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Patent applications and USPTO patent grants for Oh; Heeyoung.The latest application filed is for "photosensitive resin composition, pattern formed using same and display panel comprising same".
Patent | Date |
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Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same Grant 9,470,975 - Choi , et al. October 18, 2 | 2016-10-18 |
Photosensitive resin composition, pattern formed using same and display panel comprising same Grant 9,341,946 - Park , et al. May 17, 2 | 2016-05-17 |
Photosensitive Resin Composition, Pattern Formed Using Same And Display Panel Comprising Same App 20150125789 - Park; Kwang Han ;   et al. | 2015-05-07 |
Photosensitive Resin Composition And Touch Panel Or Display Device Including Bezel Pattern Prepared By Using Same App 20150111009 - Choi; Dongchang ;   et al. | 2015-04-23 |
Monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof Grant 7,534,844 - Lee , et al. May 19, 2 | 2009-05-19 |
Novel Monomer Substituted Photoacid Generator Of Fluoroalkylsulfon And A Polymer Thereof App 20070203312 - Lee; Haiwon ;   et al. | 2007-08-30 |
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