OGAWA; Taku

Patent Applications and Registrations

Patent applications and USPTO patent grants for OGAWA; Taku.The latest application filed is for "photosensitive resin composition, method for forming resist pattern, and method for producing plated formed product".

Company Profile

0.7.10

OGAWA; Taku - Minato-ku Tokyo
Ogawa; Taku - Kyoto JP
Ogawa; Taku - Kounosu JP
OGAWA; Taku - Kounosu-shi JP
Ogawa; Taku - Kounosu-city JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive Resin Composition, Method For Forming Resist Pattern, And Method For Producing Plated Formed Product App 20220146932 - NODA; Hiroto ; et al.	2022-05-12
X-ray imaging apparatus Grant 11,324,461 - Ogawa , et al. May 10, 2	2022-05-10
X-ray Imaging Apparatus App 20200359977 - OGAWA; Taku ; et al.	2020-11-19
Electromagnetic contactor manufacturing method Grant 9,378,906 - Imamura , et al. June 28, 2	2016-06-28
Electromagnetic contactor and electromagnetic contactor gas encapsulating method Grant 8,952,772 - Imamura , et al. February 10, 2	2015-02-10
Electromagnetic contactor and electromagnetic contactor gas encapsulating method Grant 8,803,642 - Imamura , et al. August 12, 2	2014-08-12
Electromagnetic Contactor Manufacturing Method App 20140101937 - IMAMURA; Seiji ; et al.	2014-04-17
Electromagnetic Contactor And Electromagnetic Contactor Gas Encapsulating Method App 20140104018 - IMAMURA; Seiji ; et al.	2014-04-17
Electromagnetic Contactor And Electromagnetic Contactor Gas Encapsulating Method App 20140104019 - IMAMURA; Seiji ; et al.	2014-04-17
Electromagnetic Contactor, Electromagnetic Contactor Gas Encapsulating Method, And Electromagnetic Contactor Manufacturing Method App 20130234813 - Imamura; Seiji ; et al.	2013-09-12

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