| Patent | Date |
|---|
Composition For Forming Silicon-containing Resist Underlayer Film, Patterning Process, And Silicon Compound
App 20220221793 - NIIDA; Keisuke ; et al. | 2022-07-14 |
Composition for forming silicon-containing resist underlayer film and patterning process
Grant 11,385,544 - Ogihara , et al. July 12, 2 | 2022-07-12 |
Material For Forming Organic Film, Patterning Process, And Polymer
App 20220214618 - KORI; Daisuke ; et al. | 2022-07-07 |
Patterning process
Grant 11,366,386 - Watanabe , et al. June 21, 2 | 2022-06-21 |
Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
Grant 11,307,497 - Tachibana , et al. April 19, 2 | 2022-04-19 |
Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate
Grant 11,267,937 - Kori , et al. March 8, 2 | 2022-03-08 |
Patterning process
Grant 11,231,649 - Watanabe , et al. January 25, 2 | 2022-01-25 |
Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film
App 20210397092 - NAKAHARA; Takayoshi ; et al. | 2021-12-23 |
Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer
Grant 11,181,821 - Kori , et al. November 23, 2 | 2021-11-23 |
Method For Controlling Flatness, Method For Forming Coating Film, Apparatus For Controlling Flatness, And Apparatus For Forming Coating Film
App 20210335649 - OGIHARA; Tsutomu | 2021-10-28 |
Coating-type Composition For Forming Organic Film, Patterning Process, Polymer, And Method For Manufacturing Polymer
App 20210278766 - NIIDA; Keisuke ; et al. | 2021-09-09 |
Composition for forming organic film
Grant 11,042,090 - Tachibana , et al. June 22, 2 | 2021-06-22 |
Compound and composition for forming organic film
Grant 11,022,882 - Tachibana , et al. June 1, 2 | 2021-06-01 |
Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
Grant 11,018,015 - Ogihara , et al. May 25, 2 | 2021-05-25 |
Circuit device, oscillator, electronic apparatus, and vehicle
Grant 11,005,421 - Ogihara May 11, 2 | 2021-05-11 |
Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
Grant 10,998,197 - Kori , et al. May 4, 2 | 2021-05-04 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20210088908 - KAI; Yusuke ; et al. | 2021-03-25 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20210026246 - OGIHARA; Tsutomu ; et al. | 2021-01-28 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Polymer
App 20210003920 - KORI; Daisuke ; et al. | 2021-01-07 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic Film, And Patterning Process
App 20200381247 - KORI; Daisuke ; et al. | 2020-12-03 |
Composition For Forming Organic Film, Patterning Process, And Polymer
App 20200356007 - KORI; Daisuke ; et al. | 2020-11-12 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20200341377 - OGIHARA; Tsutomu ; et al. | 2020-10-29 |
Method For Measuring Distance Of Diffusion Of Curing Catalyst
App 20200340806 - OGIHARA; Tsutomu ; et al. | 2020-10-29 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Compound For Forming Organic Film
App 20200333709 - KORI; Daisuke ; et al. | 2020-10-22 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Compound For Forming Organic Film
App 20200332062 - KORI; Daisuke ; et al. | 2020-10-22 |
Method of cleaning and drying semiconductor substrate
Grant 10,811,247 - Ogihara , et al. October 20, 2 | 2020-10-20 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20200233303 - OGIHARA; Tsutomu ; et al. | 2020-07-23 |
Thermosetting Silicon-containing Compound, Composition For Forming A Silicon-containing Film, And Patterning Process
App 20200216670 - YANO; Toshiharu ; et al. | 2020-07-09 |
Thermosetting Iodine- And Silicon-containing Material, Composition Containing The Material For Forming Resist Underlayer Film Fo
App 20200159120 - OGIHARA; Tsutomu ; et al. | 2020-05-21 |
Method For Producing Iodine-containing Silicon Compound
App 20200148709 - Ogihara; Tsutomu ; et al. | 2020-05-14 |
Method For Producing Silicon Compound, And Silicon Compound
App 20200115400 - MITSUI; Ryo ; et al. | 2020-04-16 |
Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
Grant 10,620,537 - Watanabe , et al. | 2020-04-14 |
Method for manufacturing a resist composition
Grant 10,610,906 - Iwabuchi , et al. | 2020-04-07 |
Composition for forming organic film, patterning process, and resin for forming organic film
Grant 10,615,045 - Kori , et al. | 2020-04-07 |
Compound, method for manufacturing the compound, and composition for forming organic film
Grant 10,604,618 - Tachibana , et al. | 2020-03-31 |
Process for manufacturing resist composition and patterning process
Grant 10,603,696 - Ogihara , et al. | 2020-03-31 |
Patterning Process
App 20200090935 - OGIHARA; Tsutomu ; et al. | 2020-03-19 |
Method for producing composition for forming coating film for lithography and patterning process
Grant 10,591,817 - Ogihara , et al. | 2020-03-17 |
Circuit Device, Oscillator, Electronic Apparatus, And Vehicle
App 20200083843 - OGIHARA; Tsutomu | 2020-03-12 |
Physical quantity detection circuit, physical quantity detector, electronic apparatus and moving object
Grant 10,545,165 - Ogihara Ja | 2020-01-28 |
Compound, Method For Manufacturing The Compound, And Composition For Forming Organic Film
App 20190390000 - TACHIBANA; Seiichiro ; et al. | 2019-12-26 |
Compound And Composition For Forming Organic Film
App 20190391493 - TACHIBANA; Seiichiro ; et al. | 2019-12-26 |
Resist multilayer film-attached substrate and patterning process
Grant 10,514,605 - Tachibana , et al. Dec | 2019-12-24 |
Patterning Process
App 20190354017 - WATANABE; Tsukasa ; et al. | 2019-11-21 |
Patterning Process
App 20190354016 - WATANABE; Tsukasa ; et al. | 2019-11-21 |
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
Grant 10,444,628 - Kori , et al. Oc | 2019-10-15 |
Compound, Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic
App 20190300498 - TACHIBANA; Seiichiro ; et al. | 2019-10-03 |
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
Grant 10,429,739 - Kori , et al. O | 2019-10-01 |
Resist underlayer film composition, patterning process, and method for forming resist underlayer film
Grant 10,416,563 - Satoh , et al. Sept | 2019-09-17 |
Resist Composition And Patterning Process
App 20190258160 - Satoh; Hironori ; et al. | 2019-08-22 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, And Pat
App 20190198341 - OGIHARA; Tsutomu ; et al. | 2019-06-27 |
Method For Purifying Dihydroxynaphthalene
App 20190194102 - TACHIBANA; Seiichiro ; et al. | 2019-06-27 |
Method For Producing Dihydroxynaphthalene Condensate And Dihydroxynaphthalene Condensate
App 20190194391 - KORI; Daisuke ; et al. | 2019-06-27 |
Resist underlayer film composition, patterning process, and method for forming resist underlayer film
Grant 10,241,412 - Nagai , et al. | 2019-03-26 |
Underlayer film-forming composition and pattern forming process
Grant 10,228,621 - Hatakeyama , et al. | 2019-03-12 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic Film, Patterning Process, And Polymer
App 20190064659 - KORI; Daisuke ; et al. | 2019-02-28 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic Film, Patterning Process, And Polymer
App 20190067021 - KORI; Daisuke ; et al. | 2019-02-28 |
Composition For Forming Organic Film
App 20190041752 - TACHIBANA; Seiichiro ; et al. | 2019-02-07 |
Resist Multilayer Film-attached Substrate And Patterning Process
App 20190041753 - TACHIBANA; Seiichiro ; et al. | 2019-02-07 |
Composition For Forming Organic Film, Patterning Process, And Resin For Forming Organic Film
App 20190027369 - KORI; Daisuke ; et al. | 2019-01-24 |
Resist underlayer film composition, patterning process, and compound
Grant 10,156,788 - Hatakeyama , et al. Dec | 2018-12-18 |
Method for reducing metal of sugar-alcohol compound and sugar-alcohol compound
Grant 10,131,603 - Nakahara , et al. November 20, 2 | 2018-11-20 |
Method Of Cleaning And Drying Semiconductor Substrate
App 20180315594 - OGIHARA; Tsutomu ; et al. | 2018-11-01 |
Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process
Grant 10,109,485 - Ogihara , et al. October 23, 2 | 2018-10-23 |
Resist Underlayer Film Composition, Patterning Process, And Method For Forming Resist Underlayer Film
App 20180284615 - NAGAI; Hiroko ; et al. | 2018-10-04 |
Resist Underlayer Film Composition, Patterning Process, And Method For Forming Resist Underlayer Film
App 20180284614 - SATOH; Hironori ; et al. | 2018-10-04 |
Method for producing a composition for forming an organic film
Grant 10,047,244 - Kori , et al. August 14, 2 | 2018-08-14 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 10,007,183 - Tachibana , et al. June 26, 2 | 2018-06-26 |
Method for forming organic film and method for manufacturing substrate for semiconductor apparatus
Grant 9,984,891 - Ogihara , et al. May 29, 2 | 2018-05-29 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,977,330 - Tachibana , et al. May 22, 2 | 2018-05-22 |
Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process
Grant 9,971,245 - Ogihara , et al. May 15, 2 | 2018-05-15 |
Thermal Crosslinking Accelerator, Polysiloxane-containing Resist Underlayer Film Forming Composition Containing Same, And Patterning Process Using Same
App 20180081272 - OGIHARA; Tsutomu ; et al. | 2018-03-22 |
Composition for forming a coating type BPSG film, substrate, and patterning process
Grant 9,902,875 - Tachibana , et al. February 27, 2 | 2018-02-27 |
Composition for forming a coating type silicon-containing film, substrate, and patterning process
Grant 9,880,470 - Tachibana , et al. January 30, 2 | 2018-01-30 |
Resist Underlayer Film Composition, Patterning Process, Method For Forming Resist Underlayer Film, And Compound For Resist Underlayer Film Composition
App 20180011405 - WATANABE; Takeru ; et al. | 2018-01-11 |
Composition for forming resist underlayer film and patterning process
Grant 9,857,686 - Ogihara , et al. January 2, 2 | 2018-01-02 |
Method For Reducing Metal Of Sugar-alcohol Compound And Sugar-alcohol Compound
App 20170369407 - NAKAHARA; Takayoshi ; et al. | 2017-12-28 |
Method for forming multi-layer film and patterning process
Grant 9,804,492 - Hatakeyama , et al. October 31, 2 | 2017-10-31 |
Polymer for resist under layer film composition, resist under layer film composition, and patterning process
Grant 9,805,943 - Kikuchi , et al. October 31, 2 | 2017-10-31 |
Method For Forming Organic Film And Method For Manufacturing Substrate For Semiconductor Apparatus
App 20170309493 - OGIHARA; Tsutomu ; et al. | 2017-10-26 |
Rinse solution for pattern formation and pattern forming process
Grant 9,798,242 - Hatakeyama , et al. October 24, 2 | 2017-10-24 |
Organic film composition, process for forming organic film, patterning process, and compound
Grant 9,728,420 - Kori , et al. August 8, 2 | 2017-08-08 |
Compound For Forming Organic Film, Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
App 20170184968 - KORI; Daisuke ; et al. | 2017-06-29 |
Compound For Forming Organic Film, Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
App 20170183531 - KORI; Daisuke ; et al. | 2017-06-29 |
Silicon-containing Condensate, Composition For Forming A Silicon-containing Resist Under Layer Film, And Patterning Process
App 20170154766 - OGIHARA; Tsutomu ; et al. | 2017-06-01 |
Rinse solution for pattern formation and pattern forming process
Grant 9,632,416 - Hatakeyama , et al. April 25, 2 | 2017-04-25 |
Ultraviolet absorber, composition for forming a resist under layer film, and patterning process
Grant 9,624,356 - Ogihara , et al. April 18, 2 | 2017-04-18 |
Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
Grant 9,627,204 - Ogihara , et al. April 18, 2 | 2017-04-18 |
Underlayer film-forming composition and pattern forming process
Grant 9,620,363 - Hatakeyama , et al. April 11, 2 | 2017-04-11 |
Patterning process using a boron phosphorus silicon glass film
Grant 9,580,623 - Tachibana , et al. February 28, 2 | 2017-02-28 |
Composition For Forming Resist Underlayer Film And Patterning Process
App 20170017156 - OGIHARA; Tsutomu ; et al. | 2017-01-19 |
Resist Underlayer Film Compostion, Patterning Process, And Compound
App 20170018436 - HATAKEYAMA; Jun ; et al. | 2017-01-19 |
Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin
Grant 9,522,979 - Watanabe , et al. December 20, 2 | 2016-12-20 |
Method for cleaning and drying semiconductor substrate
Grant 9,524,863 - Ogihara , et al. December 20, 2 | 2016-12-20 |
Method for forming coating film for lithography
Grant 9,502,247 - Ogihara , et al. November 22, 2 | 2016-11-22 |
Organic Film Composition, Process For Forming Organic Film, Patterning Process, And Compound
App 20160336189 - KORI; Daisuke ; et al. | 2016-11-17 |
Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process
Grant 9,490,144 - Ogihara , et al. November 8, 2 | 2016-11-08 |
Method For Producing Composition For Forming Coating Film For Lithography And Patterning Process
App 20160314991 - OGIHARA; Tsutomu ; et al. | 2016-10-27 |
Method For Forming Coating Film For Lithography
App 20160300706 - OGIHARA; Tsutomu ; et al. | 2016-10-13 |
Wet strip process for an antireflective coating layer
Grant 9,460,934 - Glodde , et al. October 4, 2 | 2016-10-04 |
Polymer For Resist Under Layer Film Composition, Resist Under Layer Film Composition, And Patterning Process
App 20160284559 - KIKUCHI; Rie ; et al. | 2016-09-29 |
Patterning Process
App 20160276152 - TACHIBANA; Seiichiro ; et al. | 2016-09-22 |
Silicon-containing Polymer, Silicon-containing Compound, Composition For Forming A Resist Under Layer Film, And Patterning Process
App 20160229939 - OGIHARA; Tsutomu ; et al. | 2016-08-11 |
Fluorine-containing Silicon Compound, Method For Producing Same, And Method For Producing Fluorine-containing Silicon Resin
App 20160229960 - WATANABE; Takeru ; et al. | 2016-08-11 |
Compositon for forming metal oxide-containing film and patterning process
Grant 9,377,690 - Ogihara , et al. June 28, 2 | 2016-06-28 |
Rinse Solution For Pattern Formation And Pattern Forming Process
App 20160154312 - Hatakeyama; Jun ; et al. | 2016-06-02 |
Rinse Solution For Pattern Formation And Pattern Forming Process
App 20160154314 - Hatakeyama; Jun ; et al. | 2016-06-02 |
Method For Forming Multi-layer Film And Patterning Process
App 20160111287 - HATAKEYAMA; Jun ; et al. | 2016-04-21 |
Composition for forming resist underlayer film and patterning process
Grant 9,315,670 - Ogihara , et al. April 19, 2 | 2016-04-19 |
Method for producing semiconductor apparatus substrate
Grant 9,312,127 - Ogihara , et al. April 12, 2 | 2016-04-12 |
Composition for forming a silicon-containing resist under layer film and patterning process
Grant 9,312,144 - Ogihara , et al. April 12, 2 | 2016-04-12 |
Composition For Forming A Coating Type Bpsg Film, Substrate, And Patterning Process
App 20160096978 - TACHIBANA; Seiichiro ; et al. | 2016-04-07 |
Composition For Forming A Coating Type Silicon-containing Film, Substrate, And Patterning Process
App 20160096977 - TACHIBANA; Seiichiro ; et al. | 2016-04-07 |
Method For Producing Semiconductor Apparatus Substrate
App 20160064220 - OGIHARA; Tsutomu ; et al. | 2016-03-03 |
Ultraviolet Absorber, Composition For Forming A Resist Under Layer Film, And Patterning Process
App 20160053087 - OGIHARA; Tsutomu ; et al. | 2016-02-25 |
Method for Producing a Composition for Forming an Organic Film
App 20160056047 - KORI; Daisuke ; et al. | 2016-02-25 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,261,788 - Tachibana , et al. February 16, 2 | 2016-02-16 |
Patterning process
Grant 9,248,693 - Ogihara February 2, 2 | 2016-02-02 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160027653 - TACHIBANA; Seiichiro ; et al. | 2016-01-28 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160018735 - TACHIBANA; Seiichiro ; et al. | 2016-01-21 |
Method for forming a resist under layer film and patterning process
Grant 9,230,827 - Nonaka , et al. January 5, 2 | 2016-01-05 |
Quaternary Ammonium Salt Compound, Composition For Forming A Resist Under Layer Film, And Patterning Process
App 20150357204 - OGIHARA; Tsutomu ; et al. | 2015-12-10 |
Method for producing resist composition
Grant 9,207,535 - Ogihara , et al. December 8, 2 | 2015-12-08 |
Method for producing resist composition
Grant 9,201,301 - Ogihara , et al. December 1, 2 | 2015-12-01 |
Pattern forming process
Grant 9,201,304 - Hatakeyama , et al. December 1, 2 | 2015-12-01 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,188,866 - Ogihara , et al. November 17, 2 | 2015-11-17 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,176,382 - Ogihara , et al. November 3, 2 | 2015-11-03 |
Process For Manufacturing Resist Composition And Patterning Process
App 20150286143 - OGIHARA; Tsutomu ; et al. | 2015-10-08 |
Resist underlayer film composition and patterning process using the same
Grant 9,146,468 - Hatakeyama , et al. September 29, 2 | 2015-09-29 |
Underlayer film-forming composition and pattern forming process
Grant 9,136,121 - Hatakeyama , et al. September 15, 2 | 2015-09-15 |
Underlayer film-forming composition and pattern forming process
Grant 9,136,122 - Hatakeyama , et al. September 15, 2 | 2015-09-15 |
Pattern forming process
Grant 9,122,147 - Hatakeyama , et al. September 1, 2 | 2015-09-01 |
Method For Cleaning And Drying Semiconductor Substrate
App 20150221500 - OGIHARA; Tsutomu ; et al. | 2015-08-06 |
Method for forming silicon-containing resist underlayer film
Grant 9,091,925 - Yoshihara , et al. July 28, 2 | 2015-07-28 |
Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative
Grant 9,076,738 - Watanabe , et al. July 7, 2 | 2015-07-07 |
Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
Grant 9,075,309 - Ogihara , et al. July 7, 2 | 2015-07-07 |
Pattern forming process
Grant 9,052,603 - Hatakeyama , et al. June 9, 2 | 2015-06-09 |
Naphthalene derivative, resist bottom layer material, and patterning process
Grant 9,045,587 - Kinsho , et al. June 2, 2 | 2015-06-02 |
Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition
Grant 9,046,764 - Tachibana , et al. June 2, 2 | 2015-06-02 |
Patterning process
Grant 9,005,883 - Ogihara , et al. April 14, 2 | 2015-04-14 |
Method For Manufacturing A Resist Composition
App 20150099216 - IWABUCHI; Motoaki ; et al. | 2015-04-09 |
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
Grant 8,999,625 - Glodde , et al. April 7, 2 | 2015-04-07 |
Composition For Forming A Silicon-containing Resist Under Layer Film And Patterning Process
App 20150093901 - OGIHARA; Tsutomu ; et al. | 2015-04-02 |
Patterning process
Grant 8,992,790 - Ogihara , et al. March 31, 2 | 2015-03-31 |
Method For Producing Resist Composition
App 20150064625 - OGIHARA; Tsutomu ; et al. | 2015-03-05 |
Patterning process and composition for forming silicon-containing film usable therefor
Grant 8,951,711 - Ogihara , et al. February 10, 2 | 2015-02-10 |
Composition for forming resist underlayer film and patterning process using the same
Grant 8,951,917 - Ogihara , et al. February 10, 2 | 2015-02-10 |
Silicon-containing resist underlayer film-forming composition and patterning process
Grant 8,945,820 - Ogihara , et al. February 3, 2 | 2015-02-03 |
Composition for forming a silicon-containing resist underlayer film and patterning process using the same
Grant 8,932,953 - Ogihara , et al. January 13, 2 | 2015-01-13 |
Production method of resist composition for lithography
Grant 8,927,192 - Ogihara , et al. January 6, 2 | 2015-01-06 |
Composition For Forming A Coating Type Bpsg Film, Substrate Formed A Film By Said Composition, And Patterning Process Using Said Composition
App 20150004791 - OGIHARA; Tsutomu ; et al. | 2015-01-01 |
Naphthalene Derivative, Resist Bottom Layer Material, And Patterning Process
App 20140363768 - Kinsho; Takeshi ; et al. | 2014-12-11 |
Underlayer Film-forming Composition And Pattern Forming Process
App 20140363956 - Hatakeyama; Jun ; et al. | 2014-12-11 |
Underlayer Film-forming Composition And Pattern Forming Process
App 20140363958 - Hatakeyama; Jun ; et al. | 2014-12-11 |
Underlayer Film-forming Composition And Pattern Forming Process
App 20140363955 - Hatakeyama; Jun ; et al. | 2014-12-11 |
Underlayer Film-forming Composition And Pattern Forming Process
App 20140363957 - Hatakeyama; Jun ; et al. | 2014-12-11 |
Patterning Process And Composition For Forming Silicon-containing Film Usable Therefor
App 20140342289 - OGIHARA; Tsutomu ; et al. | 2014-11-20 |
Method For Forming A Resist Under Layer Film And Patterning Process
App 20140335692 - NONAKA; Shiori ; et al. | 2014-11-13 |
Method For Producing Resist Composition
App 20140335453 - OGIHARA; Tsutomu ; et al. | 2014-11-13 |
Resist underlayer film composition and patterning process using the same
Grant 8,877,422 - Ogihara , et al. November 4, 2 | 2014-11-04 |
Physical Quantity Detection Circuit, Physical Quantity Detector, Electronic Apparatus And Moving Object
App 20140324392 - OGIHARA; Tsutomu | 2014-10-30 |
Patterning process
Grant 8,859,189 - Ogihara , et al. October 14, 2 | 2014-10-14 |
Resist underlayer film composition and patterning process using the same
Grant 8,853,031 - Ogihara , et al. October 7, 2 | 2014-10-07 |
Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
Grant 8,852,844 - Ogihara , et al. October 7, 2 | 2014-10-07 |
Naphthalene derivative, resist bottom layer material, and patterning process
Grant 8,846,846 - Kinsho , et al. September 30, 2 | 2014-09-30 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273447 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273448 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Wet Strip Process For An Antireflective Coating Layer
App 20140273501 - Glodde; Martin ; et al. | 2014-09-18 |
Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process
Grant 8,835,697 - Kori , et al. September 16, 2 | 2014-09-16 |
Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
Grant 8,835,092 - Watanabe , et al. September 16, 2 | 2014-09-16 |
Patterning process and composition for forming silicon-containing film usable therefor
Grant 8,835,102 - Ogihara , et al. September 16, 2 | 2014-09-16 |
Production method of resist composition for lithography
Grant 8,822,128 - Iwabuchi , et al. September 2, 2 | 2014-09-02 |
Pattern Forming Process
App 20140234781 - Hatakeyama; Jun ; et al. | 2014-08-21 |
Pattern Forming Process
App 20140235057 - Hatakeyama; Jun ; et al. | 2014-08-21 |
Pattern Forming Process
App 20140234785 - Hatakeyama; Jun ; et al. | 2014-08-21 |
Composition For Forming Resist Underlayer Film And Patterning Process
App 20140235796 - OGIHARA; Tsutomu ; et al. | 2014-08-21 |
Silicon-containing Antireflective Coatings Including Non-polymeric Silsesquioxanes
App 20140227641 - Glodde; Martin ; et al. | 2014-08-14 |
Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process
Grant 8,795,955 - Kinsho , et al. August 5, 2 | 2014-08-05 |
Thermal Crosslinking Accelerator, Polysiloxane-containing Resist Underlayer Film Forming Composition Containing Same, And Patterning Process Using Same
App 20140205951 - OGIHARA; Tsutomu ; et al. | 2014-07-24 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140193975 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Compositon For Forming Metal Oxide-containing Film And Patterning Process
App 20140193757 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Patterning process
Grant 8,759,220 - Ogihara , et al. June 24, 2 | 2014-06-24 |
Silicon-containing resist underlayer film-forming composition and patterning process
Grant 8,715,913 - Ogihara , et al. May 6, 2 | 2014-05-06 |
Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
Grant 8,697,330 - Ogihara , et al. April 15, 2 | 2014-04-15 |
Patterning Process
App 20140093825 - OGIHARA; Tsutomu ; et al. | 2014-04-03 |
Resist underlayer film composition and patterning process using the same
Grant 8,663,898 - Ogihara , et al. March 4, 2 | 2014-03-04 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 8,652,750 - Ogihara , et al. February 18, 2 | 2014-02-18 |
Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film
Grant 8,652,757 - Hatakeyama , et al. February 18, 2 | 2014-02-18 |
Coated-type silicon-containing film stripping process
Grant 8,652,267 - Ogihara , et al. February 18, 2 | 2014-02-18 |
Method For Forming Silicon-containing Resist Underlayer Film
App 20130337168 - YOSHIHARA; Takao ; et al. | 2013-12-19 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20130337649 - TACHIBANA; Seiichiro ; et al. | 2013-12-19 |
Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process
Grant 8,603,732 - Ogihara , et al. December 10, 2 | 2013-12-10 |
Resist underlayer film composition and patterning process using the same
Grant 8,592,956 - Ogihara , et al. November 26, 2 | 2013-11-26 |
Patterning Process
App 20130284699 - OGIHARA; Tsutomu ; et al. | 2013-10-31 |
Patterning Process
App 20130284698 - OGIHARA; Tsutomu | 2013-10-31 |
Silicon Compound, Silicon-containing Compound, Composition For Forming Resist Underlayer Film Containing The Same And Patterning Process
App 20130280912 - OGIHARA; Tsutomu ; et al. | 2013-10-24 |
Silicon-containing Surface Modifier, Resist Underlayer Film Composition Containing This, And Patterning Process
App 20130210236 - OGIHARA; Tsutomu ; et al. | 2013-08-15 |
Silicon-containing Surface Modifier, Resist Lower Layer Film-forming Composition Containing The Same, And Patterning Process
App 20130210229 - OGIHARA; Tsutomu ; et al. | 2013-08-15 |
Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process
Grant 8,501,386 - Ogihara , et al. August 6, 2 | 2013-08-06 |
Method For Forming Resist Underlayer Film, Patterning Process Using The Same, And Composition For The Resist Underlayer Film
App 20130184404 - HATAKEYAMA; Jun ; et al. | 2013-07-18 |
Resist Underlayer Film Composition, Method For Producing Polymer For Resist Underlayer Film, And Patterning Process Using The Resist Underlayer Film Composition
App 20130171569 - TACHIBANA; Seiichiro ; et al. | 2013-07-04 |
Silicon-containing Resist Underlayer Film-forming Composition And Patterning Process
App 20130137271 - OGIHARA; Tsutomu ; et al. | 2013-05-30 |
Silicon-containing Resist Underlayer Film-forming Composition And Patterning Process
App 20130137041 - OGIHARA; Tsutomu ; et al. | 2013-05-30 |
Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film
Grant 8,450,048 - Hatakeyama , et al. May 28, 2 | 2013-05-28 |
Production Method Of Resist Composition For Lithography
App 20130108957 - Iwabuchi; Motoaki ; et al. | 2013-05-02 |
Production Method Of Resist Composition For Lithography
App 20130108958 - OGIHARA; Tsutomu ; et al. | 2013-05-02 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20130087529 - Hatakeyama; Jun ; et al. | 2013-04-11 |
Composition For Forming A Silicon-containing Resist Underlayer Film And Patterning Process Using The Same
App 20130045601 - OGIHARA; Tsutomu ; et al. | 2013-02-21 |
Composition For Forming Resist Underlayer Film And Patterning Process Using The Same
App 20130005150 - OGIHARA; Tsutomu ; et al. | 2013-01-03 |
Patterning process
Grant 8,343,711 - Ogihara , et al. January 1, 2 | 2013-01-01 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 8,329,376 - Ogihara , et al. December 11, 2 | 2012-12-11 |
Patterning Process
App 20120276483 - OGIHARA; Tsutomu ; et al. | 2012-11-01 |
Resist lower layer film-formed substrate
Grant 8,288,072 - Hatakeyama , et al. October 16, 2 | 2012-10-16 |
Biphenyl Derivative, Resist Bottom Layer Material, Bottom Layer Forming Method, And Patterning Process
App 20120252218 - Kori; Daisuke ; et al. | 2012-10-04 |
Patterning Process And Composition For Forming Silicon-containing Film Usable Therefor
App 20120238095 - OGIHARA; Tsutomu ; et al. | 2012-09-20 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120184103 - OGIHARA; Tsutomu ; et al. | 2012-07-19 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120171868 - OGIHARA; Tsutomu ; et al. | 2012-07-05 |
Patterning process
Grant 8,198,016 - Hatakeyama , et al. June 12, 2 | 2012-06-12 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120142193 - OGIHARA; Tsutomu ; et al. | 2012-06-07 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120108071 - OGIHARA; Tsutomu ; et al. | 2012-05-03 |
Naphthalene Derivative, Resist Bottom Layer Material, And Patterning Process
App 20120064725 - Kinsho; Takeshi ; et al. | 2012-03-15 |
Silicon-containing Film-forming Composition, Silicon-containing Film-formed Substrate, And Patterning Process
App 20120052685 - OGIHARA; Tsutomu ; et al. | 2012-03-01 |
Composition For Resist Underlayer Film, Process For Forming Resist Underlayer Film, Patterning Process, And Fullerene Derivative
App 20120045900 - WATANABE; Takeru ; et al. | 2012-02-23 |
Naphthalene Derivative, Resist Bottom Layer Material, Resist Bottom Layer Forming Method, And Patterning Process
App 20110311920 - Kinsho; Takeshi ; et al. | 2011-12-22 |
Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process
Grant 8,029,974 - Ogihara , et al. October 4, 2 | 2011-10-04 |
Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
Grant 8,026,038 - Ogihara , et al. September 27, 2 | 2011-09-27 |
Resist Underlayer Film Composition, Process For Forming Resist Underlayer Film, Patterning Process And Fullerene Derivative
App 20110195362 - Watanabe; Takeru ; et al. | 2011-08-11 |
Resist Underlayer Film-forming Composition, Process For Forming Resist Underlayer Film And Patterning Process
App 20110177459 - OGIHARA; Tsutomu ; et al. | 2011-07-21 |
Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method
Grant 7,910,283 - Ogihara , et al. March 22, 2 | 2011-03-22 |
Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 7,875,417 - Ogihara , et al. January 25, 2 | 2011-01-25 |
Substrate comprising a lower silicone resin film and an upper silicone resin film
Grant 7,868,407 - Ogihara , et al. January 11, 2 | 2011-01-11 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 7,855,043 - Ogihara , et al. December 21, 2 | 2010-12-21 |
Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
App 20100285407 - Ogihara; Tsutomu ; et al. | 2010-11-11 |
Patterning process
App 20100273110 - Ogihara; Tsutomu ; et al. | 2010-10-28 |
Coated-type silicon-containing film stripping process
App 20100147334 - Ogihara; Tsutomu ; et al. | 2010-06-17 |
Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film
App 20100099044 - Hatakeyama; Jun ; et al. | 2010-04-22 |
Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
App 20100086870 - Ogihara; Tsutomu ; et al. | 2010-04-08 |
Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process
App 20100086872 - Ogihara; Tsutomu ; et al. | 2010-04-08 |
Antireflection film composition and patterning process using the same
Grant 7,687,228 - Hatakeyama , et al. March 30, 2 | 2010-03-30 |
Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
Grant 7,678,529 - Ogihara , et al. March 16, 2 | 2010-03-16 |
Rework process for photoresist film
Grant 7,642,043 - Ogihara , et al. January 5, 2 | 2010-01-05 |
Rework process for photoresist film
Grant 7,638,268 - Ogihara , et al. December 29, 2 | 2009-12-29 |
Patterning process
App 20090286188 - Hatakeyama; Jun ; et al. | 2009-11-19 |
Antireflection film composition, substrate, and patterning process
Grant 7,585,613 - Ogihara , et al. September 8, 2 | 2009-09-08 |
Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
Grant 7,541,134 - Iwabuchi , et al. June 2, 2 | 2009-06-02 |
Metal Oxide-containing Film-forming Composition, Metal Oxide-containing Film, Metal Oxide-containing Film-bearing Substrate, And Patterning Method
App 20090136869 - OGIHARA; Tsutomu ; et al. | 2009-05-28 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
Grant 7,485,690 - Hamada , et al. February 3, 2 | 2009-02-03 |
Silicon-containing Film-forming Composition, Silicon-containing Film, Silicon-containing Film-bearing Substrate, And Patterning Method
App 20090011372 - Ogihara; Tsutomu ; et al. | 2009-01-08 |
Semiconductor Interlayer-insulating Film Forming Composition, Preparation Method Thereof, Film Forming Method, And Semiconductor Device
App 20080290472 - Yagihashi; Fujio ; et al. | 2008-11-27 |
Silicone-containing Film-forming Composition, Silicon-containing Film, Silicon-containing Film-bearing Substrate, And Patterning Method
App 20080274432 - Ogihara; Tsutomu ; et al. | 2008-11-06 |
Resist lower layer film composition and patterning process using the same
App 20080227037 - Hatakeyama; Jun ; et al. | 2008-09-18 |
Antireflection film composition and patterning process using the same
App 20080220381 - Hatakeyama; Jun ; et al. | 2008-09-11 |
Porous film-forming composition, patterning process, and porous sacrificial film
Grant 7,417,104 - Iwabuchi , et al. August 26, 2 | 2008-08-26 |
Semiconductor device comprising porous film
Grant 7,405,459 - Ogihara , et al. July 29, 2 | 2008-07-29 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
Grant 7,402,621 - Ogihara , et al. July 22, 2 | 2008-07-22 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
Grant 7,385,021 - Hamada , et al. June 10, 2 | 2008-06-10 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20080118737 - Ogihara; Tsutomu ; et al. | 2008-05-22 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
Grant 7,332,446 - Ogihara , et al. February 19, 2 | 2008-02-19 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
App 20080026322 - Ogihara; Tsutomu ; et al. | 2008-01-31 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,309,722 - Ogihara , et al. December 18, 2 | 2007-12-18 |
Antireflective film material, and antireflective film and pattern formation method using the same
Grant 7,303,785 - Ogihara , et al. December 4, 2 | 2007-12-04 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
App 20070238300 - Ogihara; Tsutomu ; et al. | 2007-10-11 |
Antireflection film composition, substrate, and patterning process
App 20070172759 - Ogihara; Tsutomu ; et al. | 2007-07-26 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,244,657 - Ogihara , et al. July 17, 2 | 2007-07-17 |
Composition For Forming Porous Film, Porous Film And Method For Forming The Same, Interlevel Insulator Film, And Semiconductor Device
App 20070135565 - Ogihara; Tsutomu ; et al. | 2007-06-14 |
Antireflection film composition, patterning process and substrate using the same
App 20070134916 - Iwabuchi; Motoaki ; et al. | 2007-06-14 |
Substrate, method for producing the same, and patterning process using the same
App 20070128886 - Ogihara; Tsutomu ; et al. | 2007-06-07 |
Rework process for photoresist film
App 20070117411 - Ogihara; Tsutomu ; et al. | 2007-05-24 |
Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method
App 20070117252 - Ogihara; Tsutomu ; et al. | 2007-05-24 |
Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
App 20070117044 - Ogihara; Tsutomu ; et al. | 2007-05-24 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20070108593 - Ogihara; Tsutomu ; et al. | 2007-05-17 |
Rework process for photoresist film
App 20070111134 - Ogihara; Tsutomu ; et al. | 2007-05-17 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,205,338 - Ogihara , et al. April 17, 2 | 2007-04-17 |
Antireflective film material, and antireflective film and pattern formation method using the same
Grant 7,202,013 - Ogihara , et al. April 10, 2 | 2007-04-10 |
Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
Grant 7,163,778 - Hatakeyama , et al. January 16, 2 | 2007-01-16 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,132,473 - Ogihara , et al. November 7, 2 | 2006-11-07 |
Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
App 20050277058 - Iwabuchi, Motoaki ; et al. | 2005-12-15 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
App 20050277755 - Hamada, Yoshitaka ; et al. | 2005-12-15 |
Porous film-forming composition, patterning process, and porous sacrificial film
App 20050277756 - Iwabuchi, Motoaki ; et al. | 2005-12-15 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
App 20050274692 - Hamada, Yoshitaka ; et al. | 2005-12-15 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
App 20050165197 - Ogihara, Tsutomu ; et al. | 2005-07-28 |
Antireflective film material, and antireflective film and pattern formation method using the same
App 20040253461 - Ogihara, Tsutomu ; et al. | 2004-12-16 |
Antireflective film material, and antireflective film and pattern formation method using the same
App 20040247900 - Ogihara, Tsutomu ; et al. | 2004-12-09 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040219372 - Ogihara, Tsutomu ; et al. | 2004-11-04 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
App 20040188809 - Ogihara, Tsutomu ; et al. | 2004-09-30 |
Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
App 20040191479 - Hatakeyama, Jun ; et al. | 2004-09-30 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040180222 - Ogihara, Tsutomu ; et al. | 2004-09-16 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040105986 - Ogihara, Tsutomu ; et al. | 2004-06-03 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040091419 - Ogihara, Tsutomu ; et al. | 2004-05-13 |
Method for the preparation of surface-modified silica particles
Grant 5,013,585 - Shimizu , et al. May 7, 1 | 1991-05-07 |
Process of preparing silicone composition, and cosmetic and lustering materials containing silicone composition obtained
Grant 4,983,388 - Kuwata , et al. January 8, 1 | 1991-01-08 |
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