loadpatents
name:-0.030910015106201
name:-0.024432182312012
name:-0.00042295455932617
Oguro; Dai Patent Filings

Oguro; Dai

Patent Applications and Registrations

Patent applications and USPTO patent grants for Oguro; Dai.The latest application filed is for "1,3-bis(hydroxyphenyl)-5-ethyladamantane compound and method for production thereof, and aromatic polycarbonate resin and method for production thereof".

Company Profile
0.34.28
  • Oguro; Dai - Kanagawa JP
  • Oguro; Dai - Tokyo JP
  • Oguro; Dai - Hiratsuka N/A JP
  • Oguro; Dai - Hiratsuka-shi JP
  • Oguro, Dai - Kanagawa-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Radiation-sensitive composition
Grant 9,897,913 - Echigo , et al. February 20, 2		2018-02-20
Epoxy resin curing agent
Grant 9,605,110 - Ueno , et al. March 28, 2		2017-03-28
1,3-bis(hydroxyphenyl)-5-ethyladamantane Compound And Method For Production Thereof, And Aromatic Polycarbonate Resin And Method For Production Thereof
App 20160244389 - NAKAMURA; Goh ;   et al.		2016-08-25
Polyester resin and optical lens
Grant 9,234,986 - Minezaki , et al. January 12, 2		2016-01-12
Epoxy Resin Curing Agent
App 20150291729 - Ueno; Shuichi ;   et al.		2015-10-15
Bicyclohexane derivative compound and manufacturing method of the same
Grant 9,150,491 - Echigo , et al. October 6, 2		2015-10-06
Radiation-sensitive Composition
App 20150030980 - ECHIGO; Masatoshi ;   et al.		2015-01-29
Glycol compound having dioxane structure and method for producing the same
Grant 8,859,787 - Minezaki , et al. October 14, 2		2014-10-14
Radiation-sensitive composition
Grant 8,846,292 - Echigo , et al. September 30, 2		2014-09-30
Glycol compound having dioxane structure and method for producing the same
Grant 8,846,957 - Minezaki , et al. September 30, 2		2014-09-30
Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
Grant 8,829,247 - Hayashi , et al. September 9, 2		2014-09-09
Compound for resist and radiation-sensitive composition specification
Grant 8,802,353 - Echigo , et al. August 12, 2		2014-08-12
Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
Grant 8,748,078 - Hayashi , et al. June 10, 2		2014-06-10
Polyester Resin And Optical Lens
App 20140142273 - MINEZAKI; Takuya ;   et al.		2014-05-22
Polyester resin and optical lens
Grant 8,674,054 - Minezaki , et al. March 18, 2		2014-03-18
Composition for forming base film for lithography and method for forming multilayer resist pattern
Grant 8,592,134 - Oguro , et al. November 26, 2		2013-11-26
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound
Grant 8,563,665 - Kita , et al. October 22, 2		2013-10-22
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound
Grant 8,524,952 - Kita , et al. September 3, 2		2013-09-03
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound
Grant 8,519,177 - Kita , et al. August 27, 2		2013-08-27
Bicyclohexane Derivative Compound And Manufacturing Method Of The Same
App 20130030211 - Echigo; Masatoshi ;   et al.		2013-01-31
Compound for resist and radiation-sensitive composition
Grant 8,350,096 - Echigo , et al. January 8, 2		2013-01-08
Compound For Resist And Radiation-sensitive Composition Specification
App 20130004896 - ECHIGO; Masatoshi ;   et al.		2013-01-03
Alcohol compound having dioxane structure and process for producing same
Grant 8,324,407 - Oguro December 4, 2		2012-12-04
Polyester Resin And Optical Lens
App 20120289676 - Minezaki; Takuya ;   et al.		2012-11-15
Cyclic Compound, Method Of Producing The Same, Radiation Sensitive Composition, And Method Of Forming Resist Pattern
App 20120251947 - Hayashi; Hiromi ;   et al.		2012-10-04
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound
App 20120238775 - Kita; Seiji ;   et al.		2012-09-20
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound
App 20120238781 - Kita; Seiji ;   et al.		2012-09-20
Radiation-sensitive Composition
App 20120171379 - ECHIGO; Masatoshi ;   et al.		2012-07-05
Cyclic Compound, Process For Preparation Thereof, Radiation-sensitive Composition, And Method For Formation Of Resist Pattern
App 20120164576 - Hayashi; Hiromi ;   et al.		2012-06-28
Radiation-sensitive composition
Grant 8,110,334 - Echigo , et al. February 7, 2		2012-02-07
Alcohol Compound Having Dioxane Structure And Process For Producing Same
App 20110282076 - Oguro; Dai		2011-11-17
Glycol Compound Having Dioxane Structure And Method For Producing The Same
App 20110275840 - Minezaki; Takuya ;   et al.		2011-11-10
Glycol Compound Having Dioxane Structure And Method For Producing The Same
App 20110269976 - Minezaki; Takuya ;   et al.		2011-11-03
Compound For Resist And Radiation-sensitive Composition
App 20110165516 - ECHIGO; Masatoshi ;   et al.		2011-07-07
Compound for resist and radiation-sensitive composition
Grant 7,919,223 - Echigo , et al. April 5, 2		2011-04-05
Resist composition
Grant 7,871,751 - Echigo , et al. January 18, 2		2011-01-18
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound
App 20110009574 - Kita; Seiji ;   et al.		2011-01-13
Composition For Forming Base Film For Lithography And Method For Forming Multilayer Resist Pattern
App 20100316950 - Oguro; Dai ;   et al.		2010-12-16
Radiation-sensitive Composition
App 20100047709 - Echigo; Masatoshi ;   et al.		2010-02-25
Novel triphenylmethane derivative, organic gellant containing the same, organic gel, and organic fiber
App 20090176095 - Oguro; Dai		2009-07-09
Resist composition
App 20080153031 - Echigo; Masatoshi ;   et al.		2008-06-26
Compound for Resist and Radiation-Sensitive Composition
App 20080113294 - Echigo; Masatoshi ;   et al.		2008-05-15
Method of manufacturing a semiconductor device
App 20070059632 - Oguro; Dai ;   et al.		2007-03-15
Thermoplastic resin composition
Grant 7,067,186 - Oguro , et al. June 27, 2		2006-06-27
Thermoplastic resin composition
App 20050075466 - Oguro, Dai ;   et al.		2005-04-07
Resist composition
App 20040191672 - Oguro, Dai ;   et al.		2004-09-30
Polyester based resin composition and molded product therefrom
Grant 6,740,376 - Oguro , et al. May 25, 2		2004-05-25
Polyester based resin composition and molded product therefrom
App 20030068455 - Oguro, Dai ;   et al.		2003-04-10
Polyester resin and molded article
App 20020010309 - Oguro, Dai ;   et al.		2002-01-24

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