Ogiwara; Masashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ogiwara; Masashi.The latest application filed is for "modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound".

Company Profile

0.13.7

Ogiwara; Masashi - Okayama JP
Ogiwara; Masashi - Kurashiki N/A JP
Ogiwara; Masashi - Kurashiki-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polyfunctional dimethylnaphthalene formaldehyde resin, and process for production thereof Grant 8,648,152 - Kita , et al. February 11, 2	2014-02-11
Composition for forming base film for lithography and method for forming multilayer resist pattern Grant 8,592,134 - Oguro , et al. November 26, 2	2013-11-26
Aromatic hydrocarbon resin and composition for forming underlayer film for lithography Grant 8,586,289 - Ideno , et al. November 19, 2	2013-11-19
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Grant 8,563,665 - Kita , et al. October 22, 2	2013-10-22
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Grant 8,524,952 - Kita , et al. September 3, 2	2013-09-03
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Grant 8,519,177 - Kita , et al. August 27, 2	2013-08-27
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound App 20120238781 - Kita; Seiji ; et al.	2012-09-20
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound App 20120238775 - Kita; Seiji ; et al.	2012-09-20
Aromatic Hydrocarbon Resin And Composition For Forming Underlayer Film For Lithography App 20120171611 - Ideno; Ryuji ; et al.	2012-07-05
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound App 20110009574 - Kita; Seiji ; et al.	2011-01-13
Polyfunctional Dimethylnaphthalene Formaldehyde Resin, And Process For Production Thereof App 20100324255 - Kita; Seiji ; et al.	2010-12-23
Composition For Forming Base Film For Lithography And Method For Forming Multilayer Resist Pattern App 20100316950 - Oguro; Dai ; et al.	2010-12-16
Method of producing low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin Grant 7,772,331 - Ogiwara , et al. August 10, 2	2010-08-10
Method of Producing Low Viscosity Phenol-Modified Aromatic Hydrocarbon Formaldehyde Resin App 20070238850 - Ogiwara; Masashi ; et al.	2007-10-11

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