, 2
2018-07-17
Positive resist composition and pattern forming process
Grant 10,012,902 - Hatakeyama , et al. July 3, 2
2018-07-03
Chemically Amplified Negative Resist Composition And Resist Pattern Forming Process
App 20180180998 - Kotake; Masaaki ;   et al.
2018-06-28
Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
App 20180180992 - Kotake; Masaaki ;   et al.
2018-06-28
Positive resist composition and patterning process
Grant 10,007,178 - Hatakeyama , et al. June 26, 2
2018-06-26
Onium salt compound, resist composition, and pattern forming process
Grant 9,989,847 - Ohashi , et al. June 5, 2
2018-06-05
Resist composition and patterning process
Grant 9,958,777 - Hatakeyama , et al. May 1, 2
2018-05-01
Resist composition and patterning process
Grant 9,958,776 - Hatakeyama , et al. May 1, 2
2018-05-01
Sulfonium Compound, Resist Composition, And Pattern Forming Process
App 20180099928 - Ohashi; Masaki ;   et al.
2018-04-12
Resist Composition And Patterning Process
App 20180101094 - Hatakeyama; Jun ;   et al.
2018-04-12
Resist Composition And Patterning Process
App 20180088463 - Hatakeyama; Jun ;   et al.
2018-03-29
Adhesive Composition, Bio-electrode, And Method For Manufacturing A Bio-electrode
App 20180085019 - HATAKEYAMA; Jun ;   et al.
2018-03-29
Adhesive Composition, Bio-electrode, Method For Manufacturing A Bio-electrode, And Salt
App 20180086948 - HATAKEYAMA; Jun ;   et al.
2018-03-29
Sulfonium Salt, Resist Composition, And Patterning Process
App 20180088464 - Fujiwara; Takayuki ;   et al.
2018-03-29
Resist Composition And Patterning Process
App 20180081267 - Hatakeyama; Jun ;   et al.
2018-03-22
Adhesive Composition, Bio-electrode, And Method For Manufacturing A Bio-electrode
App 20180072930 - HATAKEYAMA; Jun ;   et al.
2018-03-15
Patterning process and chemically amplified negative resist composition
Grant 9,910,358 - Hatakeyama , et al. March 6, 2
2018-03-06
Sulfonium Compound, Resist Composition, And Patterning Process
App 20180059543 - Mitsui; Ryo ;   et al.
2018-03-01
Compound, polymer compound, resist composition, and patterning process
Grant 9,897,916 - Ohashi , et al. February 20, 2
2018-02-20
Resist composition and patterning process
Grant 9,897,914 - Hatakeyama , et al. February 20, 2
2018-02-20
Positive Resist Composition, Resist Pattern Forming Process, And Photomask Blank
App 20180039177 - Masunaga; Keiichi ;   et al.
2018-02-08
Resist Composition And Patterning Process
App 20180039173 - Hatakeyama; Jun ;   et al.
2018-02-08
Negative Resist Composition And Resist Pattern Forming Process
App 20180039175 - Masunaga; Keiichi ;   et al.
2018-02-08
Resist Composition And Patterning Process
App 20170369616 - Hatakeyama; Jun ;   et al.
2017-12-28
Resist Composition And Patterning Process
App 20170351177 - Hatakeyama; Jun ;   et al.
2017-12-07
Novel Sulfonium Compound, Making Method, Resist Composition, And Pattern Forming Process
App 20170329227 - Ohashi; Masaki ;   et al.
2017-11-16
Positive Resist Composition And Pattern Forming Process
App 20170242339 - Hatakeyama; Jun ;   et al.
2017-08-24
Resist Composition And Patterning Process
App 20170205709 - Hatakeyama; Jun ;   et al.
2017-07-20
Resist Composition And Patterning Process
App 20170184962 - Hatakeyama; Jun ;   et al.
2017-06-29
Resist Composition And Patterning Process
App 20170184963 - Hatakeyama; Jun ;   et al.
2017-06-29
Resist Composition And Patterning Process
App 20170184964 - Hatakeyama; Jun ;   et al.
2017-06-29
Onium salt compound, resist composition, and pattern forming process
Grant 9,665,002 - Fukushima , et al. May 30, 2
2017-05-30
Polymer compound for a conductive polymer and method for producing same
Grant 9,663,593 - Hatakeyama , et al. May 30, 2
2017-05-30
Sulfonium salt, chemically amplified resist composition, and patterning process
Grant 9,645,491 - Fujiwara , et al. May 9, 2
2017-05-09
Resist Composition, Patterning Process, And Barium, Cesium And Cerium Salts
App 20170115566 - Hatakeyama; Jun ;   et al.
2017-04-27
Resist Composition And Patterning Process
App 20170115565 - Hatakeyama; Jun ;   et al.
2017-04-27
Resist Composition And Patterning Process
App 20170108775 - Hatakeyama; Jun ;   et al.
2017-04-20
Resist Composition And Patterning Process
App 20170108774 - Hatakeyama; Jun ;   et al.
2017-04-20
Resist Composition And Patterning Process
App 20170075218 - Hatakeyama; Jun ;   et al.
2017-03-16
Resist Composition And Patterning Process
App 20170075217 - Hatakeyama; Jun ;   et al.
2017-03-16
Polymer Compound For A Conductive Polymer And Method For Producing Same
App 20170058059 - HATAKEYAMA; Jun ;   et al.
2017-03-02
Compound, Polymer Compound, Resist Composition, And Patterning Process
App 20170038683 - OHASHI; Masaki ;   et al.
2017-02-09
Polymer compound for a conductive polymer and method for producing same
Grant 9,527,937 - Hatakeyama , et al. December 27, 2
2016-12-27
Chemically amplified resist composition and patterning process
Grant 9,523,914 - Hatakeyama , et al. December 20, 2
2016-12-20
Patterning process and resist composition
Grant 9,519,213 - Kobayashi , et al. December 13, 2
2016-12-13
Sulfonium Salt, Chemically Amplified Resist Composition, And Patterning Process
App 20160349612 - Fujiwara; Takayuki ;   et al.
2016-12-01
Chemically-amplified positive resist composition and resist patterning process using the same
Grant 9,500,949 - Domon , et al. November 22, 2
2016-11-22
Resist Composition And Patterning Process
App 20160334706 - Ohashi; Masaki
2016-11-17
Onium Salt, Resist Composition, And Patterning Process
App 20160320698 - Fujiwara; Takayuki ;   et al.
2016-11-03
Novel Onium Salt Compound, Resist Composition, And Pattern Forming Process
App 20160259242 - Ohashi; Masaki ;   et al.
2016-09-08
Photo acid generator, chemically amplified resist composition, and patterning process
Grant 9,411,225 - Ohashi , et al. August 9, 2
2016-08-09
Photoacid generator, chemically amplified resist composition, and patterning process
Grant 9,366,958 - Ohashi , et al. June 14, 2
2016-06-14
Chemically Amplified Resist Composition And Patterning Process
App 20160147150 - Hatakeyama; Jun ;   et al.
2016-05-26
Novel Onium Salt Compound, Resist Composition, And Pattern Forming Process
App 20160131972 - Fukushima; Masahiro ;   et al.
2016-05-12
Chemically amplified negative resist composition and patterning process
Grant 9,329,476 - Domon , et al. May 3, 2
2016-05-03
Patterning Process And Chemically Amplified Negative Resist Composition
App 20160109803 - Hatakeyama; Jun ;   et al.
2016-04-21
Polymer Compound For Conductive Polymer And Method For Producing The Same
App 20160067702 - HATAKEYAMA; Jun ;   et al.
2016-03-10
Positive Resist Composition And Patterning Process
App 20160048076 - Hatakeyama; Jun ;   et al.
2016-02-18
Resist composition and patterning process
Grant 9,250,518 - Hatakeyama , et al. February 2, 2
2016-02-02
Polymer Compound For A Conductive Polymer And Method For Producing Same
App 20160017068 - HATAKEYAMA; Jun ;   et al.
2016-01-21
Polymer Compound For A Conductive Polymer And Method For Producing Same
App 20160017066 - HATAKEYAMA; Jun ;   et al.
2016-01-21
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
Grant 9,233,919 - Ohsawa , et al. January 12, 2
2016-01-12
Photo Acid Generator, Chemically Amplified Resist Composition, And Patterning Process
App 20160004155 - OHASHI; Masaki ;   et al.
2016-01-07
Acid generator, chemically amplified resist composition, and patterning process
Grant 9,223,205 - Ohashi , et al. December 29, 2
2015-12-29
Sulfonium salt, chemically amplified resist composition, and pattern forming process
Grant 9,221,742 - Ohashi , et al. December 29, 2
2015-12-29
Resist Composition And Patterning Process
App 20150346600 - Adachi; Teppei ;   et al.
2015-12-03
Photoacid Generator, Chemically Amplified Resist Composition, And Patterning Process
App 20150301449 - Ohashi; Masaki ;   et al.
2015-10-22
Sulfonium salt, polymer, resist composition, and patterning process
Grant 9,162,967 - Ohashi , et al. October 20, 2
2015-10-20
Patterning process and resist composition
Grant 9,164,384 - Ohashi , et al. October 20, 2
2015-10-20
Sulfonium salt, polymer, polymer making method, resist composition, and patterning process
Grant 9,146,464 - Ohashi , et al. September 29, 2
2015-09-29
Positive resist composition, monomer, polymer, and patterning process
Grant 9,140,988 - Hatakeyama , et al. September 22, 2
2015-09-22
Method for synthesizing rare earth metal extractant
Grant 9,133,100 - Sakaki , et al. September 15, 2
2015-09-15
Chemically-amplified Positive Resist Composition And Resist Patterning Process Using The Same
App 20150253664 - DOMON; Daisuke ;   et al.
2015-09-10
Sulfonium salt, resist composition and patterning process
Grant 9,122,155 - Ohashi , et al. September 1, 2
2015-09-01
Polymer, resist composition and patterning process
Grant 9,104,110 - Ohashi , et al. August 11, 2
2015-08-11
Sulfonium salt, polymer, resist composition, and patterning process
Grant 9,091,918 - Fukushima , et al. July 28, 2
2015-07-28
Chemically Amplified Negative Resist Composition And Patterning Process
App 20150198877 - DOMON; Daisuke ;   et al.
2015-07-16
Developer for photosensitive resist material and patterning process
Grant 9,057,959 - Hatakeyama , et al. June 16, 2
2015-06-16
Developer for photosensitive resist material and patterning process
Grant 9,052,602 - Hatakeyama , et al. June 9, 2
2015-06-09
Resist Composition And Patterning Process
App 20150125794 - Hatakeyama; Jun ;   et al.
2015-05-07
Sulfonium Salt, Chemically Amplified Resist Composition, And Pattern Forming Process
App 20150086926 - Ohashi; Masaki ;   et al.
2015-03-26
Pattern forming process and resist compostion
Grant 8,980,527 - Ohashi , et al. March 17, 2
2015-03-17
Sulfonium salt, resist composition, and patterning process
Grant 8,956,803 - Ohashi , et al. February 17, 2
2015-02-17
Preparation of polymer, resulting polymer, resist composition, and patterning process
Grant 8,957,160 - Ohashi , et al. February 17, 2
2015-02-17
Developer For Photosensitive Resist Material And Patterning Process
App 20140377706 - Hatakeyama; Jun ;   et al.
2014-12-25
Developer For Photosensitive Resist Material And Patterning Process
App 20140370441 - Hatakeyama; Jun ;   et al.
2014-12-18
Acid generator, chemically amplified resist composition, and patterning process
Grant 8,900,796 - Ohashi , et al. December 2, 2
2014-12-02
Patterning Process And Resist Composition
App 20140322650 - Ohashi; Masaki ;   et al.
2014-10-30
Sulfonium Salt-containing Polymer, Resist Composition, Patterning Process, And Sulfonium Salt Monomer And Making Method
App 20140296561 - OHSAWA; Youichi ;   et al.
2014-10-02
Method for synthesizing rare earth metal extractant
Grant 8,841,482 - Sakaki , et al. September 23, 2
2014-09-23
Sulfonium Salt, Polymer, Resist Composition, And Patterning Process
App 20140272707 - Fukushima; Masahiro ;   et al.
2014-09-18
Patterning Process And Resist Composition
App 20140255843 - Kobayashi; Tomohiro ;   et al.
2014-09-11
Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process
Grant 8,815,492 - Ohsawa , et al. August 26, 2
2014-08-26
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
Grant 8,785,105 - Ohsawa , et al. July 22, 2
2014-07-22
Sulfonium Salt, Resist Composition, And Patterning Process
App 20140199629 - OHASHI; Masaki ;   et al.
2014-07-17
Sulfonium Salt, Resist Composition And Patterning Process
App 20140199630 - OHASHI; Masaki ;   et al.
2014-07-17
Positive Resist Composition, Monomer, Polymer, And Patterning Process
App 20140162188 - Hatakeyama; Jun ;   et al.
2014-06-12
Sulfonium Salt, Polymer, Polymer Making Method, Resist Composition, And Patterning Process
App 20140162189 - Ohashi; Masaki ;   et al.
2014-06-12
Resist composition and patterning process using the same
Grant 8,748,076 - Nagasawa , et al. June 10, 2
2014-06-10
Patterning process and resist composition
Grant 8,741,554 - Hatakeyama , et al. June 3, 2
2014-06-03
Patterning process and resist composition
Grant 8,741,546 - Hatakeyama , et al. June 3, 2
2014-06-03
Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer
Grant 8,722,307 - Tachibana , et al. May 13, 2
2014-05-13
Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process
Grant 8,691,490 - Ohashi , et al. April 8, 2
2014-04-08
Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom
Grant 8,686,166 - Sagehashi , et al. April 1, 2
2014-04-01
Sulfonium Salt, Polymer, Resist Composition, And Patterning Process
App 20130337378 - Ohashi; Masaki ;   et al.
2013-12-19
Photoacid generator, resist composition, and patterning process
Grant 8,609,889 - Ohashi , et al. December 17, 2
2013-12-17
Polymer, Resist Composition And Patterning Process
App 20130323647 - Ohashi; Masaki ;   et al.
2013-12-05
Acid Generator, Chemically Amplified Resist Composition, And Patterning Process
App 20130236832 - OHASHI; Masaki ;   et al.
2013-09-12
Preparation Of Polymer, Resulting Polymer, Resist Composition, And Patterning Process
App 20130224660 - OHASHI; Masaki ;   et al.
2013-08-29
Acid Generator, Chemically Amplified Resist Composition, And Patterning Process
App 20130224657 - OHASHI; Masaki ;   et al.
2013-08-29
Polymer, Making Method, Resist Composition, And Patterning Process
App 20130224659 - Ohashi; Masaki ;   et al.
2013-08-29
Patterning Process And Resist Composition
App 20130209936 - Hatakeyama; Jun ;   et al.
2013-08-15
Patterning process and resist composition
Grant 8,507,175 - Hatakeyama , et al. August 13, 2
2013-08-13
Pattern Forming Process And Resist Compostion
App 20130183621 - Ohashi; Masaki ;   et al.
2013-07-18
Near-infrared Absorbing Film Composition For Lithographic Application
App 20130157463 - Goldfarb; Dario L. ;   et al.
2013-06-20
Method For Synthesizing Rare Earth Metal Extractant
App 20130123534 - Sakaki; Kazuaki ;   et al.
2013-05-16
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
App 20130108964 - Ohsawa; Youichi ;   et al.
2013-05-02
Method For Synthesizing Rare Earth Metal Extractant
App 20130102806 - Sakaki; Kazuaki ;   et al.
2013-04-25
Patterning process and resist composition
Grant 8,426,115 - Hatakeyama , et al. April 23, 2
2013-04-23
Acetal compounds and their preparation, polymers, resist compositions and patterning process
Grant 8,420,290 - Hasegawa , et al. April 16, 2
2013-04-16
Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process
Grant 8,394,570 - Ohashi , et al. March 12, 2
2013-03-12
Chemically amplified positive photoresist composition and pattern forming process
Grant 8,361,693 - Masunaga , et al. January 29, 2
2013-01-29
Preparation Of 2,2-bis (fluoroalkyl) Oxirane And Preparation Of Photoacid Generator Therefrom
App 20130005997 - SAGEHASHI; Masayoshi ;   et al.
2013-01-03
Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film
Grant 8,323,536 - Ohashi , et al. December 4, 2
2012-12-04
Near-infrared Absorptive Layer-forming Composition And Multilayer Film Comprising Near-infrared Absorptive Layer
App 20120301828 - TACHIBANA; Seiichiro ;   et al.
2012-11-29
Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
Grant 8,283,104 - Ohashi , et al. October 9, 2
2012-10-09
Double patterning process
Grant 8,247,166 - Takemura , et al. August 21, 2
2012-08-21
Resist Composition And Patterning Process Using The Same
App 20120196228 - NAGASAWA; Takayuki ;   et al.
2012-08-02
Positive Resist Composition And Patterning Process
App 20120164577 - TANIGUCHI; Ryosuke ;   et al.
2012-06-28
Chemically-amplified positive resist composition and patterning process thereof
Grant 8,202,677 - Takeda , et al. June 19, 2
2012-06-19
Method of making a plate-shaped peeling member
Grant 8,187,404 - Ohta , et al. May 29, 2
2012-05-29
Sulfonium Salt-containing Polymer, Resist Composition, Patterning Process, And Sulfonium Salt Monomer And Making Method
App 20120129103 - Ohsawa; Youichi ;   et al.
2012-05-24
Near-infrared Absorbing Dye, Near-infrared Absorptive Film-forming Composition, And Near-infrared Absorptive Film
App 20120119171 - OHASHI; Masaki ;   et al.
2012-05-17
Sulfonium salt, resist composition, and patterning process
Grant 8,173,354 - Ohsawa , et al. May 8, 2
2012-05-08
Method and apparatus for testing characteristics of thin-film magnetic head
Grant 8,138,754 - Ogawa , et al. March 20, 2
2012-03-20
Double patterning process
Grant 8,129,100 - Takemura , et al. March 6, 2
2012-03-06
Photoacid generator, resist composition, and patterning process
Grant 8,114,570 - Ohsawa , et al. February 14, 2
2012-02-14
Photoacid generator, resist composition, and patterning process
Grant 8,114,571 - Ohashi , et al. February 14, 2
2012-02-14
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Grant 8,105,748 - Ohashi , et al. January 31, 2
2012-01-31
Positive resist composition and patterning process
Grant 8,062,828 - Ohsawa , et al. November 22, 2
2011-11-22
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Grant 8,057,985 - Ohashi , et al. November 15, 2
2011-11-15
Monomer, resist composition, and patterning process
Grant 8,057,982 - Hatakeyama , et al. November 15, 2
2011-11-15
Hydroxyl-containing monomer, polymer, resist composition, and patterning process
Grant 8,053,165 - Kinsho , et al. November 8, 2
2011-11-08
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262863 - TACHIBANA; Seiichiro ;   et al.
2011-10-27
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262862 - OHASHI; Masaki ;   et al.
2011-10-27
Sulfonium salt-containing polymer, resist composition, and patterning process
Grant 8,039,198 - Tachibana , et al. October 18, 2
2011-10-18
Ester compounds and their preparation, polymers, resist compositions and patterning process
Grant 7,998,657 - Ohashi , et al. August 16, 2
2011-08-16
Novel Sulfonium Salt, Polymer, Method For Producing The Polymer, Resist Composition And Patterning Process
App 20110189607 - OHASHI; Masaki ;   et al.
2011-08-04
Positive resist composition and patterning process
Grant 7,985,528 - Nishi , et al. July 26, 2
2011-07-26
Patterning Process And Resist Composition
App 20110091812 - Hatakeyama; Jun ;   et al.
2011-04-21
Ester compounds and their preparation, polymers, resist compositions and patterning process
Grant 7,902,385 - Ohashi , et al. March 8, 2
2011-03-08
Ester Compounds And Their Preparation, Polymers, Resist Compositions And Patterning Process
App 20110039204 - OHASHI; Masaki ;   et al.
2011-02-17
Patterning Process And Resist Composition
App 20110033803 - Hatakeyama; Jun ;   et al.
2011-02-10
Sulfonium Salt, Resist Composition, And Patterning Process
App 20110008735 - OHSAWA; Youichi ;   et al.
2011-01-13
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
Grant 7,868,199 - Hasegawa , et al. January 11, 2
2011-01-11
Photoacid Generator, Resist Composition, And Patterning Process
App 20110003247 - Ohashi; Masaki ;   et al.
2011-01-06
Chemically Amplified Positive Photoresist Composition And Pattern Forming Process
App 20100316955 - Masunaga; Keiichi ;   et al.
2010-12-16
Patterning Process And Resist Composition
App 20100304297 - HATAKEYAMA; Jun ;   et al.
2010-12-02
Novel Sulfonate And Its Derivative, Photosensitive Acid Generator, And Resist Composition And Patterning Process Using The Same
App 20100209827 - OHASHI; Masaki ;   et al.
2010-08-19
Sulfonium Salt, Acid Generator, Resist Composition, Photomask Blank, And Patterning Process
App 20100143830 - OHASHI; Masaki ;   et al.
2010-06-10
Acetal Compounds And Their Preparation, Polymers, Resist Compositions And Patterning Process
App 20100136485 - HASEGAWA; Koji ;   et al.
2010-06-03
Polymerizable Anion-containing Sulfonium Salt And Polymer, Resist Composition, And Patterning Process
App 20100099042 - OHASHI; Masaki ;   et al.
2010-04-22
Polymerizable ester compounds, polymers, resist compositions and patterning process
Grant 7,687,222 - Watanabe , et al. March 30, 2
2010-03-30
Music game with strike sounds changing in quality in the progress of music and entertainment music system
Grant 7,682,237 - Ueshima , et al. March 23, 2
2010-03-23
Positive Resist Composition And Patterning Process
App 20100062366 - Nishi; Tsunehiro ;   et al.
2010-03-11
Double Patterning Process
App 20100062380 - Takemura; Katsuya ;   et al.
2010-03-11
Polymerizable Anion-containing Sulfonium Salt And Polymer, Resist Composition, And Patterning Process
App 20100055608 - Ohashi; Masaki ;   et al.
2010-03-04
Photoacid generator, resist composition, and patterning process
Grant 7,670,751 - Ohashi , et al. March 2, 2
2010-03-02
Chemically-amplified positive resist composition and patterning process thereof
App 20100009286 - Takeda; Takanobu ;   et al.
2010-01-14
Nitrogen-containing organic compound, resist composition and patterning process
Grant 7,629,108 - Watanabe , et al. December 8, 2
2009-12-08
Method And Apparatus For Testing Characteristics Of Thin-film Magnetic Head
App 20090284857 - Ogawa; Akio ;   et al.
2009-11-19
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090274978 - OHASHI; Masaki ;   et al.
2009-11-05
Double Patterning Process
App 20090253084 - TAKEMURA; Katsuya ;   et al.
2009-10-08
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090246694 - Ohsawa; Youichi ;   et al.
2009-10-01
Hydroxyl-containing Monomer, Polymer, Resist Composition, And Patterning Process
App 20090239179 - Kinsho; Takeshi ;   et al.
2009-09-24
Sulfonium Salt-containing Polymer, Resist Composition, And Patterning Process
App 20090233223 - TACHIBANA; Seiichiro ;   et al.
2009-09-17
Monomer, Resist Composition, And Patterning Process
App 20090226843 - HATAKEYAMA; Jun ;   et al.
2009-09-10
Positive Resist Composition And Patterning Process
App 20090202943 - Ohsawa; Youichi ;   et al.
2009-08-13
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
Grant 7,569,326 - Ohsawa , et al. August 4, 2
2009-08-04
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,556,909 - Kobayashi , et al. July 7, 2
2009-07-07
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,531,289 - Kinsho , et al. May 12, 2
2009-05-12
Photoacid generators, resist compositions, and patterning process
Grant 7,527,912 - Ohsawa , et al. May 5, 2
2009-05-05
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090061358 - OHASHI; Masaki ;   et al.
2009-03-05
Nitrogen-containing organic compound, resist composition and patterning process
App 20080102405 - Watanabe; Takeru ;   et al.
2008-05-01
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
App 20080102407 - Ohsawa; Youichi ;   et al.
2008-05-01
Novel photoacid generators, resist compositions, and patterning process
App 20080085469 - Ohsawa; Youichi ;   et al.
2008-04-10
Ester compounds and their preparation, polymers, resist compositions and patterning process
App 20080008965 - Ohashi; Masaki ;   et al.
2008-01-10
Polymerizable ester compounds, polymers, resist compositions and patterning process
App 20080008962 - Watanabe; Takeru ;   et al.
2008-01-10
Stepped Position Specifying Apparatus, Stepping Type Exercise Apparatus, Stepped Position Specifying Method and Exercising Support Method
App 20070252327 - Ueshima; Hiromu ;   et al.
2007-11-01
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
App 20070179309 - Hasegawa; Koji ;   et al.
2007-08-02
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20070099113 - Kobayashi; Katsuhiro ;   et al.
2007-05-03
Memory cartridge system
Grant 7,156,742 - Ueshima , et al. January 2, 2
2007-01-02
Weather strip
Grant 7,097,180 - Kuzuya , et al. August 29, 2
2006-08-29
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
App 20060093960 - Kinsho; Takeshi ;   et al.
2006-05-04
Weather strip and method of manufacturing the same
App 20050246963 - Kogiso, Harumi ;   et al.
2005-11-10
Weather strip having variable length holding lip
Grant 6,935,072 - Kogiso , et al. August 30, 2
2005-08-30
Method for producing extruded products
App 20050184415 - Ohashi, Masaki
2005-08-25
Automotive weather strip
Grant 6,889,472 - Nozaki , et al. May 10, 2
2005-05-10
Music game with strike sounds changing in quality in the progress of music and entertainment music system
App 20050096132 - Ueshima, Hiromu ;   et al.
2005-05-05
Weather strip
App 20040227306 - Kuzuya, Hiroshi ;   et al.
2004-11-18
Automotive weather strip
App 20030051411 - Nozaki, Masahiro ;   et al.
2003-03-20
Weather strip and method of manufacturing the same
App 20030009947 - Kogiso, Harumi ;   et al.
2003-01-16
Memory cartridge system
App 20020055387 - Ueshima, Hiromu ;   et al.
2002-05-09

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